207119 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Making masks on semiconductor bodies for further photolithographic processing not provided for in group or comprising organic layers characterised by the treatment of photoresist layers Ionlithographic processes
PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS
#2METHOD FOR PRODUCING LAMINATE AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT
#3PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS
#4ION BEAM LITHOGRAPHY AND NANOENGINEERING
#5Forming contact holes with controlled local critical dimension uniformity
#6Fabrication of high-aspect ratio nanostructures by localized nanospalling effect
#7Material for forming organic film, method for forming organic film, patterning process, and compound
#8Nonlinear Scattering Lithography
#9Pattern forming method
#10Multiple patterning approach using ion implantation
#11METHOD TO TUNE CONTACT CD AND REDUCE MASK COUNT BY TILTED ION BEAM
#12Continuous writing of pattern
#13Spin-on layer for directed self assembly with tunable neutrality
#14Compounders for enhancing generation of chemical species
#15Multiple exposure treatment for processing a patterning feature
#16Projection patterning with exposure mask
#17Sequential infiltration synthesis for advanced lithography
#18Photo resist (PR) profile control
#19Sequential infiltration synthesis for advanced lithography
#20Multibeam System
#21Methods for aligning patterns on a substrate based on optical properties of a mask layer and related devices