Patents-Review.com
ClassID:

205419 ⎘

H01J37/3491 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes operating with cathodic sputtering; Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus Manufacturing of targets

Recent Application in this class:
#1
20250361599
2025-11-27

TUNGSTEN SILICIDE TARGET AND METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING TUNGSTEN SILICIDE FILM

 #2
20250197987
2025-06-19

MOLYBDENUM SPUTTERING TARGET ASSEMBLY AND METHOD OF MAKING

 #3
20250191901
2025-06-12

MULTIFACETED TARGET FOR AN ION SOURCE

 #4
20250149318
2025-05-08

HIGH PURITY SULFUR-DOPED COPPER SPUTTERING TARGET ASSEMBLY AND METHOD FOR PRODUCING SAME

 #5
20230272521
2023-08-31

Sputtering target, manufacturing method therefor, and manufacturing method for magnetic recording medium

 #6
20230272520
2023-08-31

MANUFACTURE AND REFILL OF SPUTTERING TARGETS

 #7
20230260769
2023-08-17

HIGH PURITY SULFUR-DOPED COPPER SPUTTERING TARGET ASSEMBLY AND METHOD FOR PRODUCING SAME

 #8
20230212734
2023-07-06

Yttrium ingot and sputtering target in which the yttrium ingot is used

 #9
20230143320
2023-05-11

Sputter trap having a thin high purity coating layer and method of making the same

 #10
20230125486
2023-04-27

Nonmagnetic material-dispersed Fe-Pt based sputtering target

 #11
20220319824
2022-10-06

RUTHENIUM-BASED SPUTTERING TARGET AND METHOD FOR MANUFACTURING SAME

 #12
20220148864
2022-05-12

Partial spray refurbishment of sputtering targets

 #13
20220139685
2022-05-05

Profiled sputtering target and method of making the same

 #14
20210269911
2021-09-02

SPUTTERING TARGET

 #15
20210269910
2021-09-02

Mn—Ta—W—Cu—O-based sputtering target, and production method therefor

 #16
20210172057
2021-06-10

Joined Body of Target Material and Backing Plate, and Method for Producing Joined Body of Target Material and Backing Plate

 #17
20210071293
2021-03-11

PROCESS FOR PREPARING A TUBULAR ARTICLE

 #18
20210050194
2021-02-18

Large-grain tin sputtering target

 #19
20210025049
2021-01-28

Tungsten Silicide Target Member And Method For Manufacturing Same, And Method For Manufacturing Tungsten Silicide Film

 #20
20200385853
2020-12-10

Sputtering target

 #21
20200381225
2020-12-03

Multi-block sputtering target and associated methods and articles

 #22
20200294778
2020-09-17

Sputtering target with backside cooling grooves

 #23
20200240004
2020-07-30

Sputter trap having multimodal particle size distribution

 #24
20200115791
2020-04-16

Method of manufacturing sputtering target and sputtering target

 #25
20200115790
2020-04-16

Method of manufacturing sputtering target and sputtering target

 #26
20200080191
2020-03-12

Structure and method to fabricate highly reactive physical vapor deposition target

 #27
20200048761
2020-02-13

Sputter trap having a thin high purity coating layer and method of making the same

 #28
20190360090
2019-11-28

CYLINDRICAL SPUTTERING TARGET AND METHOD FOR PRODUCING SAME

 #29
20190299324
2019-10-03

Process for producing sputtering target and sputtering target

 #30
20190259588
2019-08-22

Oxide sintered body and method for manufacturing the same, sputtering target, and semiconductor device

 #31
20190242009
2019-08-08

Mn—Zn—O sputtering target and production method therefor

 #32
20190221408
2019-07-18

Sputtering target

 #33
20190214237
2019-07-11

Multi-block sputtering target and associated methods and articles

 #34
20190157053
2019-05-23

Vacuum processing apparatus and operating method of vacuum processing apparatus

 #35
20190078195
2019-03-14

Sputtering target capable of stabilizing ignition

 #36
20180355473
2018-12-13

Sputtering target

 #37
20180342378
2018-11-29

Sputtering target with backside cooling grooves

 #38
20180340254
2018-11-29

Coating source

 #39
20180327896
2018-11-15

Sputtering target

 #40
20180312960
2018-11-01

METHOD OF MAKING LOW RESISTIVITY TUNGSTEN SPUTTER TARGETS AND TARGETS MADE THEREBY

 #41
20180308671
2018-10-25

Profiled sputtering target and method of making the same

 #42
20180277341
2018-09-27

Fluoro-based polymer composite target for sputtering

 #43
20180223419
2018-08-09

Processes for low pressure, cold bonding of solid lithium to metal substrates

 #44
20180211825
2018-07-26

Sputtering target having RFID information

 #45
20180190476
2018-07-05

Multi-block sputtering target and associated methods and articles

 #46
20180186699
2018-07-05

Mn—Zn—W—O sputtering target and production method therefor

 #47
20180171465
2018-06-21

Sputter trap having multimodal particle size distribution

 #48
20180105925
2018-04-19

PROCESS FOR PREPARING A TUBULAR ARTICLE

 #49
20180105421
2018-04-19

Coating source for producing doped carbon layers

 #50
20180100231
2018-04-12

Lithium-containing transition metal oxide target

 #51
20180073134
2018-03-15

Cylindrical compact, manufacturing method of cylindrical sputtering target, and manufacturing method of cylindrical sintered compact

 #52
20180051371
2018-02-22

Methods of forming rotary sputtering target

 #53
20180044778
2018-02-15

SPUTTERING TARGET HAVING REVERSE BOWNG TARGET GEOMETRY

 #54
20180019108
2018-01-18

Sputtering target with backside cooling grooves

 #55
20180010241
2018-01-11

Sputtering target and/or coil, and process for producing same

 #56
20170283941
2017-10-05

Cathode assembly

 #57
20170268097
2017-09-21

Target assembly

 #58
20170229295
2017-08-10

SPUTTERING DEVICE COMPONENT WITH MODIFIED SURFACE AND METHOD OF MAKING

 #59
20170213711
2017-07-27

Copper alloy sputtering target and manufacturing method of copper alloy sputtering target

 #60
20170130328
2017-05-11

Target material for sputtering and method for manufacturing same

 #61
20170121811
2017-05-04

Sputtering target comprising Ni—P alloy or Ni—Pt—P alloy and production method therefor

 #62
20170092773
2017-03-30

Oxide sputtering target, and thin film transistor using the same

 #63
20170069474
2017-03-09

Oxide sintered body and method for manufacturing the same, sputtering target, and semiconductor device

 #64
20160348231
2016-12-01

Processes for refurbishing a spent sputtering target

 #65
20160343553
2016-11-24

Gold or platinum target, and production method for same

 #66
20160333461
2016-11-17

Methods for surface preparation of sputtering target

 #67
20160326633
2016-11-10

Sputtering target and method for making the same

 #68
20160284524
2016-09-29

Cylindrical sputtering target

 #69
20160281214
2016-09-29

Cylindrical sputtering target, cylindrical compact, manufacturing method of cylindrical sputtering target, and manufacturing method of cylindrical sintered compact

 #70
20160254128
2016-09-01

SPUTTERING TARGET AND PROCESS FOR PRODUCING IT

 #71
20160229029
2016-08-11

Optimized textured surfaces and methods of optimizing

 #72
20160196961
2016-07-07

Multi-block sputtering target and associated methods and articles

 #73
20160194749
2016-07-07

Manufacturing method of cylindrical sputtering target material

 #74
20160189941
2016-06-30

Methods and apparatus for nodule control in a titanium-tungsten target

 #75
20160177437
2016-06-23

Method for preparing ultra-long-tube type fine-grain molybdenum tube target

 #76
20160141159
2016-05-19

Cylindrical sputtering target and process for producing the same

 #77
20160111264
2016-04-21

Oxide sintered body and sputtering target, and method for producing same

 #78
20160071705
2016-03-10

Backing plate-integrated metal sputtering target and method of producing same

 #79
20160064200
2016-03-03

Li-containing oxide target assembly

 #80
20160032445
2016-02-04

Plasma processing apparatus and plasma processing method

 #81
20150279636
2015-10-01

PARTICLE FREE ROTARY TARGET AND METHOD OF MANUFACTURING THEREOF

 #82
20150255611
2015-09-10

Oxide sputtering target, and thin film transistor using the same

 #83
20150255260
2015-09-10

NbO2 sintered compact, sputtering target comprising the sintered compact, and method of producing NbO2 sintered compact

 #84
20150248996
2015-09-03

Oxide sintered body and sputtering target, and method for producing same

 #85
20150211107
2015-07-30

Method for preparing high-performance tantalum target

 #86
20150155143
2015-06-04

Apparatus and method for improved darkspace gap design in RF sputtering chamber

 #87
20150122642
2015-05-07

Sputtering target and method for producing the same

 #88
20150071413
2015-03-12

Method of aging X-ray generator having carbon nanotube electron emitter

 #89
20150047975
2015-02-19

Sputtering target with backside cooling grooves

 #90
20150034482
2015-02-05

Copper alloy sputtering target and manufacturing method of copper alloy sputtering target

 #91
20140322063
2014-10-30

Process for producing FePt-based sputtering target

 #92
20140322062
2014-10-30

Process for producing FePt-based sputtering target

 #93
20140318955
2014-10-30

FePt-based sputtering target

 #94
20140318954
2014-10-30

FePt-based sputtering target

 #95
20140262768
2014-09-18

Plating stack to condition a bonding surface

 #96
20140027276
2014-01-30

Tubular target having a protective device

 #97
20130270108
2013-10-17

Indium sputtering target and method for manufacturing same

 #98
20130112556
2013-05-09

Sputtering target and/or coil, and process for producing same

 #99
20130087453
2013-04-11

Method for forming sputter target assemblies having a controlled solder thickness

 #100
20120285826
2012-11-15

Multi-block sputtering target and associated methods and articles

 #101
20120245725
2012-09-27

Manufacturing method and system of target

 #102
20120228132
2012-09-13

Sputtering target-backing plate assembly, and its production method

 #103
20120103803
2012-05-03

Tube target

 #104
20120063947
2012-03-15

Molybdenum-based target and process for producing a target by thermal spraying

 #105
20120055783
2012-03-08

Process for producing a target by thermal spraying

 #106
20110220489
2011-09-15

ROTATABLE TARGET, BACKING TUBE, SPUTTERING INSTALLATION AND METHOD FOR PRODUCING A ROTATABLE TARGET

 #107
20110220488
2011-09-15

Apparatus and method for improved darkspace gap design in RF sputtering chamber

 #108
20110168555
2011-07-14

ROTARY SPUTTERING TARGET AND APPARATUS FOR MANUFACTURE

 #109
20110100808
2011-05-05

CYLINDRICAL SPUTTERING TARGET AND PROCESS FOR PRODUCING THE SAME

 #110
20110062020
2011-03-17

Rotary Target Assembly and Rotary Target

 #111
20100206724
2010-08-19

Method of Producing Sintered Compact, Sintered Compact, Sputtering Target Formed from the same, and Sputtering Target-Backing Plate Assembly

 #112
20100101946
2010-04-29

ROTATABLE SPUTTER TARGET BACKING CYLINDER, ROTATABLE SPUTTER TARGET, METHODS OF PRODUCING AND RESTORING A ROTATABLE SPUTTER TARGET, AND COATING INSTALLATION

 #113
20100078321
2010-04-01

Method for assembling at least two plates and use of the method for preparing an ion beam sputtering assembly

 #114
20100012488
2010-01-21

SPUTTER TARGET ASSEMBLY HAVING A LOW-TEMPERATURE HIGH-STRENGTH BOND

 #115
20090152108
2009-06-18

Target arrangement

 #116
20090139862
2009-06-04

Rotatable sputter target

 #117
20090078570
2009-03-26

TARGET/BACKING PLATE CONSTRUCTIONS, AND METHODS OF FORMING TARGET/BACKING PLATE CONSTRUCTIONS

 #118
20080296352
2008-12-04

BONDING METHOD FOR CYLINDRICAL TARGET

 #119
20080173541
2008-07-24

Target designs and related methods for reduced eddy currents, increased resistance and resistivity, and enhanced cooling

 #120
20080138620
2008-06-12

Method for preparing by thermal spraying a silicon-and zirconium-based target

 #121
20080135405
2008-06-12

Metal Double-Layer Structure and Method For Manufacturing the Same and Regeneration Method of Sputtering Target Employing That Method

 #122
20080121521
2008-05-29

Plasma sputtering target assembly and manufacturing method therefor

 #123
20080006528
2008-01-10

Method for forming sputter target assemblies having a controlled solder thickness

 #124
20070158177
2007-07-12

Method and device for magnetron sputtering

 #125
20070074969
2007-04-05

Very long cylindrical sputtering target and method for manufacturing

 #126
20070062809
2007-03-22

Method of manufacturing a rotary sputtering target using a mold

 #127
20070007131
2007-01-11

Variable thickness plate for forming variable wall thickness physical vapor deposition target

 #128
20060289305
2006-12-28

Centering mechanism for aligning sputtering target tiles

 #129
20060266639
2006-11-30

Sputtering target tiles having structured edges separated by a gap

 #130
20060233965
2006-10-19

Process and apparatus for the manufacture of a sputtering target

 #131
20060137969
2006-06-29

Method of manufacturing alloy sputtering targets

 #132
20060032735
2006-02-16

Rejuvenation of refractory metal products

 #133
20050279630
2005-12-22

Tubular sputtering targets and methods of flowforming the same

 #134
20050183797
2005-08-25

Fine grained sputtering targets of cobalt and nickel base alloys made via casting in metal molds followed by hot forging and annealing and methods of making same

 #135
20050167015
2005-08-04

Hollow cathode target and methods of making same

 #136
20050142000
2005-06-30

Plasma-based gas treatment system integrated in a vacuum pump

 #137
20050115045
2005-06-02

High purity ferromagnetic sputter target, assembly and method of manufacturing same

 #138
20050082258
2005-04-21

Methods of treating non-sputtered regions of PVD target constructions to form particle traps

 #139
20050072668
2005-04-07

Sputter target having modified surface texture