Patents-Review.com
ClassID:

205414 ⎘

H01J37/3476 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes operating with cathodic sputtering Testing and control

Sub-classes:
Recent Application in this class:
#1
20260121005
2026-04-30

SYSTEM FOR TARGET ARCING MAPPING AND PLASMA DIAGNOSIS

 #2
20260088251
2026-03-26

System and Method for Atomic Layer Etching with Uniformity Control Mechanisms

 #3
20260049392
2026-02-19

PHYSICAL VAPOR DEPOSITION APPARATUS

 #4
20250329521
2025-10-23

SEMICONDUCTOR TOOL FOR COPPER DEPOSITION

 #5
20250308868
2025-10-02

SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS

 #6
20250305114
2025-10-02

Magnetron Sputtering Apparatus and Control Method for Timely Detecting Target Shorting by Monitoring Electrical Resistance Between PVD Target Cathode and Electrical Ground in Real Time

 #7
20250183074
2025-06-05

SENSOR SUBSTRATE AND INTEGRATED SENSING SURFACES

 #8
20250079142
2025-03-06

SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS

 #9
20240387156
2024-11-21

DEPOSITION SYSTEM AND METHOD

 #10
20240387155
2024-11-21

Method for Improving Deposition Process

 #11
20240360545
2024-10-31

PHYSICAL VAPOR DEPOSITION APPARATUS

 #12
20240347327
2024-10-17

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

 #13
20240304430
2024-09-12

REAL-TIME DETECTION OF PARTICULATE MATTER DURING DEPOSITION CHAMBER MANUFACTURING

 #14
20240274416
2024-08-15

PLASMA PROCESS SIMULATION METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING THE SAME

 #15
20240229228
2024-07-11

DEPOSITION OF NON-STOICHIOMETRIC METAL COMPOUND LAYER

 #16
20240213007
2024-06-27

Power Compensation in PVD Chambers

 #17
20240133025
2024-04-25

DEPOSITION OF NON-STOICHIOMETRIC METAL COMPOUND LAYER

 #18
20240117486
2024-04-11

FILM FORMING APPARATUS AND FILM FORMING METHOD

 #19
20240112897
2024-04-04

THIN FILM FORMING APPARATUS AND METHOD

 #20
20240096609
2024-03-21

Semiconductor processing tool and methods of operation

 #21
20240011148
2024-01-11

Film forming position misalignment correction method and film forming system

 #22
20230386809
2023-11-30

SEMICONDUCTOR TOOL FOR COPPER DEPOSITION

 #23
20230386808
2023-11-30

SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS

 #24
20230386807
2023-11-30

System and method for residual gas analysis

 #25
20230324754
2023-10-12

FABRICATION OF ELECTROCHROMIC DEVICES

 #26
20230314892
2023-10-05

FABRICATION OF ELECTROCHROMIC DEVICES

 #27
20230260770
2023-08-17

SEMICONDUCTOR TOOL FOR COPPER DEPOSITION

 #28
20230105515
2023-04-06

Two-dimensional electronic component and method of manufacturing same

 #29
20230104966
2023-04-06

METHOD FOR ATOMICALLY MANIPULATING AN ARTIFICIAL TWO-DIMENSIONAL MATERIAL AND APPARATUS THEREFOR

 #30
20230091273
2023-03-23

Deposition method for tuning magnetic field distribution of deposition equipment

 #31
20230067917
2023-03-02

Device and method for producing layers with improved uniformity in coating systems with horizontally rotating substrate and additional plasma sources

 #32
20230041439
2023-02-09

Physical vapor deposition apparatus

 #33
20230029343
2023-01-26

Sputtering apparatus, film formation method, and method for manufacturing product

 #34
20220406583
2022-12-22

DEPOSITION SYSTEM AND METHOD

 #35
20220384165
2022-12-01

Methods and apparatus for processing a substrate

 #36
20220359175
2022-11-10

ANALYZING METHOD

 #37
20220157583
2022-05-19

Niobium sputtering target

 #38
20220157582
2022-05-19

MAGNET BAR WITH ATTACHED SENSOR

 #39
20220148863
2022-05-12

Sputtering apparatus and sputtering method

 #40
20220115589
2022-04-14

Method for processing substrate, processing apparatus, and processing system

 #41
20220037137
2022-02-03

System and method for residual gas analysis

 #42
20220020578
2022-01-20

Methods and apparatus for processing a substrate

 #43
20220005680
2022-01-06

SPUTTERING DEVICE AND SPUTTERING METHOD

 #44
20210391158
2021-12-16

MAGNETRON WITH CONTROLLER FOR MONITORING AND CONTROL

 #45
20210332474
2021-10-28

Coating control using forward parameter correction and adapted reverse engineering

 #46
20210287888
2021-09-16

Dual reverse pulse sputtering system

 #47
20210247322
2021-08-12

Measuring apparatus and film forming apparatus

 #48
20210156893
2021-05-27

Arc detector for detecting arcs, plasma system and method of detecting arcs

 #49
20210111010
2021-04-15

RATE ENHANCED PULSED DC SPUTTERING SYSTEM

 #50
20210108308
2021-04-15

Film manufacturing apparatus and manufacturing method of double-sided laminated film

 #51
20210040605
2021-02-11

Sputtering method

 #52
20210005436
2021-01-07

Real-time detection of particulate matter during deposition chamber manufacturing

 #53
20200379310
2020-12-03

Fabrication of electrochromic devices

 #54
20200233278
2020-07-23

Fabrication of electrochromic devices

 #55
20200201132
2020-06-25

Fabrication of electrochromic devices

 #56
20200168444
2020-05-28

Analyzing method

 #57
20200090909
2020-03-19

FILLING A CAVITY IN A SUBSTRATE USING SPUTTERING AND DEPOSITION

 #58
20200090906
2020-03-19

Feedback system

 #59
20200075299
2020-03-05

Method for improving deposition process

 #60
20190390324
2019-12-26

Apparatus and methods for depositing variable interference filters

 #61
20190331977
2019-10-31

Fabrication of electrochromic devices

 #62
20190284685
2019-09-19

THIN FILM FORMATION APPARATUS, SPUTTERING CATHODE, AND METHOD OF FORMING THIN FILM

 #63
20190107764
2019-04-11

FABRICATION OF ELECTROCHROMIC DEVICES

 #64
20190096643
2019-03-28

Smart chamber and smart chamber components

 #65
20190057850
2019-02-21

Sputtering gap measurement apparatus and magnetron sputtering device

 #66
20190011797
2019-01-10

Fabrication of electrochromic devices

 #67
20190003038
2019-01-03

Apparatus and method for film formation by physical sputtering

 #68
20180298488
2018-10-18

FILM FORMATION APPARATUS AND FILM FORMATION METHOD

 #69
20180291500
2018-10-11

Plasma chamber target for reducing defects in workpiece during dielectric sputtering

 #70
20180254172
2018-09-06

Sputtering apparatus, film deposition method, and control device

 #71
20180245197
2018-08-30

CERAMIC METALLIC COATINGS

 #72
20180211825
2018-07-26

Sputtering target having RFID information

 #73
20180174808
2018-06-21

Sputtering apparatus and sputtering method

 #74
20180130648
2018-05-10

Rate enhanced pulsed DC sputtering system

 #75
20180108520
2018-04-19

Rate enhanced pulsed DC sputtering system

 #76
20180067370
2018-03-08

FABRICATION OF ELECTROCHROMIC DEVICES

 #77
20180046053
2018-02-15

Fabrication of electrochromic devices

 #78
20180044781
2018-02-15

Pulse shape controller for sputter sources

 #79
20180025895
2018-01-25

Physical vapor deposition (PVD) plasma energy control per dynamic magnetron control

 #80
20170342547
2017-11-30

Sputtering apparatus and sputtering method using the same

 #81
20170330796
2017-11-16

Filling a cavity in a substrate using sputtering and deposition

 #82
20170330737
2017-11-16

Treating arcs in a plasma process

 #83
20170309459
2017-10-26

Method and Device for Particle Measurement

 #84
20170278686
2017-09-28

Ionized physical vapor deposition (IPVD) apparatus and method for an inductively coupled plasma sweeping source

 #85
20170268098
2017-09-21

Film formation apparatus and film formation method

 #86
20170263423
2017-09-14

DEVICE EQUIPPED WITH AN ION BEAM SOURCE FOR COATING A SUBSTRATE IN A VACUUM CHAMBER

 #87
20170250061
2017-08-31

Vacuum device

 #88
20170213706
2017-07-27

RF sputtering apparatus and sputtering method

 #89
20170183768
2017-06-29

METHODS AND APPARATUS FOR STABLE SUBSTRATE PROCESSING WITH MULTIPLE RF POWER SUPPLIES

 #90
20170178879
2017-06-22

Sputtering system and method including an arc detection

 #91
20170167010
2017-06-15

APPARATUS AND METHOD FOR DEPOSITING HYDROGEN-FREE TA-C LAYERS ON WORKPIECES AND WORKPIECE

 #92
20170159170
2017-06-08

Film forming system

 #93
20170140907
2017-05-18

Sputtering apparatus and processing apparatus

 #94
20170040151
2017-02-09

GENERATOR OF TRANSIENT, HEAVY ELECTRONS AND APPLICATION TO TRANSMUTING RADIOACTIVE FISSION PRODUCTS

 #95
20170029940
2017-02-02

Sputter System for Uniform Sputtering

 #96
20170029936
2017-02-02

HIGH POWER PULSE IONIZED PHYSICAL VAPOR DEPOSITION

 #97
20170022604
2017-01-26

Systems and methods for single magnetron sputtering

 #98
20170004995
2017-01-05

Film Forming Apparatus and Film Forming Method

 #99
20160376694
2016-12-29

Method and Apparatus for Coating Nanoparticulate Films on Complex Substrates

 #100
20160362780
2016-12-15

Cover with a sensor system for a configurable measuring system for a configurable sputtering system

 #101
20160326632
2016-11-10

Sputter unit

 #102
20160314946
2016-10-27

Rate enhanced pulsed DC sputtering system

 #103
20160289815
2016-10-06

Method and apparatus for depositing a material

 #104
20160276583
2016-09-22

Method of manufacturing tunnel magnetoresistive effect element and sputtering apparatus

 #105
20160247667
2016-08-25

Sputtering apparatus

 #106
20160215386
2016-07-28

MODULATION OF REVERSE VOLTAGE LIMITED WAVEFORMS IN SPUTTERING DEPOSITION CHAMBERS

 #107
20160209723
2016-07-21

Defect-mitigation layers in electrochromic devices

 #108
20160185605
2016-06-30

COPPER SUBSTRATE FOR DEPOSITION OF GRAPHENE

 #109
20160168686
2016-06-16

Target age compensation method for performing stable reactive sputtering processes

 #110
20160109502
2016-04-21

Method for inspecting magnetron

 #111
20160108515
2016-04-21

METHOD FOR FILLING VIAS AND SUBSTRATE-VIA FILLING VACUUM PROCESSING SYSTEM

 #112
20160079045
2016-03-17

Sputtering apparatus, film deposition method, and control device

 #113
20160076139
2016-03-17

Sustained self-sputtering of lithium for lithium physical vapor deposition

 #114
20160071708
2016-03-10

METHOD AND APPARATUS FOR SURFACE PROCESSING OF A SUBSTRATE USING AN ENERGETIC PARTICLE BEAM

 #115
20160056026
2016-02-25

PROCESSING APPARATUS

 #116
20160042928
2016-02-11

Sputtering apparatus

 #117
20160033840
2016-02-04

Defect-mitigation layers in electrochromic devices

 #118
20150284842
2015-10-08

THIN FILM FORMATION APPARATUS, SPUTTERING CATHODE, AND METHOD OF FORMING THIN FILM

 #119
20150262798
2015-09-17

Smart chamber and smart chamber components

 #120
20150194295
2015-07-09

ASSEMBLY FOR USE IN A VACUUM TREATMENT PROCESS

 #121
20150171258
2015-06-18

METHOD AND SYSTEM OF PROVIDING DOPANT CONCENTRATION CONTROL IN DIFFERENT LAYERS OF A SEMICONDUCTOR DEVICE

 #122
20150162173
2015-06-11

Method for producing a multilayer coating and device for carrying out said method

 #123
20150114562
2015-04-30

SUBSTRATE PROCESSING APPARATUS

 #124
20150034478
2015-02-05

Cathodic arc deposition

 #125
20140246310
2014-09-04

Sputtering apparatus

 #126
20140238843
2014-08-28

Variable radius dual magnetron

 #127
20140174917
2014-06-26

Recycling method for tantalum coil for sputtering and tantalum coil obtained by the recycling method

 #128
20120045588
2012-02-23

Deposition system with a rotating drum

 #129
20120000765
2012-01-05

METHODS OF ARC DETECTION AND SUPPRESSION DURING RF SPUTTERING OF A THIN FILM ON A SUBSTRATE

 #130
20110209986
2011-09-01

Sputtering apparatus, sputtering method, and electronic device manufacturing method

 #131
20100326815
2010-12-30

High Power Pulse Ionized Physical Vapor Deposition

 #132
20100111648
2010-05-06

Substrate processing apparatus and particle adhesion preventing method

 #133
20100012482
2010-01-21

Sputtering system and method including an arc detection

 #134
20090098306
2009-04-16

Method and apparatus for surface processing of a substrate using an energetic particle beam

 #135
20060151312
2006-07-13

Method for producing a multilayer coating and device for carrying out said method

 #136
20050252763
2005-11-17

High deposition rate sputtering

 #137
20050178654
2005-08-18

High deposition rate sputtering

 #138
19098014
2025-09-02

Optimizing cadmium (Cd) alloy solar cells with sputtered copper-doped zinc telluride (ZnTe:Cu) back contacts in the presence of hydrogen

 #139
18931664
2025-09-09

System for target arcing mapping and plasma diagnosis