Patents-Review.com
ClassID:

205392 ⎘

H01J37/3411 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes operating with cathodic sputtering Constructional aspects of the reactor

Sub-classes:
Recent Application in this class:
#1
20250293008
2025-09-18

External Cooling Assembly for Substrate Support

 #2
20250283210
2025-09-11

APPARATUS FOR ACCOMMODATING AN ARTICLE IN A VACUUM-COATING INSTALLATION

 #3
20250149303
2025-05-08

DYNAMIC VACUUM SEAL SYSTEM FOR PHYSICAL VAPOR DEPOSITION SPUTTER APPLICATIONS

 #4
20240242947
2024-07-18

PROCESS KIT HAVING TALL DEPOSITION RING FOR PVD CHAMBER

 #5
20240186128
2024-06-06

METHODS AND APPARATUS FOR REDUCING SPUTTERING OF A GROUNDED SHIELD IN A PROCESS CHAMBER

 #6
20240183025
2024-06-06

FILM FORMING APPARATUS AND METHOD FOR REDUCING ARCING

 #7
20240150886
2024-05-09

SPUTTERING APPARATUS AND RELATED SYSTEMS AND METHODS FOR SPUTTERING SUBSTRATES

 #8
20230407458
2023-12-21

FILM FORMATION APPARATUS

 #9
20230402271
2023-12-14

Methods and apparatus for controlling ion fraction in physical vapor deposition processes

 #10
20230203642
2023-06-29

LOADED BODY, APPARATUS FOR PRODUCINGLOADED BODY AND METHOD FOR PRODUCING LOADED BODY

 #11
20230187191
2023-06-15

Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process

 #12
20230183855
2023-06-15

Film forming apparatus and method for reducing arcing

 #13
20230151478
2023-05-18

APPARATUS FOR ACCOMMODATING AN ARTICLE IN A VACUUM-COATING INSTALLATION

 #14
20220380886
2022-12-01

Film forming apparatus and method for reducing arcing

 #15
20220344133
2022-10-27

METHOD FOR FORMING LAYER

 #16
20220319822
2022-10-06

Internally divisible process chamber using a shutter disk assembly

 #17
20220223367
2022-07-14

REDUCED SUBSTRATE PROCESS CHAMBER CAVITY VOLUME

 #18
20220220615
2022-07-14

Wafer support and thin-film deposition apparatus using the same

 #19
20220186361
2022-06-16

Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process

 #20
20220139684
2022-05-05

Internally divisible process chamber using a shutter disk assembly

 #21
20220098724
2022-03-31

Vacuum system and method to deposit a compound layer

 #22
20220044918
2022-02-10

Multi-patterned sputter traps and methods of making

 #23
20220020577
2022-01-20

Methods and apparatus for controlling ion fraction in physical vapor deposition processes

 #24
20210285092
2021-09-16

Sputtering apparatus

 #25
20210246545
2021-08-12

DC magnetron sputtering

 #26
20210172054
2021-06-10

Multicathode deposition system and methods

 #27
20210123130
2021-04-29

Method and apparatus for depositing a material

 #28
20210087671
2021-03-25

Processing System For Small Substrates

 #29
20200398299
2020-12-24

Coating apparatus

 #30
20200373352
2020-11-26

Semiconductor memory device and semiconductor memory manufacturing apparatus

 #31
20200357616
2020-11-12

HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMITY AND STEP-COVERAGE OF THIS PROCESS

 #32
20200312640
2020-10-01

Methods and apparatus for reducing sputtering of a grounded shield in a process chamber

 #33
20200194243
2020-06-18

Process kit having tall deposition ring for PVD chamber

 #34
20200161100
2020-05-21

Apparatus for physical vapor deposition and method for forming a layer

 #35
20200161095
2020-05-21

Substrate processing apparatus including top reflector above annular lamp assembly

 #36
20200080192
2020-03-12

Sputtering apparatus and method of forming film

 #37
20200051795
2020-02-13

Physical vapor deposition (PVD) chamber with reduced arcing

 #38
20190284685
2019-09-19

THIN FILM FORMATION APPARATUS, SPUTTERING CATHODE, AND METHOD OF FORMING THIN FILM

 #39
20190228953
2019-07-25

SUBSTRATE-PLACING STAGE AND MANUFACTURING METHOD THEREOF

 #40
20190218669
2019-07-18

Silicon coating on hard shields

 #41
20190181028
2019-06-13

Cryogenically cooled rotatable electrostatic chuck

 #42
20190144992
2019-05-16

SPUTTERING APPARATUS AND METHOD OF OPERATING THE SAME

 #43
20190108988
2019-04-11

Multi-patterned sputter traps and methods of making

 #44
20190051700
2019-02-14

Semiconductor memory device and semiconductor memory manufacturing apparatus

 #45
20180366150
2018-12-20

Film-forming apparatus and method for manufacturing magnetic recording medium

 #46
20180350572
2018-12-06

Process kit for multi-cathode processing chamber

 #47
20180286645
2018-10-04

Plasma processing apparatus

 #48
20180286644
2018-10-04

Plasma processing apparatus

 #49
20180258519
2018-09-13

APPARATUS FOR VACUUM DEPOSITION ON A SUBSTRATE AND METHOD FOR MASKING THE SUBSTRATE DURING VACUUM DEPOSITION

 #50
20180202040
2018-07-19

Physical vapor deposition method using backside gas cooling of workpieces

 #51
20180197721
2018-07-12

Substrate processing apparatus including annular lamp assembly

 #52
20180158653
2018-06-07

Composite plasma modulator for plasma chamber

 #53
20180151325
2018-05-31

Biased cover ring for a substrate processing system

 #54
20180105929
2018-04-19

Magnetron sputtering device

 #55
20180087147
2018-03-29

Process kit shield for improved particle reduction

 #56
20180037984
2018-02-08

ENDBLOCK FOR ROTATABLE TARGET WITH ELECTRICAL CONNECTION BETWEEN COLLECTOR AND ROTOR AT PRESSURE LESS THAN ATMOSPHERIC PRESSURE

 #57
20180003125
2018-01-04

Cylinder liners with adhesive metallic layers and methods of forming the cylinder liners

 #58
20170346418
2017-11-30

CHUCKING DEVICE AND VACUUM PROCESSING APPARATUS

 #59
20170327939
2017-11-16

Deposition method, deposition apparatus, and structure

 #60
20170294294
2017-10-12

DC magnetron sputtering

 #61
20170250061
2017-08-31

Vacuum device

 #62
20170211179
2017-07-27

Deposition apparatus

 #63
20170204509
2017-07-20

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

 #64
20170194129
2017-07-06

Processing system for small substrates

 #65
20170159170
2017-06-08

Film forming system

 #66
20170140907
2017-05-18

Sputtering apparatus and processing apparatus

 #67
20170114448
2017-04-27

Physical vapor deposition system using backside gas cooling of workpieces

 #68
20170088942
2017-03-30

PROCESS KIT SHIELD AND PHYSICAL VAPOR DEPOSITION CHAMBER HAVING SAME

 #69
20170029941
2017-02-02

High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process

 #70
20170018413
2017-01-19

Adjustable process spacing, centering, and improved gas conductance

 #71
20160362780
2016-12-15

Cover with a sensor system for a configurable measuring system for a configurable sputtering system

 #72
20160348237
2016-12-01

Film deposition apparatus

 #73
20160343550
2016-11-24

End block assembly, bearing assembly, and method for manufacturing a bearing assembly

 #74
20160333464
2016-11-17

Apparatus and method for multilayer deposition

 #75
20160326637
2016-11-10

Substrate carrier unit for a film deposition apparatus

 #76
20160326632
2016-11-10

Sputter unit

 #77
20160322206
2016-11-03

Process chamber and semiconductor processing apparatus

 #78
20160240355
2016-08-18

System and method for differential etching

 #79
20160240351
2016-08-18

PLASMA PRODUCING APPARATUS

 #80
20160189938
2016-06-30

One-piece process kit shield

 #81
20160130700
2016-05-12

Deposition apparatus

 #82
20160118231
2016-04-28

Method and device for generating an electrical discharge

 #83
20160099135
2016-04-07

Rectangular Hollow Sputter Source and Method of use Thereof

 #84
20160042928
2016-02-11

Sputtering apparatus

 #85
20150376771
2015-12-31

Deposition method

 #86
20150332900
2015-11-19

Method and table assembly for applying coatings to spherical components

 #87
20150284842
2015-10-08

THIN FILM FORMATION APPARATUS, SPUTTERING CATHODE, AND METHOD OF FORMING THIN FILM

 #88
20150284838
2015-10-08

Deposition systems and methods

 #89
20150279635
2015-10-01

Deposition system with multi-cathode and method of manufacture thereof

 #90
20150279401
2015-10-01

MAGNETIC RECORDING MEDIUM, METHOD FOR MANUFACTURING SAME, AND FILM-FORMING APPARATUS

 #91
20150243535
2015-08-27

CLUSTER TYPE SEMICONDUCTOR PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

 #92
20150235818
2015-08-20

Magnetron sputtering coating device, a nano-multilayer film, and the preparation method thereof

 #93
20150206714
2015-07-23

Reactive sputtering apparatus

 #94
20150197847
2015-07-16

Endblock for rotatable target with electrical connection between collector and rotor at pressure less than atmospheric pressure

 #95
20150170888
2015-06-18

Physical vapor deposition (PVD) target having low friction pads

 #96
20150167150
2015-06-18

Formation of an alignment film for a liquid crystal on a substrate

 #97
20150129414
2015-05-14

Process kit of physical vapor deposition chamber and fabricating method thereof

 #98
20150114825
2015-04-30

Systems and method of coating an interior surface of an object

 #99
20150107987
2015-04-23

Plasma generation apparatus, deposition apparatus, and plasma generation method

 #100
20150083333
2015-03-26

Plasma processor and plasma processing method

 #101
20150083332
2015-03-26

Plasma processor and plasma processing method

 #102
20150060263
2015-03-05

VACUUM FILM DEPOSITION DEVICE AND VACUUM FILM DEPOSITION METHOD

 #103
20150060261
2015-03-05

Target adapted to an indirect cooling device

 #104
20150056373
2015-02-26

DEPOSITION METHOD AND DEPOSITION APPARATUS

 #105
20150034481
2015-02-05

FASTENING MEMBER AND VACUUM DEVICE

 #106
20150021173
2015-01-22

SPUTTERING DEVICE

 #107
20150001068
2015-01-01

MANUFACTURING APPARATUS

 #108
20140353142
2014-12-04

Substrate processing apparatus, etching method of metal film, and manufacturing method of magnetoresistive effect element

 #109
20140346037
2014-11-27

SPUTTER DEVICE

 #110
20140332375
2014-11-13

Assembly for feeding in HF current for tubular cathodes

 #111
20140311895
2014-10-23

Glow Discharge Apparatus and Method with Lateral Rotating Arc Cathodes

 #112
20140284210
2014-09-25

Sputtering apparatus, target and shield

 #113
20140283743
2014-09-25

Processing apparatus and shield

 #114
20140262766
2014-09-18

Processing apparatus and shield

 #115
20140262764
2014-09-18

Methods and apparatus for reducing sputtering of a grounded shield in a process chamber

 #116
20140262753
2014-09-18

SEPARATION OF FUNCTION-BASED THIN-FILM DEPOSITION SYSTEMS AND METHOD FOR SYNTHESIS OF COMPLEX MATERIALS

 #117
20140260955
2014-09-18

Cylinder liners with adhesive metallic layers and methods of forming the cylinder liners

 #118
20140251800
2014-09-11

Sputter source for use in a semiconductor process chamber

 #119
20140216928
2014-08-07

THIN-FILM FORMATION SPUTTERING DEVICE

 #120
20140197026
2014-07-17

SPUTTERING APPARATUS AND METHOD FOR FORMING A TRANSMISSIVE CONDUCTIVE LAYER OF A LIGHT EMITTING DEVICE

 #121
20140158049
2014-06-12

Process kit shield for plasma enhanced processing chamber

 #122
20140076714
2014-03-20

Sputtering device

 #123
20140061033
2014-03-06

System and method for differential etching

 #124
20130299345
2013-11-14

Sputtering apparatus

 #125
20130284594
2013-10-31

Narrow source for physical vapor deposition processing

 #126
20130270107
2013-10-17

Off-angled heating of the underside of a substrate using a lamp assembly

 #127
20130256129
2013-10-03

Plasma processing apparatus

 #128
20130256127
2013-10-03

Substrate processing system having symmetric RF distribution and return paths

 #129
20130256126
2013-10-03

Substrate support with radio frequency (RF) return path

 #130
20130255576
2013-10-03

Process kit shield for plasma enhanced processing chamber

 #131
20130196514
2013-08-01

Off-angled heating of the underside of a substrate using a lamp assembly

 #132
20130186751
2013-07-25

Pinned target design for RF capacitive coupled plasma

 #133
20130174983
2013-07-11

Plasma processor and plasma processing method

 #134
20130042812
2013-02-21

Composite shielding

 #135
20130032468
2013-02-07

Vacuum processing apparatus, vacuum processing method, and electronic device manufacturing method

 #136
20130008777
2013-01-10

Cylindrical Rotating Magnetron Sputtering Cathode Device and Method of Depositing Material Using Radio Frequency Emissions

 #137
20120325651
2012-12-27

Sputtering apparatus and method of manufacturing electronic device

 #138
20120267244
2012-10-25

Sample receiving device for sample materials in ultra-high vacuum chambers

 #139
20120231633
2012-09-13

Off-angled heating of the underside of a substrate using a lamp assembly

 #140
20120181165
2012-07-19

IN-SITU GAS INJECTION FOR LINEAR TARGETS

 #141
20120152736
2012-06-21

Reactive sputtering apparatus

 #142
20120006492
2012-01-12

Plasma processor and plasma processing method

 #143
20120000772
2012-01-05

Deposition apparatus and methods to reduce deposition asymmetry

 #144
20110278165
2011-11-17

Process kit shield for improved particle reduction

 #145
20110278164
2011-11-17

SPUTTERING DEVICE

 #146
20110278163
2011-11-17

Sputtering apparatus having gas supply system

 #147
20110240464
2011-10-06

Apparatus for physical vapor deposition having centrally fed RF energy

 #148
20110203922
2011-08-25

Thin-film forming sputtering system

 #149
20110186426
2011-08-04

Adjustable process spacing, centering, and improved gas conductance

 #150
20110155059
2011-06-30

Thin film forming apparatus, thin film forming method, and shield component

 #151
20110139612
2011-06-16

Sputtering apparatus

 #152
20110064880
2011-03-17

VACUUM PROCESSING APPARATUS, VACUUM PROCESSING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD

 #153
20110036711
2011-02-17

SPUTTERING DEVICE

 #154
20100270144
2010-10-28

High Power Pulse Magnetron Sputtering For High Aspect-Ratio Features, Vias, and Trenches

 #155
20100252417
2010-10-07

HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMITY AND STEP-COVERAGE OF THIS PROCESS

 #156
20100129722
2010-05-27

Oxynitride sputtering target

 #157
20090050469
2009-02-26

Alignment film forming apparatus and method

 #158
20070158186
2007-07-12

Cathode sputtering gas distribution apparatus

 #159
20060260938
2006-11-23

Module for Coating System and Associated Technology

 #160
20060254904
2006-11-16

Ground shield for a PVD chamber

 #161
20060196414
2006-09-07

System for coating a substrate, and an insert element

 #162
20060081463
2006-04-20

Sputtering device

 #163
20050205421
2005-09-22

Sputtering apparatus

 #164
20050199491
2005-09-15

Shields usable with an inductively coupled plasma reactor

 #165
20050103620
2005-05-19

PLASMA SOURCE WITH SEGMENTED MAGNETRON CATHODE

 #166
15714069
2020-10-13

Cathode assemblies and sputtering systems

 #167
14313550
2017-10-31

System and method for providing a protective layer having a graded intermediate layer

 #168
12630940
2017-09-26

Cathode assemblies and sputtering systems