207099 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Forming layers; Forming inorganic semiconducting materials on a substrate; Formation types; Deposition types Liquid deposition
Acoustic Measurement of Fabrication Equipment Clearance
#2LIQUID METAL PRINTED 2D ULTRAHIGH MOBILITY CONDUCTING OXIDE TRANSISTORS
#3Additive process for circular printing
#4Acoustic measurement of fabrication equipment clearance
#5SPACE-FREE VERTICAL FIELD EFFECT TRANSISTOR INCLUDING ACTIVE LAYER HAVING VERTICALLY GROWN CRYSTAL GRAINS
#6SUBSTRATE TREATING APPARATUS
#7APPARATUS AND METHOD FOR BONDING DETECTION, AND APPARATUS AND METHOD FOR THICKNESS AND UNIFORMITY DETECTION
#8Methods and systems for real-time quality control of a film in a spin coating process
#9MICROELECTRONIC DEVICE SUBSTRATE FORMED BY ADDITIVE PROCESS
#10SYSTEMS AND METHODS OF ADDITIVE PRINTING OF FUNCTIONAL ELECTRONIC CIRCUITS
#11Wafer processing apparatus and method for processing wafer
#12Additive process for circular printing of electronic devices
#13Layered GaAs, method of preparing same, and GaAs nanosheet exfoliated from same
#14Acoustic measurement of fabrication equipment clearance
#15METHOD OF MANUFACTURING A THIN FILM TRANSISTOR SUBSTRATE AND THIN FILM TRANSISTOR SUBSTRATE
#16Crystal growth method in a semiconductor device
#17SENSOR AND METHOD OF MANUFACTURING THE SAME
#18GAS SENSING DEVICE AND MANUFACTURING METHOD THEREOF
#19FLEXIBLE ELECTRONIC COMPONENTS AND METHODS FOR THEIR PRODUCTION
#20Microelectronic device substrate formed by additive process
#21Protective member forming apparatus
#22LAYERED GaAs, METHOD OF PREPARING SAME, AND GaAs NANOSHEET EXFOLIATED FROM SAME
#23Preparation method for fully transparent thin film transistor
#24SEED WAFER FOR GaN THICKENING USING GAS- OR LIQUID-PHASE EPITAXY
#25Increased-transparency photovoltaic device
#26Systems and methods of additive printing of functional electronic circuits
#27Bottom-up method for forming wire structures upon a substrate
#28Acoustic measurement of film thickness
#29Porous tin oxide films
#30Ink formulation
#31Method for manufacturing silicon-carbide semiconductor element
#32Devices and methods for electrochemical liquid phase epitaxy
#33Method for production of components comprising a schottky diode by means of printing technology
#34Apparatus and method for treating substrate
#35Seed wafer for GaN thickening using gas- or liquid-phase epitaxy
#36Field effect transistor and method for production thereof
#37P-TYPE OXIDE SEMICONDUCTOR, METHOD FOR FORMING P-TYPE OXIDE SEMICONDUCTOR, AND TRANSISTOR WITH THE P-TYPE OXIDE SEMICONDUCTOR
#38Separation method and manufacturing method of flexible device
#39Silicon germanium fins on insulator formed by lateral recrystallization
#40Fabrication of nanomaterial T-gate transistors with charge transfer doping layer
#41Oxide semiconductor, coating liquid, method of forming oxide semiconductor film, semiconductor element, display element, image display device and image display system
#42Metal oxide semiconductor layer forming composition, and method for producing metal oxide semiconductor layer using same
#43Acoustic measurement of fabrication equipment clearance
#44Polymer, organic layer composition, and method of forming patterns
#45Embedded gallium-nitride in silicon
#46Embedded gallium-nitride in silicon
#47Printable pulsed voltage multiplier with adjustable pulse width and amplitude
#48Stacked electronic device and method for fabricating the same
#49Electronic device using group III nitride semiconductor and its fabrication method and an epitaxial multi-layer wafer for making it
#50Semiconductor devices and methods of manufacture thereof
#51Method for manufacturing a nanowire structure
#52ELECTRONIC DEVICE AND METHOD OF MANUFACTURING THE ELECTRONIC DEVICE
#53Formulations for producing indium oxide-containing layers, process for producing them and their use
#54Multimodal biosensor
#55Minimal Contact Wet Processing Systems and Methods
#56Method of forming silicon on a substrate
#57Method for manufacturing silicon-carbide semiconductor element
#58Thin film transition metal dichalcogenides and methods
#59Heterogeneous material integration through guided lateral growth
#60Manufacturing a submicron structure using a liquid precursor
#61Electronic device having graphene-semiconductor multi-junction and method of manufacturing the electronic device
#62Semiconductor film, method of producing semiconductor film, solar cell, light-emitting diode, thin film transistor, and electronic device
#63Method of making graphene layers, and articles made thereby
#64Methods for uniform imprint pattern transfer of sub-20 nm features
#65Thin film transistor, method of manufacturing same, and image display apparatus
#66Methods of nanowire functionalization, dispersion and attachment
#67Method for making electronic device using group III nitride semiconductor having specified dislocation density oxygen/electron concentration, and active layer thickness
#68Electronic device using group III nitride semiconductor having specified dislocation density, oxygen/electron concentration, and active layer thickness
#69Electronic device and epitaxial multilayer wafer of group III nitride semiconductor having specified dislocation density, oxygen/electron concentration, and active layer thickness
#70Mask for forming semiconductor pattern, patterning system with the same, and method of fabricating semiconductor device using the same
#71Method for producing a group III nitride semiconductor crystal and method for producing a GaN substrate
#72P-type oxide, composition for producing p-type oxide, method for producing p-type oxide, semiconductor element, display element, image display device, and system
#73METHODS OF GROWING HETEROEPITAXIAL SINGLE CRYSTAL OR LARGE GRAINED SEMICONDUCTOR FILMS ON GLASS SUBSTRATES AND DEVICES THEREON
#74Methods of growing heteroepitaxial single crystal or large grained semiconductor films and devices thereon
#75Method of making graphene layers, and articles made thereby
#76Printed Material Constrained By Well Structures And Devices Including Same
#77Printed material constrained by well structures and devices including same
#78METHOD FOR MANUFACTURING GALLIUM NITRIDE CRYSTAL AND GALLIUM NITRIDE WAFER
#79Substrate treating apparatus
#80Substrate treating apparatus with vertical treatment arrangement including vertical blowout and exhaust units
#81Substrate treating apparatus using horizontal treatment cell arrangements with parallel treatment lines
#82PATTERNING METHOD
#83Printed material constrained by well structures
#84Coating apparatus including a glove part and a controller for stopping coating
#85Methods of growing heteroepitaxial single crystal or large grained semiconductor films and devices thereon
#86Methods for increasing film thickness during the deposition of silicon films using liquid silane materials
#87Method for manufacturing gallium nitride crystal and gallium nitride wafer
#88Parallel substrate treatment for a plurality of substrate treatment lines
#89Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device
#90Method of co-doping group 14 (4B) elements to produce ZnTe system compound semiconductor single crystal
#91Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device
#92Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device
#93Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device
#94Smooth surface liquid phase epitaxial germanium
#95High-density germanium-on-insulator photodiode array
#96Porous tin oxide films