207112 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Making masks on semiconductor bodies for further photolithographic processing not provided for in group or comprising organic layers for lift-off processes
SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME
#2SEMICONDUCTOR DEVICE AND FORMATION METHOD THEREOF
#3Patterning Process
#4POSITIVE TYPE LIFT-OFF RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST PATTERN USING THE SAME
#5SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION
#6METHOD FOR PREPARING SEMICONDUCTOR DEVICE STRUCTURE WITH FEATURES AT DIFFERENT LEVELS
#7PATTERNING USING MONOMER BASED SACRIFICIAL MATERIAL LIFTOFF
#8INTEGRATED PHOTORESIST REMOVAL AND LASER ANNEALING
#9INTEGRATED PHOTORESIST REMOVAL AND LASER ANNEALING
#10HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
#11METHOD FOR PREPARING SEMICONDUCTOR DEVICE STRUCTURE HAVING FEATURES OF DIFFERENT DEPTHS
#12METHOD FOR PREPARING SEMICONDUCTOR DEVICE STRUCTURE HAVING FEATURES OF DIFFERENT DEPTHS
#13SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#14DEPOSITING A CARBON HARDMASK BY HIGH POWER PULSED LOW FREQUENCY RF
#15MANDREL-PULL-FIRST INTERCONNECT PATTERNING
#16DEPOSITING A CARBON HARDMASK BY HIGH POWER PULSED LOW FREQUENCY RF
#17MANUFACTURING METHOD OF PATTERNIG SUBSTRATE, PATTERNED SUBSTRATE, AND INTERMEDIATE PATTERNED SUBSTRATE
#18METHOD FOR FORMING A LIFT-OFF MASK STRUCTURE
#19RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING BENZYLIDENECYANOACETATE GROUP
#20Integrated photoresist removal and laser annealing
#21HARD MASK STRUCTURE
#22Method of manufacturing semiconductor device
#23ENHANCEMENT-MODE HEMT AND MANUFACTURING PROCESS OF THE SAME
#24Method for preparing semiconductor device structure with features at different levels
#25Method for preparing semiconductor device structure having features of different depths
#26Method for preparing semiconductor device structure having features of different depths
#27COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND AND POLYMER FOR FORMING ORGANIC FILM
#28RESIST UNDERLAYER FILM-FORMING COMPOSITION WITH SUPPRESSED DEGENERATION OF CROSSLINKING AGENT
#29TUNNELING DEVICE HAVING INTERMEDIATE LAYER USING NATURAL OXIDE FILM AND METHOD OF MANUFACTURING TUNNELING DEVICE
#30METHOD OF SELECTIVELY ETCHING A METAL COMPONENT
#31METHOD FOR FORMING ELECTRODE
#32Method and structure for thin-film fabrication
#33Photoresist removal method and photoresist removal system
#34Touch panel and method of manufacturing the same
#35Depositing a carbon hardmask by high power pulsed low frequency RF
#36Manufacturing method of semiconductor structure including complementary first and second mask patterns
#37Photoresist structure, patterned deposition layer, semiconductor chip and manufacturing method thereof
#38Method for manufacturing semiconductor device
#39Coating method and coating system
#40Selective passivation and selective deposition
#41Field effect transistor and semiconductor device
#42Method for forming vias and method for forming contacts in vias
#43Process of forming a high electron mobility transistor including a gate electrode layer spaced apart from a silicon nitride film
#44Method of fabricating transistor with short gate length by two-step photolithography
#45Nitride semiconductor device
#46Molecular layer etching
#47Semiconductor device and method for manufacturing semiconductor device
#48INTEGRATED CIRCUIT PACKAGE ASSEMBLIES WITH HIGH-ASPECT RATIO METALLIZATION FEATURES
#49Line structure for fan-out circuit and manufacturing method thereof, and photomask pattern for fan-out circuit
#50Semiconductor device manufacturing method
#51Field effect transistor and semiconductor device
#52Backplane for display device and method of manufacturing the same
#53APPARATUS AND METHODS FOR ASYMMETRIC DEPOSITION OF METAL ON HIGH ASPECT RATIO NANOSTRUCTURES
#54Selective deposition by laser heating for forming a semiconductor structure
#55Method for forming vias and method for forming contacts in vias
#56Prism-mask for angled patterning applications
#57Composition of spin-on materials containing metal oxide nanoparticles and an organic polymer
#58Method of reducing lift-off related redeposit defects on semiconductor wafers
#59Method for manufacturing device
#60Tools and methods for producing nanoantenna electronic devices
#61Hybrid mask for deep etching
#62Tunable hardmask for overlayer metrology contrast
#63Method of forming film
#64Semiconductor device and method for manufacturing the same
#65Methods for asymmetric deposition of metal on high aspect ratio nanostructures
#66Semiconductor element and method of manufacturing the same
#67High electron mobility transistor including a gate electrode layer spaced apart from a silicon nitride film
#68Method for making thin film transistor with nanowires as masks
#69Tunable hardmask for overlayer metrology contrast
#70Thin film transistor, manufacturing method therefor, array substrate and display panel
#71Method for manufacturing semiconductor device
#72Electronic device, manufacturing method for electronic device, and electronic apparatus
#73Method of manufacturing display apparatus and display apparatus manufactured using the same
#74Inorganic lift-off profile process for semiconductor wafer processing
#75Directed growth of electrically self-contacted monolayer transition metal dichalcogenides with lithographically defined metallic patterns
#76Process of forming nitride semiconductor device
#77Method for fabricating planarization layer
#78Thin film transistor, array substrate, and method for fabricating the same
#79Template, method for fabricating template, and method for manufacturing semiconductor device
#80Method for manufacturing pattern for electronic devices, and fiber-type electronic device comprising the pattern for electronic devices
#81Method for making thin film transistor
#82Method for making nanoscale channels
#83Method for manufacturing TFT substrate
#84Selective deposition process utilizing polymer structure deactivation process
#85Method of fabricating electrodes, method of fabricating thin film transistor, method of fabricating array substrate, thin film transistor, array substrate, and display apparatus
#86Polycrystalline silicon thin film transistor and method of fabricating the same, and display apparatus
#87Method for manufacturing thin film transistor, method for manufacturing array substrate, array substrate and display device
#88Method for making thin film transistor
#89Method for making thin film transistor with nanowires as masks
#90Method for making nano-scaled channels with nanowires as masks
#91Template and template manufacturing method
#92Touch panel and method of manufacturing the same
#93Selective passivation and selective deposition
#94Film for application to three-dimensional sample, method for manufacturing same, and method for transferring fine pattern using same
#95Selective SiARC removal
#96Patterning process with silicon mask layer
#97Array substrate and manufacturing method for the same
#98Backplane for display device and method of manufacturing the same
#99Method for manufacturing electrode of semiconductor device
#100Semiconductor device manufacture method
#101Swellable film forming compositions and methods of nanoimprint lithography employing same
#102Tools and methods for producing nanoantenna electronic devices
#103Graphene NMOS transistor using nitrogen dioxide chemical adsorption
#104COMPOSITION FOR REMOVING PHOTORESIST AND METHOD FOR REMOVING PHOTORESIST USING THE SAME
#105Semiconductor device with a recessed ohmic contact and methods of fabrication
#106Photolithographic patterning of electronic devices
#107Semiconductor device and method of manufacturing semiconductor device
#108Self-anchored catalyst metal-assisted chemical etching
#109Reactive ion etching assisted lift-off processes for fabricating thick metallization patterns with tight pitch
#110METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
#111Orthogonal patterning method
#112Photolithographic patterning of devices
#113Reactive ion etching assisted lift-off processes for fabricating thick metallization patterns with tight pitch
#114Array substrate and manufacturing method for the same
#115Methods of manufacturing transistors including forming a depression in a surface of a covering of resist material
#116METAL LIFTOFF TOOLS AND METHODS
#117Method and systems for coupling semiconductor substrates
#118Lithography process for the encapsulation of patterned thin film coatings
#119Dual coating and lift-off method for protecting patterned dielectric-metal coatings
#120Semiconductor device and method of manufacturing semiconductor device
#121Photoresist stripping using intelligent liquids
#122PMR writer with non-conformal side gaps
#123Process for the transfer of at least a portion of a composite film onto a flexible polymer membrane
#124Touch panel and method of manufacturing the same
#125THIN FILM TRANSISTOR ARRAY PANEL AND METHOD FOR MANUFACTURING THE SAME
#126Transistor including active layer having through holes and manufacturing method thereof
#127Method for integrated circuit patterning
#128Method for manufacturing thin film transistor and pixel unit thereof
#129Enhancement of modulus and hardness for UV-cured ultra low-k dielectric films
#130Method for providing a self-aligned pad protection in a semiconductor device
#131Wafer scale epitaxial graphene transfer
#132Metal liftoff tools and methods
#133Metal oxide TFT device and method for manufacturing the same
#134Tools and methods for producing nanoantenna electronic devices
#135Method for directed self-assembly (DSA) of a block copolymer (BCP) using a blend of a BCP with functional homopolymers
#136Formation of large scale single crystalline graphene
#137Method for producing a copper layer on a semiconductor body using a printing process
#138Method for directed self-assembly (DSA) of block copolymers
#139Method for forming different patterns in a semiconductor structure using a single mask
#140Thin film transistor and manufacturing method thereof, array substrate and manufacturing method thereof, display device
#141Method of Manufacturing Array Substrate of LCD
#142Method of joining semiconductor substrate
#143Methods for single exposure—self-aligned double, triple, and quadruple patterning
#144Method of manufacturing array substrate, array substrate and display device
#145Memory circuit structure and semiconductor process for manufacturing the same
#146Semiconductor devices with integrated Schottky diodes and methods of fabrication
#147Method for using post-processing methods for accelerating EUV lithography
#148DRY FILM PHOTORESIST, MANUFACTURING METHOD OF DRY FILM PHOTORESIST, METAL PATTERN FORMING METHOD AND ELECTRONIC COMPONENT
#149Method for thinning, metalizing, and dicing a semiconductor wafer, and semiconductor device made using the method
#150Dicing-free LED fabrication
#151Method of manufacturing semiconductor device
#152Elemental semiconductor material contact for high electron mobility transistor
#153Formation of large scale single crystalline graphene
#154Wafer scale epitaxial graphene transfer
#155Topography minimization of neutral layer overcoats in directed self-assembly applications
#156Metal liftoff tools and methods
#157Semiconductor device including insulating films with different moisture resistances and fabrication method thereof
#158Methods of manufacturing transistors including forming a depression in a surface of a covering of resist material
#159Processing for overcoming extreme topography
#160Methods for single exposure—self-aligned double, triple, and quadruple patterning
#161Patterning process for oxide film
#162Method of forming electric contact interface regions of an electronic device
#163Middle of line structures and methods for fabrication
#164Method for producing substrate having surface nanostructure
#165ENHANCED LIFT-OFF TECHNIQUES FOR USE WHEN FABRICATING LIGHT SENSORS INCLUDING DIELECTRIC OPTICAL COATING FILTERS
#166Enhanced lift-off techniques for use with dielectric optical coatings and light sensors produced therefrom
#167Pattern forming method
#168Multiple exposure with image reversal in a single photoresist layer
#169Method for producing microparticles
#170Fabrication methods for T-gate and inverted L-gate structure for high frequency devices and circuits
#171Double patterning method using tilt-angle deposition
#172Method for manufacturing semiconductor device
#173Method of forming multi-layer graphene
#174Middle of line structures
#175Production method for thick film metal electrode and production method for thick film resist
#176Lithography method using tilted evaporation
#177METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE
#178Chemically amplified positive resist composition and patterning process
#179Localized annealing of metal-silicon carbide ohmic contacts and devices so formed
#180Dicing-free LED fabrication
#181Processing for overcoming extreme topography
#182Method for applying a structure to a semiconductor element
#183Gate electrodes for millimeter-wave operation and methods of fabrication
#184Etch-enhanced technique for lift-off patterning
#185Method for forming a pattern on a substrate and electronic device formed thereby
#186Nanogaps: methods and devices containing same
#187METHOD FOR PRODUCING TRENCH ISOLATION IN SILICON CARBIDE AND GALLIUM NITRIDE AND ARTICLES MADE THEREBY
#188Method for Producing a Plurality of Regularly Arranged Nanoconnections on a Substrate
#189Thin film patterning method and method for manufacturing a liquid crystal display device
#190Polymer pattern and metal film pattern, metal pattern, plastic mold using thereof, and method of the forming the same
#191Method of forming photoresist burr edge and method of manufacturing array substrate
#192Process for adjusting the size and shape of nanostructures
#193METHOD FOR FORMING ELECTRODE ON SEMICONDUCTOR WAFER
#194Processing for overcoming extreme topography
#195METHOD OF FORMING INTERCONNECTION LINE AND METHOD OF MANUFACTURING THIN FILM TRANSISTOR SUBSTRATE
#196Club extension to a T-gate high electron mobility transistor
#197Suspended structures
#198Method for manufacturing semiconductor device
#199Method for forming an electrical structure comprising multiple photosensitive materials
#200Patterning techniques
#201Methods of minimizing etch undercut and providing clean metal liftoff
#202Component fabrication using thermal resist materials
#203Method for forming interlayer insulating film in semiconductor device
#204Method for manufacturing a device having a high aspect ratio via
#205Organic Film Composition and Method for Forming Resist Pattern
#206Method for forming a semiconductor structure having nanometer line-width
#207Methods for fabricating complex micro and nanoscale structures and electronic devices and components made by the same
#208Liquid toner-based pattern mask method and system
#209Reproducible, high yield method for fabricating ultra-short T-gates on HFETs
#210High throughput, low cost dual-mode patterning method for large area substrates
#211Process for the formation of miniaturized getter deposits and getter deposits so obtained
#212Method for producing submicron structures
#213Method of making nanopatterns and nanostructures and nanopatterned functional oxide materials
#214Method of forming a nano-structure and the nano-structure
#215Methods of forming metal layers using multi-layer lift-off patterns
#216Formation of interconnects through lift-off processing
#217Electronic components and methods for producing same
#218Method for forming gate pattern for electronic device
#219Method for manufacturing semiconductor device
#220Patterned structures fabricated by printing mask over lift-off pattern
#221Method of controlling the critical dimension of structures formed on a substrate
#222Displacement detection apparatus, displacement measurement apparatus and fixed point detection apparatus
#223Pattern formation method, electronic circuit manufactured by the same, and electronic device using the same
#224Patterned material layer, method of forming the same, microdevice, and method of manufacturing the same
#225Semiconductor device fabrication method
#226Patterning method for fabricating high resolution structures
#227Lift-off method
#228Method for manufacturing a patterned structure
#229Method of depositing material on a substrate for a device
#230Semiconductor device and manufacturing method thereof, and gate electrode and manufacturing method thereof
#231Processing for overcoming extreme topography
#232Method for pattern metalization of substrates
#233Plating method
#234Device manufacturing method and substrate comprising multiple resist layers
#235Forming a contact in a thin-film device
#236Inverse resist coating process
#237Fabrication method for liquid crystal display
#238Patterning using wax printing and lift off
#239Localized annealing of metal-silicon carbide ohmic contacts and devices so formed
#240Liftoff process for thin photoresist
#241Photo-mask process and method for manufacturing a thin film transistor using the process
#242Method for producing gallium oxide Schottky barrier diode with negative beveled angle terminal
#243Formation of high-resolution patterns inside deep cavities and applications to RF Si-embedded inductors
#244Formation of high-resolution patterns inside deep cavities and applications to RF SI-embedded inductors
#245Method for forming a microfabricated structure
#246Method for making guiding lines with oxidized sidewalls for use in directed self-assembly (DSA) of block copolymers
#247Process for forming gate of thin film transistor devices
#248Process for making PMR writer with non-conformal side gaps