205417 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes operating with cathodic sputtering; Testing and control Means for avoiding target poisoning
METHOD FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, DEVICE FOR PRODUCING AN OPTICAL ELEMENT, SECONDARY GAS AND PROJECTION EXPOSURE SYSTEM
#2Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor deposition
#3Sputtering method
#4Methods and apparatus for co-sputtering multiple targets
#5Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor deposition
#6PVD TOOL TO DEPOSIT HIGHLY REACTIVE MATERIALS
#7PVD TOOL TO DEPOSIT HIGHLY REACTIVE MATERIALS
#8Methods and apparatus for co-sputtering multiple targets
#9Sputtering apparatus
#10Thin film forming method
#11Reactive sputtering process
#12PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS
#13Substrate holding apparatus, mask alignment method, and vacuum processing apparatus using long taper pins and short taper pins for alignment
#14Dual Magnetron Sputtering Power Supply And Magnetron Sputtering Apparatus
#15REACTIVE SPUTTERING METHOD
#16Reactive sputtering method