SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF, CHIP, AND ELECTRONIC DEVICE

LASER DIODES, LEDS, AND SILICON INTEGRATED SENSORS ON PATTERNED SUBSTRATES

EPITAXIAL BLOCKING LAYER FOR MULTI-GATE DEVICES AND FABRICATION METHODS THEREOF

LARGE-AREA III-V SEMICONDUCTOR LAYER TRANSFERRING METHOD

METHOD FOR PRODUCING LAMINATE, PRODUCING APPARATUS FOR LAMINATE, LAMINATE, AND SEMICONDUCTOR DEVICE

Multilayer film structure and method for producing same

LASER DIODES, LEDS, AND SILICON INTEGRATED SENSORS ON PATTERNED SUBSTRATES

STRAIN RELIEF TRENCHES FOR EPITAXIAL GROWTH

METHODS OF FORMING SILICON GERMANIUM STRUCTURES

LASER DIODES, LEDS, AND SILICON INTEGRATED SENSORS ON PATTERNED SUBSTRATES

Epitaxial blocking layer for multi-gate devices and fabrication methods thereof

Strain relief trenches for epitaxial growth

Method for manufacturing pillar-shaped semiconductor device

Growth of cubic crystalline phase structure on silicon substrates and devices comprising the cubic crystalline phase structure

LASER DIODES, LEDS, AND SILICON INTEGRATED SENSORS ON PATTERNED SUBSTRATES

Leakage-free implantation-free ETSOI transistors

Transistor structure with N/P boundary buffer

Epitaxial blocking layer for multi-gate devices and fabrication methods thereof

Transistor with strained superlattice as source/drain region

Transistor structure with n/p boundary buffer

Layered substrate for microelectronic devices

TRANSITION METAL DICHALCOGENIDE THIN FILM, METHOD FOR MANUFACTURING THE SAME AND DISPLAY DEVICE COMPRISING THE SAME

Three-dimensionally stretchable single crystalline semiconductor membrane

Semiconductor Structures Which Include Laminates of First and Second Regions, and Methods of Forming Semiconductor Structures

Method for producing a semiconductor component

Growth of cubic crystalline phase structure on silicon substrates and devices comprising the cubic crystalline phase structure

Inverted T channel field effect transistor (ITFET) including a superlattice

Method for making an inverted T channel field effect transistor (ITFET) including a superlattice

Semiconductor arrangement

Nanosheet semiconductor structure with inner spacer formed by oxidation

Method of fabricating graphene structure having nanobubbles

Nano flake defect passivation method and electronic device manufactured using the same

Nanosheet semiconductor structure with inner spacer formed by oxidation

Growth of cubic crystalline phase structure on silicon substrates and devices comprising the cubic crystalline phase structure

Method of manufacturing a semiconductor device having graphene material

Method of fabricating device including two-dimensional material

Method of fabricating device including two-dimensional material

VERTICAL-TYPE SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THE SAME

Crystalline multilayer structure and semiconductor device

Heterostructure with Stress Controlling Layer

Non-volatile memory structures having multi-layer conductive channels

Femtosecond laser-induced formation of single crystal patterned semiconductor surface

Liquid crystal display panel having an active layer comprising more than two film layers and method for manufacturing the same

Three-dimensional memory device with self-aligned drain side select gate electrodes and method of making thereof

Three-dimensional memory device with self-aligned drain side select gate electrodes and method of making thereof

ROOM TEMPERATURE METHOD FOR THE PRODUCTION OF ELECTROTECHNICAL THIN LAYERS, THE USE OF SAME, AND A THIN LAYER HEATING SYSTEM OBTAINED IN THIS MANNER

Method of semiconductor arrangement formation

Graphene-based solid state devices capable of emitting electromagnetic radiation and improvements thereof

Laser irradiation induced surface planarization of polycrystalline silicon films

Methods for forming fin structures with desired profile for 3D structure semiconductor applications

Semiconductor device

Method for producing a semiconductor device including semiconductor pillar and fin

Leakage-free implantation-free ETSOI transistors

Power storage device and method for manufacturing the same

Semiconductor device having a graphene layer, and method of manufacturing thereof

COMPOSITE SUBSTRATE, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING THEREOF

Solid phase epitaxy of 3C-SiC on Si(001)

Growth of cubic crystalline phase structure on silicon substrates and devices comprising the cubic crystalline phase structure

Leakage-free implantation-free ETSOI transistors

Multilayer graphene, method of forming the same, device including the multilayer graphene, and method of manufacturing the device

Melt-growth of single-crystal alloy semiconductor structures and semiconductor assemblies incorporating such structures

Manufacturing method of semiconductor structure for improving quality of epitaxial layers

Method of fabricating crystalline island on substrate

Film formation method, vacuum processing apparatus, method of manufacturing semiconductor light emitting element, semiconductor light emitting element, method of manufacturing semiconductor electronic element, semiconductor electronic element, and illuminating apparatus

III-V fin generation by lateral growth on silicon sidewall

Growth of cubic crystalline phase structure on silicon substrates and devices comprising the cubic crystalline phase structure

Silicon carbide single-crystal substrate, silicon carbide epitaxial substrate and method of manufacturing them

Oxide for semiconductor layer of thin-film transistor, semiconductor layer of thin-film transistor having said oxide, and thin-film transistor

Leakage-free implantation-free ETSOI transistors

Method for preparing substrate using germanium condensation process and method for manufacturing semiconductor device using same

Vertical-type semiconductor devices and methods of manufacturing the same

Heterostructure with stress controlling layer

Formation of dislocation-free SiGe finFET using porous silicon

Method for forming FinFET devices

Method for producing a semiconductor device

Thin film transistor and fabrication method thereof, and display device

Method for processing a carrier and an electronic component

Method for forming FinFET devices

Semiconductor device formed with nanowire

Semiconductor devices

Depression filling method and processing apparatus

SEMICONDUCTOR STRUCTURE AND METHOD FOR FABRICATING THE SAME

Method of forming a graphene structure

Semiconductor devices with graphene nanoribbons

Silicon-germanium fin of height above critical thickness

Active structures of a semiconductor device and methods of manufacturing the same

Oxide semiconductor film

Method and structure to improve film stack with sensitive and reactive layers

Substrate with silicon carbide film, method for producing substrate with silicon carbide film, and semiconductor device

Lattice matched aspect ratio trapping to reduce defects in III-V layer directly grown on silicon

Solid phase epitaxy of 3C—SiC on Si(001)

Method of semiconductor device fabrication

Semiconductor device and manufacturing method thereof

Self aligned replacement Fin formation

Epitaxial growth of silicon for FinFETS with non-rectangular cross-sections

Method for producing semiconductor device and semiconductor device

Method of semiconductor arrangement formation

Method for producing semiconductor device and semiconductor device

Group III nitride composite substrate and method for manufacturing the same, laminated group III nitride composite substrate, and group III nitride semiconductor device and method for manufacturing the same

Chemical sensors based on plasmon resonance in graphene

Segmented graphene growth on surfaces of a patterned substrate layer and devices thereof

Surface profile for semiconductor region

Method of selective filling of memory openings

Method for forming a multiple layer epitaxial layer on a wafer

Method for producing semiconductor device and semiconductor device

Crystalline multilayer structure and semiconductor device

Methods of forming low-defect strain-relaxed layers on lattice-mismatched substrates and related semiconductor structures and devices

Vertical-type semiconductor devices and methods of manufacturing the same

Absorber layer for photovoltaic device, and method of making the same

Metal replacement process for low resistance source contacts in 3D NAND

Light emitting device including shaped substrate

Graphene-based solid state devices capable of emitting electromagnetic radiation and improvements thereof

In-situ straining epitaxial process

Semiconductor devices and methods of manufacturing the same

Three dimensional compositional profile in CIS-based absorber layers of thin film solar cells

Method of producing epitaxial silicon wafer and epitaxial silicon wafer

Method of manufacturing a semiconductor device and a semiconductor device

Method of forming Ga2O3-based crystal film and crystal multilayer structure

SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

Trimming silicon fin width through oxidation and etch

U-shaped semiconductor structure

Methods of forming stressed multilayer FinFET devices with alternative channel materials

Semiconductor device having embedded strain-inducing pattern

Semiconductor structure with increased space and volume between shaped epitaxial structures

Transistor and method for forming the same

Semiconductor devices with graphene nanoribbons

Heterostructure including a composite semiconductor layer

Growth of cubic crystalline phase strucure on silicon substrates and devices comprising the cubic crystalline phase structure

Semiconductor device with non-linear surface

Semiconductor device and manufacturing method thereof

Method of forming strain-relaxed buffer layers

Semiconductor arrangement

Fin pitch scaling and active layer isolation

Method of fabricating a thin-film device

Rare-earth oxide isolated semiconductor fin

Semiconductor nano layer structure and manufacturing method thereof

Method of forming semiconductor device having embedded strain-inducing pattern

FinFET with multiple concentration percentages

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME

Method for forming a strained semiconductor structure

Oxide semiconductor film and formation method thereof

Method of forming strained source and drain regions in a P-type finFET structure

Method for producing different populations of molecules or fine particles with arbitrary distribution forms and distribution densities simultaneously and in quantity, and masking

Method for separating epitaxial layer from growth substrate

NANOCOMPOSITE AND METHOD OF MAKING THEREOF

Epitaxial wafer, method for producing the same, semiconductor element, and optical sensor device

Selective epitaxial growth of semiconductor materials with reduced defects

SINGLE-CRYSTAL OXIDE SEMICONDUCTOR, THIN FILM, OXIDE STACK, AND FORMATION METHOD THEREOF

Spacer replacement for replacement metal gate semiconductor devices

U-shaped semiconductor structure

Methods for producing complex films, and films produced thereby

Methods of forming hetero-layers with reduced surface roughness and bulk defect density of non-native surfaces and the structures formed thereby

Spacer assisted pitch division lithography

High quality devices growth on pixelated patterned templates

Surface profile for semiconductor region

Semiconductor device manufacturing method

SiC single crystal, production method therefor, SiC wafer and semiconductor device

Compound semiconductor device with mesa structure

Layered semiconductor substrate with reduced bow having a group III nitride layer and method for manufacturing it

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THE SAME

Method for substrate pretreatment to achieve high-quality III-nitride epitaxy

PECVD deposition of smooth silicon films

Semiconductor devices having modulated nanowire counts

Epitaxy technique for reducing threading dislocations in stressed semiconductor compounds

Rare-earth oxide isolated semiconductor fin

N-doped single crystal diamond substrates and methods therefor

SILICON CARBIDE SUBSTRATE, SEMICONDUCTOR DEVICE, AND METHODS FOR MANUFACTURING THEM

Modification of silicon layers formed from silane-containing formulations

SUPPRESSION OF RELAXATION BY LIMITED AREA EPITAXY ON NON-C-PLANE (In,Al,B,Ga)N

Vertical-type semiconductor devices and methods of manufacturing the same

Silicon carbide semiconductor device and method for manufacturing same

METHODS FOR THE EPITAXIAL GROWTH OF SILICON CARBIDE

Method of manufacturing semiconductor device

Semiconductor device and manufacturing method thereof

METHOD FOR DOPING A SEMICONDUCTOR SUBSTRATE, AND SOLAR CELL HAVING TWO-STAGE DOPING

Semiconductor device and method

SILICON CARBIDE SUBSTRATE AND METHOD OF MANUFACTURING THE SAME

Method for manufacturing epitaxial crystal substrate, epitaxial crystal substrate and semiconductor device

Method of increasing the germanium concentration in a silicon-germanium layer and semiconductor device comprising same

Nanocomposite and method of making thereof

3-dimensional graphene structure and process for preparing and transferring the same

Production method of a layered body

METHOD FOR ENHANCING GROWTH OF SEMI-POLAR (Al,In,Ga,B)N VIA METALORGANIC CHEMICAL VAPOR DEPOSITION

PHOTOVOLTAIC DEVICE

Silicon carbide epitaxial wafer and manufacturing method therefor

PECVD DEPOSITION OF SMOOTH POLYSILICON FILMS

Method of manufacturing ESD resistant nitride semiconductor light emitting device with enhanced light extraction efficiency

Epitaxial growth of silicon doped with carbon and phosphorus using hydrogen carrier gas

Vertical-type semiconductor devices and methods of manufacturing the same

Method of manufacturing a semiconductor device and substrate processing apparatus

Nano-wire solar cell or detector

Semiconductor device and manufacturing method thereof

Epitaxial silicon carbide monocrystalline substrate and method of production of same

Nanochannel device and method for manufacturing thereof

Power storage device and method for manufacturing the same

Optoelectronic semiconductor chip and method for the production thereof

Epitaxial structures and methods of forming the same

Method for producing different populations of molecules or fine particles with arbitrary distribution forms and distribution densities simultaneously and in quantity, and masking member therefor

Nitride semiconductor device

Tubular Photovoltaic Device and Method of Making

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

COMPOSITE WAFERS AND SUBSTRATES FOR III-NITRIDE EPITAXY AND DEVICES AND METHODS THEREFOR

Method of fabricating a thin-film device

DOUBLE-SIDED HETEROJUNCTION SOLAR CELL BASED ON THIN EPITAXIAL SILICON

Laser Process for Minimizing Variations in Transistor Threshold Voltages

Selective deposition of germanium spacers on nitride

Silicon epitaxial wafer and method for production thereof

Controlled polarity group III-nitride films and methods of preparing such films

Selective epitaxial growth of semiconductor materials with reduced defects

Semiconductor heterostructure and method for forming same

Systems and methods of laser texturing and crystallization of material surfaces

Method of making group III nitride-based compound semiconductor

Germanium substrate-type materials and approach therefor

Nitride semiconductor light emitting device and method of manufacturing the same

Systems and Methods of Laser Texturing of Material Surfaces and their Applications

TEXTURED SEMICONDUCTOR LIGHT-EMITTING DEVICES

ROUGH STRUCTURE OF OPTOELECTRONIC DEVICE AND FABRICATION THEREOF

Epitaxially coated silicon wafer with 110 orientation and method for producing it

Vertical-type semiconductor devices

Thin film transistor having a three-portion gate electrode and liquid crystal display using the same

Method of manufacturing thin film transistor

Semiconductor structure having multilayer of polysilicon and display panel applied with the same

Laser assisted nano deposition

Semiconductor device and method of processing the same

Germanium substrate-type materials and approach therefor

COMPOUND SEMICONDUCTOR DEVICE WITH MESA STRUCTURE

Growth of planar, non-polar, group-III nitride films

Composite wafers having bulk-quality semiconductor layers and method of manufacturing thereof

Group III Nitride Semiconductor Device and Epitaxial Substrate

Selective deposition of germanium spacers on nitride

Method of manufacturing semiconductor device with crystallized semiconductor film

Methods of forming a pattern and methods of manufacturing a memory device using the same

Thin-film device and method of fabricating the same

Use of tungsten interlayer to enhance the initial nucleation and conformality of ultrananocrystalline diamond (UNCD) thin films

Method of fabricating n-type semiconductor diamond, and semiconductor diamond

Thin film transistor having a three-portion gate electrode and liquid crystal display using the same

Semiconductor Devices Having Epitaxial Layers with Suppressed Lateral Growth and Related Methods of Manufacturing Such Devices

Selective deposition of germanium spacers on nitride

Semiconductor heterostructure and method for forming same

Process for preparing p-n junctions having a p-type ZnO film

Methods of combining silicon and III-nitride material on a single wafer

Method of manufacturing semiconductor device

Controlled polarity group III-nitride films and methods of preparing such films

Semiconductor structure having multilayer of polysilicon and display panel applied with the same

Near single-crystalline, high-carrier-mobility silicon thin film on a polycrystalline/amorphous substrate

Thin film transistor and method of manufacturing the same

Method and system for focused ion beam directed self-assembly of metal oxide island structures

Method for forming polycrystalline silicon thin film transistor

Germanium substrate-type materials and approach therefor

Growth of planar, non-polar gallium nitride by hydride vapor phase epitaxy

Growing smooth semiconductor layers

Method for producing nitrides

Method of fabricating n-type semiconductor diamond, and semiconductor diamond

Group III nitride crystal substrate, method of its manufacture, and group III nitride semiconductor device

Thin film transistor with gate electrode portion crossing grain growing direction and liquid crystal display comprising the same

Method for producing nitride semiconductor, semiconductor wafer and semiconductor device

Semiconductor light emitting device

Method of making group III nitride-based compound semiconductor

Nano-imprinting using high-pressure crystal phase transformations

Nanosheet FET with wrap-around inner spacer

Method of fabricating epitaxial layer

Horizontal gate all around device isolation

Silicon-on-insulator substrates having selectively formed strained and relaxed device regions

Self aligned replacement fin formation

Method for surface roughness reduction after silicon germanium thin film deposition

Three dimensional memory device having stacked conductive channels

Nanowires, nanowire networks and methods for their formation and use