207084 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Forming layers; Forming inorganic semiconducting materials on a substrate; Deposited layers; Materials Group 14 semiconducting materials
Integrated CMOS Source Drain Formation With Advanced Control
#2METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#3SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM AND SUBSTRATE PROCESSING APPARATUS
#4Integrated CMOS Source Drain Formation With Advanced Control
#5Method of growing doped group IV materials
#6Integrated CMOS source drain formation with advanced control
#7Semiconductor devices including field effect transistors and methods of forming the same
#8Wafer composite and method for producing a semiconductor component
#9Process for producing a strained layer based on germanium-tin
#10Silicon residue removal in nanosheet transistors
#11Semiconductor device and manufacturing method thereof
#12Techniques for forming transistors including group III-V material nanowires using sacrificial group IV material layers
#13VERTICAL-TYPE SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THE SAME
#14Crystallized silicon carbon replacement material for NMOS source/drain regions
#15Structure comprising a 2-dimensional material
#16Formation method of semiconductor device structure with semiconductor nanowire
#17Flexible and stretchable sensors formed by patterned spalling
#18Synthesis of metal oxide surfaces and interfaces with crystallographic control using solid-liquid-vapor etching and vapor-liquid-solid growth
#19Semiconductor device
#20Method for producing a semiconductor device including semiconductor pillar and fin
#21Semiconductor devices including field effect transistors and methods of forming the same
#22Method for removing crystal originated particles from a crystalline silicon body using an etch process
#23LOW TEMPERATURE SELECTIVE DEPOSITION EMPLOYING A GERMANIUM-CONTAINING GAS ASSISTED ETCH
#24Semiconductor device and manufacturing method thereof
#25Conductor including nano-patterned substrate and method of manufacturing the conductor
#26Structure comprising a 2-dimensional material
#27Dual-material mandrel for epitaxial crystal growth on silicon
#28Methods of forming highly p-type doped germanium tin films and structures and devices including the films
#29Strained group IV channels
#30Dual-material mandrel for epitaxial crystal growth on silicon
#31Vertical-type semiconductor devices and methods of manufacturing the same
#32Fin field effect transistor including a strained epitaxial semiconductor shell
#33Fin field effect transistor including a strained epitaxial semiconductor shell
#34Method for processing a carrier and an electronic component
#35Planar heterogeneous device
#36RECTANGULAR NANOSHEET FABRICATION
#37Polysilicon thin-film transistor array substrate and method for preparing the same, and display device
#38Nanowires and Methods of Forming
#39Method for producing semiconductor device and semiconductor device
#40Method for fabricating a structure
#41CVD silicon monolayer formation method and gate oxide ALD formation on III-V materials
#42Method of Forming an Epitaxial Layer and Apparatus for Processing a Substrate Used for the Method
#43Method for removing crystal originated particles from a crystalline silicon body
#44Vertical-type semiconductor devices and methods of manufacturing the same
#45SILICON SUBSTRATE SUITABLE FOR USE WITH AN RF COMPONENT, AND AN RF COMPONENT FORMED ON SUCH A SILICON SUBSTRATE
#46Plasma-assisted chemical gas separation method having increased plasma density and device for implementing the method
#47Porous substrates, articles, systems and compositions comprising nanofibers and methods of their use and production
#48SEMICONDUCTOR WAFER, METHOD OF PRODUCING A SEMICONDUCTOR WAFER AND METHOD OF PRODUCING A COMPOSITE WAFER
#49THIN FILM WITH NEGATIVE TEMPERATURE COEFFICIENT BEHAVIOR AND METHOD OF MAKING THEREOF
#50Semiconductor-on-insulator structure and method of fabricating the same
#51Method of forming strain-relaxed buffer layers
#52Doped semiconductor films and processing
#53Semiconductor structure with aspect ratio trapping capabilities
#54Interconnection of semiconductor device with graphene wire
#55Nanorod thin-film transistors
#56Light-emitter-based devices with lattice-mismatched semiconductor structures
#57Vertical-type semiconductor devices and methods of manufacturing the same
#58SELECTIVE EPITAXIAL GROWTH BY INCUBATION TIME ENGINEERING
#59Optical device and semiconductor wafer
#60Vertical-type semiconductor devices and methods of manufacturing the same
#61Method in the microelectronics fields of forming a monocrystalline layer
#62Method of forming a passivated densified nanoparticle thin film on a substrate
#63Porous substrates, articles, systems and compositions comprising nanofibers and methods of their use and production
#64Semiconductor device including semiconductor thin film, which is subjected to heat treatment to have alignment mark, crystallizing method for the semiconductor thin film, and crystallizing apparatus for the semiconductor thin film
#65Semiconductor heterostructure and method for forming same
#66NANOROD THIN-FILM TRANSITORS
#67Porous Substrates, Articles, Systems and Compositions Comprising Nanofibers and Methods of Their Use and Production
#68Vertical-type semiconductor devices
#69Method of forming a passivated densified nanoparticle thin film on a substrate
#70METHOD OF FORMING GROUP IV SEMICONDUCTOR JUNCTIONS USING LASER PROCESSING
#71Semiconductor-based, large-area, flexible, electronic devices on {110}<100> oriented substrates
#72Methods for optimizing thin film formation with reactive gases
#73Doped nanoparticle-based semiconductor junction
#74DISTRIBUTED FEEDBACK LASERS FORMED VIA ASPECT RATIO TRAPPING
#75Methods of filling a set of interstitial spaces of a nanoparticle thin film with a dielectric material
#76Methods for creating a densified group IV semiconductor nanoparticle thin film
#77Light-emitter-based devices with lattice-mismatched semiconductor structures
#78Epitaxy of Silicon-Carbon Substitutional Solid Solutions by Ultra-Fast Annealing of Amorphous Material
#79Semiconductor heterostructure and method for forming same
#80METHOD OF CRYSTALLIZING AMORPHOUS SEMICONDUCTOR FILM
#81Semiconductor device including semiconductor thin film, which is subjected to heat treatment to have alignment mark, crystallizing method for the semiconductor thin film, and crystallizing apparatus for the semiconductor thin film
#82Etch method with surface modification treatment for forming semiconductor structure
#83Flexible and stretchable sensors formed by patterned spalling
#84Dual-material mandrel for epitaxial crystal growth on silicon
#85Methods for fabricating conductive vias of circuit structures