206999 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Cleaning; Cleaning during device manufacture during, before or after processing of insulating layers
Processing systems and methods for halide scavenging
#602Processing systems and methods for halide scavenging
#603Methods for wet clean of oxide layers over epitaxial layers
#604Processing systems and methods for halide scavenging
#605Processing systems and methods for halide scavenging
#606Cleaning solution comprising an ether acetate for preventing pattern collapse
#607Substrate processing method
#608Rinse solution for lithography and pattern formation method employing the same
#609Method for low temperature bonding and bonded structure
#610Etching apparatus
#611Ion implantation methods
#612NOR flash device manufacturing method
#613Substrate cleaning method and substrate cleaning system
#614Substrate treatment method and substrate treatment apparatus
#615Passivation Layer and Method of Making a Passivation Layer
#616Method for in-situ dry cleaning, passivation and functionalization of Ge semiconductor surfaces
#617Method of forming a semiconductor structure including a wet etch process for removing silicon nitride
#618Method for in-situ dry cleaning, passivation and functionalization of Si—Ge semiconductor surfaces
#619Method of fabricating semiconductor cleaners
#620Process gas generation for cleaning of substrates
#621Method of producing semiconductor wafer, and semiconductor wafer
#622Integrated processing of porous dielectric, polymer-coated substrates and epoxy within a multi-chamber vacuum system confirmation
#623Photo lithographic rinse solution and method of manufacturing a semiconductor device using the same
#624Method of operating film deposition apparatus and film deposition apparatus
#625Method and apparatus for enhanced cleaning and inspection
#626METHOD OF REMOVING RESIDUE DURING SEMICONDUCTOR DEVICE FABRICATION
#627ETCH REMNANT REMOVAL
#628INCREASED TRANSISTOR PERFORMANCE BY IMPLEMENTING AN ADDITIONAL CLEANING PROCESS IN A STRESS LINER APPROACH
#629Method for reducing damage to low-k gate spacer during etching
#630Manufacturing method of a semiconductor device
#631Formation of SiOCl-containing layer on spacer sidewalls to prevent CD loss during spacer etch
#632Method of fabricating semiconductor cleaners
#633METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE
#634Particle reducing method
#635Method for manufacturing optical semiconductor device
#636Treatment liquid for inhibiting pattern collapse in microstructures, and microstructure manufacturing method using said treatment liquid
#637Method and composition for removing resist, etch residue, and copper oxide from substrates having copper, metal hardmask and low-k dielectric material
#638Methods for fabricating semiconductor devices
#639Structure and method for MOSFETS with high-K and metal gate structure
#640Liquid chemical for forming water repellent protective film
#641Enhancing transistor performance by reducing exposure to oxygen plasma in a dual stress liner approach
#642Chemical for forming protective film
#643Substrate processing method
#644Plasma treatment method, plasma treatment apparatus, and semiconductor device manufacturing method
#645Substrate cleaning apparatus and substrate cleaning method
#646Cleaning method
#647Photoresist removal
#648SEMICONDUCTOR PROCESS AND FABRICATED STRUCTURE THEREOF
#649OXIDE SEMICONDUCTOR DEVICES, METHODS OF MANUFACTURING OXIDE SEMICONDUCTOR DEVICES, DISPLAY DEVICES HAVING OXIDE SEMICONDUCTOR DEVICES, METHODS OF MANUFACTURING DISPLAY DEVICES HAVING OXIDE SEMICONDUCTOR DEVICES
#650Wetting wave front control for reduced air entrapment during wafer entry into electroplating bath
#651Methods for manufacturing high dielectric constant films
#652Methods of dry stripping boron-carbon films
#653Methods for precleaning a substrate prior to metal silicide fabrication process
#654Processes and Systems for Engineering a Barrier Surface for Copper Deposition
#655Process for forming cobalt-containing materials
#656Method of manufacturing semiconductor devices
#657Iterative rinse for semiconductor fabrication
#658Methods of removing noble metal-containing nanoparticles
#659Semiconductor device manufacturing method and computer-readable storage medium
#660Process for forming cobalt and cobalt silicide materials in tungsten contact applications
#661METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING SOD METHOD
#662Manufacturing method of SOI substrate
#663Method of fabricating semiconductor cleaners
#664Substrate processing method and substrate processing system for performing the same
#665METHOD OF REMOVING NANOCRYSTALS
#666Method For Low Temperature Bonding And Bonded Structure
#667Pre-metal deposition clean process
#668SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
#669CLEANING SEQUENCE FOR OXIDE QUALITY MONITORING SHORT-LOOP SEMICONDUCTOR WAFER
#670Non-amine post-CMP composition and method of use
#671Method of manufacturing semiconductor device using acid diffusion
#672Method for fabricating storage node of semiconductor device
#673Oxygen plasma conversion process for preparing a surface for bonding
#674Method of fabricating metal-bearing integrated circuit structures having low defect density
#675Semiconductor substrate surface treatment method
#676Memory device and method for manufacturing memory devices
#677Plasma processing apparatus and plasma processing method
#678Substrate processing method
#679Method and apparatus for pattern collapse free wet processing of semiconductor devices
#680APPARATUS AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE
#681Method of fabricating polysilicon layer, thin film transistor, organic light emitting diode display device including the same, and method of fabricating the same
#682Remote plasma processing of interface surfaces
#683Contact clean by remote plasma and repair of silicide surface
#684Preventing UBM oxidation in bump formation processes
#685Process for forming cobalt and cobalt silicide materials in tungsten contact applications
#686Semiconductor device, method for fabricating the same and apparatus for fabricating the same
#687Method for low temperature bonding and bonded structure
#688Method for reprocessing semiconductor substrate, method for manufacturing reprocessed semiconductor substrate, and method for manufacturing SOI substrate
#689Low Temperature Surface Preparation for Removal of Organometallic Polymers in the Manufacture of Integrated Circuits
#690Maintaining integrity of a high-K gate stack by passivation using an oxygen plasma
#691Method for manufacturing semiconductor device and method for cleaning semiconductor substrate
#692Method of manufacturing a semiconductor device
#693REMOTE PLASMA PROCESSING OF INTERFACE SURFACES
#694Substrate treating method and method of manufacturing semiconductor device using the same
#695Remote plasma processing of interface surfaces
#696HIGH THROUGHPUT SELECTIVE OXIDATION OF SILICON AND POLYSILICON USING PLASMA AT ROOM TEMPERATURE
#697Methods of removing noble metal-containing nanoparticles, methods of forming NAND string gates, and methods of forming integrated circuitry
#698Method of manufacturing semiconductor device
#699Method of manufacturing semiconductor device
#700Wafer cleaning method and wafer bonding method using the same
#701Method of treating a semiconductor substrate
#702Fabrication method of semiconductor integrated circuit device
#703Compositions and methods for the selective removal of silicon nitride
#704Cleaning solution for substrate for semiconductor device and process for producing substrate for semiconductor device
#705Dielectric separator layer
#706Method for low temperature bonding and bonded structure
#707Fabricating method of nonvolatile semiconductor storage apparatus
#708SUBSTRATE PROCESSING APPARATUS
#709Method of treating a semiconductor substrate
#710Washing device and method for fabricating the same
#711Solution for polymer and capping layer removing with wet dipping in HK metal gate etching process
#712Substrate processing method
#713Semiconductor Fabrication
#714Semiconductor Fabrication
#715Method For Manufacturing Semiconductor Device
#716Semiconductor device
#717Method of treating surface of semiconductor substrate
#718Contact clean by remote plasma and repair of silicide surface
#719Semiconductor device manufacturing method and storage medium
#720Method for manufacturing capacitor of semiconductor device
#721METHOD AND APPARATUS FOR REMOVING POLYMER FROM A SUBSTRATE
#722Method of reducing surface residual defect
#723Mitigation of edge degradation in ferroelectric memory devices through plasma etch clean
#724Mitigation of edge degradation in ferroelectric memory devices through plasma etch clean
#725Method for low temperature bonding and bonded structure
#726OXYGEN-CONTAINING PLASMA FLASH PROCESS FOR REDUCED MICRO-LOADING EFFECT AND CD BIAS
#727INTEGRATION SCHEME FOR CONSTRAINED SEG GROWTH ON POLY DURING RAISED S/D PROCESSING
#728Maskless selective boron-doped epitaxial growth
#729Method for increasing the removal rate of photoresist layer
#730METHOD OF FABRICATING MIM STRUCTURE CAPACITOR
#731Methods of forming a semiconductor device
#732Semiconductor device including a coupled dielectric layer and metal layer, method of fabrication thereof, and passivating coupling material comprising multiple organic components for use in a semiconductor device
#733METHODS FOR CLEANING ETCH RESIDUE DEPOSITED BY WET ETCH PROCESSES FOR HIGH-K DIELECTRICS
#734Method for forming device isolation structure of semiconductor device using annealing steps to anneal flowable insulation layer
#735Method of forming epitaxial layer
#736Method of manufacturing semiconductor device
#737PROCESS FOR FORMING COBALT AND COBALT SILICIDE MATERIALS IN TUNGSTEN CONTACT APPLICATIONS
#738METHOD FOR CLEANING WAFER
#739METHOD FOR IN-SITU REPAIRING PLASMA DAMAGE AND METHOD FOR FABRICATING TRANSISTOR DEVICE
#740Substrate cleaning chamber and cleaning and conditioning methods
#741METHOD FOR TREATING BASE OXIDE TO IMPROVE HIGH-K MATERIAL DEPOSITION
#742Semiconductor Device Manufactured Using an Oxygenated Passivation Process During High Density Plasma Deposition
#743Silicon single crystal substrate and manufacture thereof
#744METHODS OF FORMING A METAL OXIDE LAYER PATTERN HAVING A DECREASED LINE WIDTH OF A PORTION THEREOF AND METHODS OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME
#745Method of manufacturing semiconductor device
#746Process for wafer backside polymer removal and wafer front side photoresist removal
#747PROCESS FOR WAFER BACKSIDE POLYMER REMOVAL AND WAFER FRONT SIDE SCAVENGER PLASMA
#748Etching method using hard mask in semiconductor device
#749METHOD OF MANUFACTURING GATE DIELECTRIC LAYER
#750COMPOSITION FOR CLEANING SUBSTRATES AND METHOD OF FORMING GATE USING THE COMPOSITION
#751Method for processing semiconductor wafer
#752Method to increase the compressive stress of PECVD dielectric films
#753Method and composition for restoring dielectric properties of porous dielectric materials
#754Wet etching method using ultraviolet-light and method of manufacturing semiconductor device
#755Method for forming pattern in semiconductor device
#756Method for fabricating air gap for semiconductor device
#757Method for manufacturing semiconductor device
#758SUBSTRATE WATER-REMOVING AGENT, AND WATER-REMOVING METHOD AND DRYING METHOD EMPLOYING SAME
#759Method for low temperature bonding and bonded structure
#760Method for barrier interface preparation of copper interconnect
#761Method for low temperature bonding and bonded structure
#762METHOD OF FABRICATING SPACERS AND CLEANING METHOD OF POST-ETCHING AND SEMICONDUCTOR DEVICE
#763Fabricating A Semiconductor Device
#764SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS
#765Method for manufacturing semiconductor device free from layer-lifting between insulating layers
#766Processes and systems for engineering a silicon-type surface for selective metal deposition to form a metal silicide
#767Processes and systems for engineering a copper surface for selective metal deposition
#768Processes and systems for engineering a barrier surface for copper deposition
#769Mitigation of edge degradation in ferroelectric memory devices through plasma etch clean
#770METHODS AND APPARATUS FOR E-BEAM TREATMENT USED TO FABRICATE INTEGRATED CIRCUIT DEVICES
#771Fabrication method of semiconductor integrated circuit device
#772Manufacturing method of semiconductor device using etching solution
#773Apparatus and methods for selective removal of material from wafer alignment marks
#774Method for fabricating a semiconductor device
#775Process for forming cobalt-containing materials
#776Semiconductor device and method of production
#777Surface preparation for gate oxide formation that avoids chemical oxide formation
#778Method for fabricating a semiconductor device with a high-K dielectric
#779Electronic device cleaning equipment and electronic device cleaning method
#780METHOD OF FABRICATING A TRENCH ISOLATION LAYER IN A SEMICONDUCTOR DEVICE
#781Method of manufacturing a semiconductor device
#782Manufacturing method of semiconductor device
#783Method of fabricating semiconductor devices
#784Hydrogen treatment to improve photoresist adhesion and rework consistency
#785Method for manufacturing semiconductor device
#786Methods of forming patterns and capacitors for semiconductor devices using the same
#787Method of fabricating spacers and cleaning method of post-etching and semiconductor device
#788Composition for cleaning substrates and method of forming gate using the composition
#789Method of cleaning a wafer
#790TaN integrated circuit (IC) capacitor
#791Method of depositing low k barrier layers
#792Surface treatment method, manufacturing method of semiconductor device, and manufacturing method of capacitive element
#793Repairing method for low-k dielectric materials
#794Contact clean by remote plasma and repair of silicide surface
#795IN-LINE METROLOGY FOR SUPERCRITICAL FLUID PROCESSING
#796Method for fabricating semiconductor device
#797Semiconductor device and method for manufacturing the same
#798Method of cleaning a semiconductor device and method of manufacturing a semiconductor device using the same
#799Method for fabricating capacitor of semiconductor device
#800Substrate processing apparatus
#801Manufacturing method of semiconductor integrated circuit device
#802Cleaning process for semiconductor substrates
#803Methods of forming capacitors
#804Treatment of substrate using functionalizing agent in supercritical carbon dioxide
#805Methodology for deposition of doped SEG for raised source/drain regions
#806Process for cleaning silicon substrate
#807Cleaning solution and method of forming a metal pattern for a semiconductor device using the same
#808Method for releasing a micromechanical structure
#809Method of processing substrate, and method of and program for manufacturing electronic device
#810Semiconductor device and fabrication method thereof
#811Method of cleaning wafer and method of manufacturing gate structure
#812Semiconductor device and method for manufacturing same
#813Method of metal sputtering for integrated circuit metal routing
#814Method of cleaning silicon nitride layer
#815Ferroelectric capacitor stack etch cleaning methods
#816Method for manufacturing electronic device
#817Apparatus for treating a substrate with an ozone-solvent solution
#818Method of fabricating semiconductor cleaners
#819Method for treating base oxide to improve high-K material deposition
#820Etching process and patterning process
#821Solutions for cleaning silicon semiconductors or silicon oxides
#822Apparatus and plasma ashing process for increasing photoresist removal rate
#823Encapsulation of post-etch halogenic residue
#824Methods for cleaning a semiconductor substrate having a recess channel region
#825Method for manufacturing a semiconductor device having silicided regions
#826Methods of forming capacitors
#827Process method to facilitate silicidation
#828Method of manufacturing electronic device
#829Semiconductor device and method for manufacturing the same
#830Method for cleaning microstructure
#831Fabrication method of semiconductor integrated circuit device
#832Method for removing mottled etch in semiconductor fabricating process
#833Methods and apparatus for e-beam treatment used to fabricate integrated circuit devices
#834Molecular airborne contaminants (MACs) film removal and wafer surface sustaining system and method
#835Method for low temperature bonding and bonded structure
#836Method of metal sputtering for integrated circuit metal routing
#837Integrated low k recovery and ALD metal deposition process for advanced technology node
#838Method of for bonding noble metal structure with a dielectric layer using an adhesive layer
#839Method of processing semiconductor device
#840Ammonium fluoride pre-clean protection
#841Silicon oxide selective dry etch process
#842Methods of forming a semiconductor structure and methods of forming isolation structures
#843Protected trench isolation for fin-type field-effect transistors
#844Surface treatment of substrates using passivation layers
#845Selective and conformal passivation layer for 3D high-mobility channel devices
#846Surface passivation having reduced interface defect density
#847Chemical modification of hardmask films for enhanced etching and selective removal
#848Method of removing dummy gate dielectric layer
#849Semiconductor device having the insulating layers cover a bottom portion of the fin shaped structure
#850Reactive radical treatment for polymer removal and workpiece cleaning
#851Method for fabricating nanowires for horizontal gate all around devices for semiconductor applications
#852Using electroless deposition as a metrology tool to highlight contamination, residue, and incomplete via etch
#853High capacitance density gate dielectrics for III-V semiconductor channels using a pre-disposition surface treatment involving plasma and TI precursor exposure
#854Method for fabricating semiconductor device