207115 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Making masks on semiconductor bodies for further photolithographic processing not provided for in group or comprising organic layers characterised by the treatment of photoresist layers; Photolithographic processes using lasers
RESIST UNDERLAYER FILM-FORMING COMPOSITION
#2METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#3METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND UNDERLAYER FILM-FORMING COMPOSITION
#4PHOTOSENSITIVE RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE
#5METAL-CONTAINING FILM PATTERNING PROCESS
#6PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS
#7COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS
#8SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING THE COMPOSITIONS
#9PHOTORESIST COMPOSITIONS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME
#10SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING THE COMPOSITIONS
#11PHOTONIC COMMUNICATION PLATFORM
#12CHEMICAL-RESISTANT PROTECTIVE FILM
#13COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER
#14METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING METAL-ORGANIC FRAMEWORK
#15PHOTONIC COMMUNICATION PLATFORM
#16SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING THE COMPOSITION
#17METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND COMPOSITION INCLUDING FLOATING ADDITIVE
#18RESIST UNDERLAYER FILM-FORMING COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
#19PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
#20SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#21SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#22Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning Process
#23PROTECTIVE-FILM FORMING COMPOSITION
#24RESIST UNDERLAYER FILM FORMATION COMPOSITION
#25LOW VOLUME SHRINKAGE, HIGH ETCH RESISTANCE AND HIGH RESOLUTION PHOTORESISTS
#26POSITIVE TYPE LIFT-OFF RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST PATTERN USING THE SAME
#27Composition For Forming Resist Underlayer Film, Resist Underlayer Film, Method For Manufacturing Resist Underlayer Film, Patterning Process, And Method For Manufacturing Semiconductor Device
#28METHOD FOR FORMING DEPOSITION FILM
#29COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING HYDROXYCINNAMIC ACID DERIVATIVE
#30PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS
#31SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#32Method For Forming Resist Underlayer Film And Patterning Process
#33CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION HAVING CATECHOL GROUP
#34PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME
#35PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME
#36SPECTRAL FEATURE CONTROL APPARATUS
#37Composition For Forming Organic Film, Method For Forming Organic Film, And Patterning Process
#38ELECTRONIC DEVICE MANUFACTURING SOLUTION, METHOD FOR MANUFACTURING RESIST PATTERN, AND METHOD FOR MANUFACTURING DEVICE
#39METHODS FOR REAL TIME ETCH PROCESS COMPENSATION CONTROL
#40PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, CURED FILM, SEMICONDUCTOR PACKAGE, PATTERN FORMING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR PACKAGE
#41INTEGRATED PHOTORESIST REMOVAL AND LASER ANNEALING
#42INTEGRATED PHOTORESIST REMOVAL AND LASER ANNEALING
#43THINNER COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICES USING SAID THINNER COMPOSITION
#44Composition For Forming Organic Film, Method For Forming Organic Film, And Patterning Process
#45PHOTORESIST LAYER SURFACE TREATMENT, CAP LAYER, AND METHOD OF FORMING PHOTORESIST PATTERN
#46NAPHTHALENE UNIT-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION
#47COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ORGANIZATION
#48PHOTORESIST COMPOSITION INCLUDING PHOTOSENSITIVE POLYMER AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE
#49SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION
#50PROTECTIVE FILM, PROTECTIVE FILM AGENT, AND METHOD OF PROCESSING WORKPIECE
#51METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND COMPOSITION
#52PHOTORESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SUBSTRATE PROCESSING DEVICE
#53METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
#54METHODS AND APPARATUS TO REDUCE EXTREME ULTRAVIOLET LIGHT FOR PHOTOLITHOGRAPHY
#55PHOTORESIST COMPOSITION AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE
#56PHOTONIC COMMUNICATION PLATFORM
#57Infrared debond damage mitigation by copper fill pattern
#58PHOTORESIST COMPOSITION
#59METHOD AND APPARATUS FOR CONTROLLING DROPLET IN EXTREME ULTRAVIOLET LIGHT SOURCE
#60SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION
#61METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PHOTORESIST COMPOSITION
#62PHOTORESIST AND FORMATION METHOD THEREOF
#63Photonic communication platform
#64Photonic communication platform
#65Wafer Edge Protection Film Forming Method, Patterning Process, And Composition For Forming Wafer Edge Protection Film
#66METHOD OF MANUFACTURING SEMICONDUCTOR PACKAGE
#67METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
#68Photonic communication platform
#69Photonic communication platform
#70Integrated photoresist removal and laser annealing
#71UNDERLAYER COMPOUND FOR PHOTOLITHOGRAPHY, MULTILAYERED STRUCTURE FORMED USING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME
#72RESIST UNDERLAYER FILM-FORMING COMPOSITION
#73Photonic communication platform
#74IDENTIFICATION CODES ON SEMICONDUCTOR CHIPS
#75Manufacturing method for cured substance, manufacturing method for laminate, and manufacturing method for semiconductor device, and treatment liquid
#76METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
#77RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING FLUOROALKYL GROUP-CONTAINING ORGANIC ACID OR SALT THEREOF
#78FILM FORMING COMPOSITION FOR LITHOGRAPHY, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD
#79Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern
#80PHOTORESISTS CONTAINING TANTALUM
#81PLANARIZING AGENT FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS
#82COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN
#83RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING REACTION PRODUCT OF HYDANTOIN COMPOUNDS
#84DRY DEPOSITED PHOTORESISTS WITH ORGANIC CO-REACTANTS
#85EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION
#86BRUSH POLYMER, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE
#87PROTECTIVE FILM-FORMING COMPOSITION CONTAINING DIOL STRUCTURE
#88FILM-FORMING COMPOSITION
#89FILM-FORMING COMPOSITION
#90FILM-FORMING COMPOSITION
#91PHOTO-DECOMPOSABLE COMPOUND, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE
#92Spectral feature control apparatus
#93Photonic communication platform
#94METHOD OF FORMING A PATTERN OF SEMICONDUCTOR DEVICE OF A SEMICONDUCTOR DEVICE ON A SEMICONDUCTOR SUBSTRATE BY USING AN EXTREME ULTRAVIOLET MASK
#95CLEANING METHOD OF ELECTRONIC COMPONENT AND MANUFACTURING METHOD OF ELEMENT CHIP
#96SILICON-CONTAINING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
#97RESIST PATTERN FORMING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
#98Shared Contact Structure and Methods for Forming the Same
#99EUV GENERATOR, EUV LITHOGRAPHY APPARATUS INCLUDING THE SAME, AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
#100METHOD FOR FORMING PHOTORESIST PATTERNS
#101METROLOGY FOR IMPROVING DUV LASER ALIGNMENT
#102METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND PATTERN FORMATION METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICES
#103STRUCTURE MANUFACTURING METHOD AND STRUCTURE
#104METHOD FOR BUILDING CONDUCTIVE THROUGH-HOLE VIAS IN GLASS SUBSTRATES
#105Silicon-containing layer-forming composition, and method for producing pattern-equipped substrate which uses same
#106Lithography exposure system with debris removing mechanism
#107RESIST UNDERLAYER FILM-FORMING COMPOSITION
#108Interferometer systems and methods for real time etch process compensation control
#109RESIST UNDERLAYER FILM-FORMING COMPOSITION
#110DEPOSITION MASK MANUFACTURING METHOD AND MANUFACTURING APPARATUS THEREOF
#111Resist underlayer film-forming composition
#112Substrate structuring methods
#113Method of making a picoscopic scale/ nanoscopic scale circuit pattern
#114Method and apparatus for controlling droplet in extreme ultraviolet light source
#115Method for processing workpiece
#116Agglutinant for Pellicles, Pellicle Frame with Agglutinant Layer, Pellicle, Exposure Original Plate with Pellicle, Exposure Method, Method for Producing Semiconductor, and Method for Producing Liquid Crystal Display Board
#117Device chip manufacturing method
#118ORIGINAL PLATE AND METHOD OF MANUFACTURING THE SAME
#119Water soluble organic-inorganic hybrid mask formulations and their applications
#120Extreme ultraviolet light generation system and electronic device manufacturing method
#121Method for pitch split patterning using sidewall image transfer
#122Automatic kerf offset mapping and correction system for laser dicing
#123Method and apparatus for controlling droplet in extreme ultraviolet light source
#124Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereof
#125Method for die-level unique authentication and serialization of semiconductor devices using electrical and optical marking
#126Method of fabrication and control of nano-structure array by angle-resolved exposure in proximity-field nano patterning
#127Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern
#128Photonic communication platform
#129Water soluble organic-inorganic hybrid mask formulations and their applications
#130Nonlinear Scattering Lithography
#131PHOTORESIST COMPOSITION, PHOTOLITHOGRAPHY METHOD USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
#132Substrate structuring methods
#133Semiconductor device package and method for manufacturing the same
#134Splicing nano-imprint template with repair adhesive layer, repair method of splicing seam thereof, and manufacturing method thereof
#135PHOTOSENSITIVE COMPOSITION AND METHOD OF MANUFACTURING GRAPHENE DEVICE
#136Backside metal photolithographic patterning die singulation systems and related methods
#137Method of producing semiconductor devices in a substrate including etching of the pattern of an etch mask and/or a reticle to create the first dicing lanes encircling the devices and second dicing lanes defined by fracture lines of the edges of the substrate
#138Silicon-containing layer-forming composition, and method for producing pattern-equipped substrate which uses same
#139Lithography exposure method with debris removing mechanism
#140Methods of defect inspection
#141Spectral feature control apparatus
#142Lithographic apparatus and method
#143Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added
#144Shared contact structure and methods for forming the same
#145Pattern-forming method, and composition
#146Semiconductor device and methods of manufacturing
#147EUV vessel inspection method and related system
#148Composition for forming silicon-containing resist underlayer film and patterning process
#149Method for die-level unique authentication and serialization of semiconductor devices using electrical and optical marking
#150Determining overlay of features of a memory array
#151Method for processing workpiece
#152Photomask pellicle glue residue removal
#153Photonic communication platform
#154Laser radiation system and method for manufacturing electronic device
#155Backside metal photolithographic patterning die singulation systems and related methods
#156Extreme ultraviolet light generation apparatus and electronic device manufacturing method
#157Microelectronic assemblies having conductive structures with different thicknesses
#158METHOD AND APPARATUS FOR IMMERSION GRATING LITHOGRAPHY
#159Simultaneous double-side coating of multilayer graphene pellicle by local thermal processing
#160PHOTOMASK HAVING REFLECTIVE LAYER WITH NON-REFLECTIVE REGIONS
#161Mask blanks, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device
#162Method of patterning resist layer and method of forming semiconductor structure using patterned resist layer
#163Shared contact structure and methods for forming the same
#164Processing method of workpiece
#165Morphology of resist mask prior to etching
#166Tunable adhesion of EUV photoresist on oxide surface
#167Laser apparatus for generating extreme ultraviolet light
#168Mask blank, phase-shift mask, and method of manufacturing semiconductor device
#169EUV radiation modification methods and systems
#170EUV vessel inspection method and related system
#171Photomask pellicle glue residue removal
#172Dual-damascene zero-misalignment-via process for semiconductor packaging
#173Spectral feature control apparatus
#174Extreme ultraviolet lithography for high volume manufacture of a semiconductor device
#175Method of spacer-defined direct patterning in semiconductor fabrication
#176Aqueous solution for resist pattern coating and pattern forming methods using the same
#177Dual-damascene zero-misalignment-via process for semiconductor packaging
#178Tunable adhesion of EUV photoresist on oxide surface
#179Method and device for lithographically producing a target structure on a non-planar initial structure
#180Mask blank, phase-shift mask, and method of manufacturing semiconductor device
#181Method of manufacturing integrated circuit device
#182Method for processing workpiece
#183Photoresist composition for deep ultraviolet light patterning method and method of manufacturing semiconductor device
#184PHOTOSENSITIVE COMPOSITION AND METHOD OF MANUFACTURING GRAPHENE DEVICE
#185MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE
#186Methods of defect inspection
#187Imprint apparatus, imprint method, and article manufacturing method
#188EUV vessel inspection method and related system
#189PATTERN-FORMING METHOD, AND COMPOSITION
#190Photosensitive resin composition, photosensitive, sheet, semiconductor device and method for manufacturing semiconductor device
#191EUV radiation modification methods and systems
#192Compound semiconductor solar cell and method of manufacturing the same
#193Vapor deposition mask and organic EL display device
#194Method of manufacturing semiconductor device using photoresist as ion implantation mask
#195Spectral feature control apparatus
#196Coating agent for reducing roughness of resist pattern, and method for forming resist pattern in which roughness is reduced
#197Exposure apparatus, exposure method, and device manufacturing method
#198High-precision dispense system with meniscus control
#199High-purity dispense system
#200Mask blanks, phase shift mask, and method for manufacturing semiconductor device
#201METHODS OF FORMING A SUBSTRATE HAVING AN OPEN PORE THEREIN AND PRODUCTS FORMED THEREBY
#202ORGANIC PROCESSING LIQUID AND PATTERN FORMING METHOD
#203Coating compositions for photolithography
#204Vapor deposition mask and organic el display device
#205Manufacturing method of semiconductor device and template for nanoimprint
#206Pattern formation method
#207Salt and photoresist composition containing the same
#208Developer for lithography
#209System and method for generating extreme ultraviolet light employing laser pulse including pedestal
#210ORGANIC TREATMENT LIQUID FOR PATTERNING RESIST FILM, METHOD OF PRODUCING ORGANIC TREATMENT LIQUID FOR PATTERNING RESIST FILM, STORAGE CONTAINER OF ORGANIC TREATMENT LIQUID FOR PATTERNING RESIST FILM, PATTERN FORMING METHOD USING THE SAME, AND METHOD OF PRODUCING ELECTRONIC DEVICE
#211Mask blank, phase-shift mask, method of manufacturing mask blank, method of manufacturing phase-shift mask and method of manufacturing semiconductor device
#212Method of forming non-continuous line pattern and non-continuous line pattern structure
#213Self-organization material and pattern formation method
#214Developer for lithography
#215Methods for fabricating semiconductor device
#216Pattern forming method
#217Coating compositions for photolithography
#218Solutions and processes for removing substances from substrates
#219Methods of manufacturing photomasks, methods of forming photoresist patterns and methods of manufacturing semiconductor devices
#220Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method
#221Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound
#222Manufacturing method of semiconductor device
#223Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
#224Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device
#225Method of forming patterns
#226Beam shapers, annealing systems employing the same, methods of heat treating substrates and methods of fabricating semiconductor devices
#227Pattern forming method
#228Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device
#229Methods for fabricating FinFET integrated circuits using laser interference lithography techniques
#230Method of forming patterns
#231Methods of laser processing photoresist in a gaseous environment
#232Resist pattern-forming method and photoresist composition
#233Semiconductor structure and method for forming the same
#234Resist composition, method of forming resist pattern, polymeric compound and compound
#235Method of forming patterns
#236Beam shapers, annealing systems employing the same, methods of heat treating substrates and methods of fabricating semiconductor devices
#237Polymer-containing developer
#238Providing electron beam proximity effect correction by simulating write operations of polygonal shapes
#239Non-uniform two dimensional electron gas profile in III-Nitride HEMT devices
#240Radiation-sensitive resin composition and pattern-forming method
#241Pattern forming method, chemical amplification resist composition and resist film
#242Method of forming an etch mask
#243Providing electron beam proximity effect correction by simulating write operations of polygonal shapes
#244Method of forming patterns
#245RESIST PROCESSING METHOD
#246Patterning process
#247Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same
#248Fabrication of semiconductor devices using anti-reflective coatings
#249Pattern formation method, pattern formation apparatus, exposure method, exposure apparatus, and device manufacturing method
#250Localized masking for semiconductor structure development
#251Manufacturing method of semiconductor integrated circuit device
#252METHOD FOR FORMING PHOTORESIST PATTERN, METHOD FOR MANUFACTURING DISPLAY PANEL, AND METHOD FOR MANUFACTURING DISPLAY DEVICE
#253High throughput, low cost dual-mode patterning method for large area substrates
#254System and method for printing a pattern
#255Method and system for proximity effect and dose correction for a particle beam writing device
#256Method for manufacturing semiconductor device using KrF light source
#257Coating compositions for photolithography
#2583D lithography with laser beam writer for making hybrid surfaces
#259Fabrication of semiconductor devices using anti-reflective coatings
#260Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same
#261Method for fabricating semiconductor device using ArF photolithography capable of protecting tapered profile of hard mask
#262Localized masking for semiconductor structure development
#263Pattern forming method and method for manufacturing semiconductor device
#264Etch selectivity enhancement for tunable etch resistant anti-reflective layer
#265Processing method and semiconductor manufacturing method
#266Dry etching method and apparatus
#267Pattern forming method, semiconductor device and method for manufacturing the same
#268Method of manufacturing a semiconductor device
#269Method of forming metal line layer in semiconductor device
#270Shared contact structure and methods for forming the same
#271Pulsed light beam spectral feature control