Patents-Review.com
ClassID:

205418 ⎘

H01J37/3488 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes operating with cathodic sputtering Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus

Sub-classes:
Recent Application in this class:
#1
20250329521
2025-10-23

SEMICONDUCTOR TOOL FOR COPPER DEPOSITION

 #2
20250129467
2025-04-24

PVD TARGET STRUCTURE AND METHOD FOR PREPARING THE SAME

 #3
20250101572
2025-03-27

MULTICATHODE PVD SYSTEM FOR HIGH ASPECT RATIO BARRIER SEED DEPOSITION

 #4
20240412949
2024-12-12

Remote Plasma Device and Plasma Processing Apparatus

 #5
20240404804
2024-12-05

Reference Box for Direct-Drive Radiofrequency Power Supply

 #6
20240247365
2024-07-25

Multicathode PVD system for high aspect ratio barrier seed deposition

 #7
20240162021
2024-05-16

Sputtering Apparatus

 #8
20240068089
2024-02-29

Deposition equipment with shielding mechanism

 #9
20230386809
2023-11-30

SEMICONDUCTOR TOOL FOR COPPER DEPOSITION

 #10
20230323525
2023-10-12

SUBSTRATE PROCESSING APPARATUS AND COVER RING ASSEMBLY

 #11
20230260770
2023-08-17

SEMICONDUCTOR TOOL FOR COPPER DEPOSITION

 #12
20230203642
2023-06-29

LOADED BODY, APPARATUS FOR PRODUCINGLOADED BODY AND METHOD FOR PRODUCING LOADED BODY

 #13
20230187191
2023-06-15

Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process

 #14
20230164903
2023-05-25

Microwave driven plasma ion source

 #15
20230022946
2023-01-26

METHOD AND SYSTEM FOR REMOVING L-FC IN PLASMA ETCHING PROCESS

 #16
20220415637
2022-12-29

Cleaning of SIN with CCP plasma or RPS clean

 #17
20220415636
2022-12-29

Cleaning of sin with CCP plasma or RPS clean

 #18
20220415635
2022-12-29

Thermal management hardware for uniform temperature control for enhanced bake-out for cluster tool

 #19
20220384159
2022-12-01

Sputter deposition

 #20
20220380887
2022-12-01

Physical vapor deposition chamber and physical vapor deposition apparatus

 #21
20220307122
2022-09-29

SURFACE TREATMENT DEVICE

 #22
20220223367
2022-07-14

REDUCED SUBSTRATE PROCESS CHAMBER CAVITY VOLUME

 #23
20220199381
2022-06-23

High power pulse systems for surface processing

 #24
20220186361
2022-06-16

Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process

 #25
20220154329
2022-05-19

Isolator ring clamp and physical vapor deposition chamber incorporating same

 #26
20220098724
2022-03-31

Vacuum system and method to deposit a compound layer

 #27
20220059328
2022-02-24

Coating device for curved substrate and coating method containing the same

 #28
20210287916
2021-09-16

Substrate processing device and method of manufacturing substrate processing device

 #29
20210254212
2021-08-19

Film formation apparatus and moisture removal method thereof

 #30
20210202221
2021-07-01

MAGNETRON SPUTTERING APPARATUS AND CATHODE DEVICE THEREOF

 #31
20210130948
2021-05-06

Lattice coat surface enhancement for chamber components

 #32
20210040605
2021-02-11

Sputtering method

 #33
20200370166
2020-11-26

Film formation device for cutting tool provided with coating film, and film formation method for cutting tool provided with coating film

 #34
20200335654
2020-10-22

Sputter deposition apparatus including roller assembly and method

 #35
20200321202
2020-10-08

SHIELD KIT FOR PROCESS CHAMBER

 #36
20200185188
2020-06-11

MECHANICAL FEEDTHROUGH APPARATUS

 #37
20200168759
2020-05-28

Method of manufacturing substrate with a transparent conductive film, manufacturing apparatus of substrate with transparent conductive film, substrate with transparent conductive film, and solar cell

 #38
20200123648
2020-04-23

VACUUM SPUTTERING APPARATUS AND ITS VACUUM ATMOSPHERE EXCHANGE DEVICE

 #39
20200083023
2020-03-12

Portable plasma device

 #40
20200027708
2020-01-23

Sputtering device

 #41
20190390327
2019-12-26

Apparatus for depositing material on the surface of a substrate

 #42
20190378701
2019-12-12

DEPOSITION GUARD PLATE AND SPUTTERING DEVICE

 #43
20190267220
2019-08-29

Shield for a substrate processing chamber

 #44
20190181028
2019-06-13

Cryogenically cooled rotatable electrostatic chuck

 #45
20190103301
2019-04-04

Holding apparatus

 #46
20190088450
2019-03-21

Beam intensity converting film, and method of manufacturing beam intensity converting film

 #47
20190074167
2019-03-07

Film formation apparatus

 #48
20190057850
2019-02-21

Sputtering gap measurement apparatus and magnetron sputtering device

 #49
20190010603
2019-01-10

ELECTROSTATIC CHUCKING OF COVER GLASS SUBSTRATES IN A VACUUM COATING PROCESS

 #50
20180350573
2018-12-06

Inflatable seal for media cooling

 #51
20180350572
2018-12-06

Process kit for multi-cathode processing chamber

 #52
20180247799
2018-08-30

Deposition apparatus and physical vapor deposition chamber

 #53
20180226237
2018-08-09

High Throughput Vacuum Deposition Sources and System

 #54
20180209036
2018-07-26

Sputtering apparatus and target changing device thereof

 #55
20180171463
2018-06-21

System architecture for combined static and pass-by processing

 #56
20180151337
2018-05-31

Process kit and method for processing a substrate

 #57
20180144913
2018-05-24

Tubular target

 #58
20180108519
2018-04-19

POWER DELIVERY FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING (HiPIMS)

 #59
20180076010
2018-03-15

Textured skin for chamber components

 #60
20180073150
2018-03-15

Single oxide metal deposition chamber

 #61
20170211179
2017-07-27

Deposition apparatus

 #62
20170110301
2017-04-20

Sputtering apparatuses and methods of manufacturing a magnetic memory device using the same

 #63
20170032946
2017-02-02

INTEGRATED ANODE AND ACTIVATED REACTIVE GAS SOURCE FOR USE IN A MAGNETRON SPUTTERING DEVICE

 #64
20170022604
2017-01-26

Systems and methods for single magnetron sputtering

 #65
20170018412
2017-01-19

Sputtering apparatus

 #66
20170011951
2017-01-12

Apparatus for depositing a layer on a substrate in a processing gas

 #67
20170002461
2017-01-05

Process kit having tall deposition ring and deposition ring clamp

 #68
20160326632
2016-11-10

Sputter unit

 #69
20160276204
2016-09-22

Method of manufacturing semiconductor device and semiconductor manufacturing apparatus

 #70
20160226065
2016-08-04

Density modulated thin film electrodes, methods of making same, and applications of same

 #71
20160214136
2016-07-28

Shield mask mounting fitting for a sputtering apparatus

 #72
20160186312
2016-06-30

Magnetron-sputtering coating system and method, and display substrate

 #73
20160099264
2016-04-07

System and method of manufacturing a thin film transistor substrate

 #74
20160093478
2016-03-31

High throughput vacuum deposition sources and system

 #75
20160086779
2016-03-24

Method of manufacturing semiconductor device and sputtering apparatus

 #76
20160071708
2016-03-10

METHOD AND APPARATUS FOR SURFACE PROCESSING OF A SUBSTRATE USING AN ENERGETIC PARTICLE BEAM

 #77
20160071707
2016-03-10

PROCESSING APPARATUS

 #78
20160068948
2016-03-10

Defect reduction in meta-mode sputter coatings

 #79
20160027624
2016-01-28

SPUTTERING APPARATUS

 #80
20160018818
2016-01-21

In-situ monitoring of fabrication of integrated computational elements

 #81
20150380223
2015-12-31

Holding assembly for substrate processing chamber

 #82
20150262798
2015-09-17

Smart chamber and smart chamber components

 #83
20150225841
2015-08-13

METHOD OF PROCESSING A SUBSTRATE

 #84
20150179418
2015-06-25

MINIATURE PHYSICAL VAPOUR DEPOSITION STATION

 #85
20150170891
2015-06-18

PARTICLE BACKFLOW PREVENTING PART AND SUBSTRATE PROCESSING APPARATUS

 #86
20130270107
2013-10-17

Off-angled heating of the underside of a substrate using a lamp assembly

 #87
20130256129
2013-10-03

Plasma processing apparatus

 #88
20130196514
2013-08-01

Off-angled heating of the underside of a substrate using a lamp assembly

 #89
20130043128
2013-02-21

SPUTTERING SYSTEM

 #90
20120231633
2012-09-13

Off-angled heating of the underside of a substrate using a lamp assembly

 #91
20120125764
2012-05-24

METHOD FOR PRODUCING OXIDE THIN FILM

 #92
20120012459
2012-01-19

Integrated anode and activated reactive gas source for use in magnetron sputtering device

 #93
20110220487
2011-09-15

Protective enclosure for an ion gun, device for depositing materials through vacuum evaporation comprising such a protective enclosure and method for depositing materials

 #94
20110209985
2011-09-01

Physical vapor deposition with heat diffuser

 #95
20090098306
2009-04-16

Method and apparatus for surface processing of a substrate using an energetic particle beam

 #96
20070102286
2007-05-10

Process kit and target for substrate processing chamber