205409 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes operating with cathodic sputtering; Constructional aspects of the reactor Means for shaping the magnetic field, e.g. magnetic shunts
Anti-Stiction Process for Mems Device
#2SPUTTERING APPARATUS, APPARATUS FOR MANUFACTURING MAGNETIC RECORDING MEDIUM, THIN FILM FORMING METHOD, AND METHOD FOR MANUFACTURING MAGNETIC RECORDING MEDIUM
#3Beam Plasma Source Enhanced Magnetron Sputtering
#4SIMULTANEOUS ETCHING OF MULTI-FACETED SUBSTRATES
#5PLASMA PROCESS APPARATUS
#6STABLE GROUND ANODE FOR THIN FILM PROCESSING
#7BIAS MAGNETIC FIELD CONTROL METHOD, CONTROL DEVICE, AND SEMICONDUCTOR PROCESS EQUIPMENT
#8Vacuum deposition into trenches and vias
#9Physical vapor deposition apparatus and method thereof
#10SPUTTER MAGNETRON FOR OPERATING WITH OTHER PLASMA SOURCES
#11Deposition method for tuning magnetic field distribution of deposition equipment
#12Semiconductor apparatus and magnetic structure of semiconductor apparatus
#13Movable magnet array for magnetron sputtering
#14Multifocal magnetron design for physical vapor deposition processing on a single cathode
#15MAGNETIC-FIELD-DISTRIBUTION TUNER, DEPOSITION EQUIPMENT AND METHOD OF DEPOSITION
#16Physical vapor deposition apparatus and method thereof
#17EM SOURCE FOR ENHANCED PLASMA CONTROL
#18Anti-stiction process for MEMS device
#19Thermally controlled magnetic fields optimization system for sputter deposition processes
#20Film forming apparatus and film forming method
#21Method and apparatus for depositing a material
#22Depositing apparatus
#23Anti-stiction process for MEMS device
#24Physical vapor deposition apparatus and method thereof
#25Multifocal magnetron design for physical vapor deposition processing on a single cathode
#26Providing voice call support in a network
#27Systems and methods for uniform target erosion magnetic assemblies
#28Anti-stiction process for MEMS device
#29Flexible adjustable return path magnet assembly and methods
#30Laterally adjustable return path magnet assembly and methods
#31Surrounding field sputtering source
#32Method and apparatus for depositing a material
#33Magnetic Configuration for a Magnetron Sputter Deposition System
#34Sputtering apparatus
#35Magnetron assembly for physical vapor deposition chamber
#36Online adjustable magnet bar
#37Rotation plus vibration magnet for magnetron sputtering apparatus
#38Sputtering apparatus
#39Method of fine tuning a magnetron sputtering electrode in a rotatable cylindrical magnetron sputtering device
#40Sputtering apparatus and magnet unit
#41Intaglio printing plate coating apparatus
#42PVD plasma control using a magnet edge lift mechanism
#43Apparatus and arrangements of magnetic field generators to facilitate physical vapor deposition to form semiconductor films
#44Configurable variable position closed track magnetron
#45Adjustable shunt assembly for a sputtering magnetron and a method for adjusting such a shunt
#46Magnetic-field-generating apparatus for magnetron sputtering
#47Rotation plus vibration magnet for magnetron sputtering apparatus
#48Method of switching magnetic flux distribution
#49Magnetic field generator, magnetron cathode and spattering apparatus
#50MAGNETIC CIRCUIT FOR SPUTTERING APPARATUS
#51MAGNET FOR PHYSICAL VAPOR DEPOSITION PROCESSES TO PRODUCE THIN FILMS HAVING LOW RESISTIVITY AND NON-UNIFORMITY
#52CONTROL OF PLASMA PROFILE USING MAGNETIC NULL ARRANGEMENT BY AUXILIARY MAGNETS
#53Magnet arrangement for a target backing tube, target backing tube including the same, cylindrical target assembly and sputtering system
#54Magnetron design for RF/DC physical vapor deposition
#55Cylindrical magnetron having a shunt
#56TARGET ASSEMBLY FOR A MAGNETRON SPUTTERING APPARATUS, A MAGNETRON SPUTTERING APPARATUS AND A METHOD OF USING THE MAGNETRON SPUTTERING APPARATUS
#57Trim magnets to adjust erosion rate of cylindrical sputter targets
#58Magnet Structure and Cathode Electrode Unit for Magnetron Sputtering System, and Magnetron Sputtering System
#59HIGH POWER IMPULSE MAGNETRON SPUTTERING VAPOUR DEPOSITION
#60MAGNET ASSEMBLY CAPABLE OF GENERATING MAGNETIC FIELD HAVING DIRECTION THAT IS UNIFORM AND CAN BE CHANGED AND SPUTTERING APPARATUS USING THE SAME
#61Magnetron Sputtering Device In which Two Modes Of Magnetic Flux Distribution (Balanced Mode/Unbalanced Mode) Can Be Switched From One To The Other And Vice Versa, A Film Formation Method For Forming A Film From An Inorganic Film Formation Material Using The Device, And A Dual Mode Magnetron Sputtering Device And Film Formation Method For Forming A Film From An Inorganic Film Formation Material At A Low Temperature Using The Device
#62Method and apparatus for cylindrical magnetron sputtering using multiple electron drift paths
#63Enhanced magnetron sputtering target
#64Split magnet ring on a magnetron sputter chamber
#65Magnetically enhanced capacitive plasma source for ionized physical vapor deposition
#66Sputtering device for manufacturing thin films
#67Magnetically enhanced capacitive plasma source for ionized physical vapor deposition
#68Cathode structure for vacuum sputtering machine