207121 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Making masks on semiconductor bodies for further photolithographic processing not provided for in group or comprising inorganic layers for lift-off processes
SUBSTRATE PROCESSING WITH REDUCTION OF PRESSURE AND HYDRATION BEFORE DEVELOPMENT
#2GATE METAL FORMATION ON GALLIUM NITRIDE OR ALUMINUM GALLIUM NITRIDE
#3Semiconductor device and method
#4Electrical devices with electrodes on softening polymers and methods of manufacturing thereof
#5METHOD FOR SELECTIVELY ETCHING A METAL COMPONENT
#6Electrical devices with electrodes on softening polymers and methods of manufacturing thereof
#7HARD MASK LIFTOFF PROCESSES
#8Method and structure for thin-film fabrication
#9METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENTS BY METAL LIFT-OFF PROCESS AND SEMICONDUCTOR ELEMENT MANUFACTURED THEREBY
#10Gate metal formation on gallium nitride or aluminum gallium nitride
#11Semiconductor device and method
#12Molecular layer etching
#13Method of forming semiconductor structure having layer with re-entrant profile
#14Plated metallization structures
#15Semiconductor device and method
#16Electrical devices with electrodes on softening polymers and methods of manufacturing thereof
#17Hybrid mask for deep etching
#18Hybrid diamond-polymer thin film sensors and fabrication method
#19Semiconductor element and method of manufacturing the same
#20Thin film transistor, manufacturing method therefor, array substrate and display panel
#21Process of forming nitride semiconductor device
#22Method of forming semiconductor structure having layer with re-entrant profile
#23Plated metallization structures
#24Resist multilayer film-attached substrate and patterning process
#25Patterned sidewall smoothing using a pre-smoothed inverted tone pattern
#26Selective SiARC removal
#27System and Method for Producing a Nano Metal Mesh using a Brittle Film Template for Lithography
#28Cleaning method and cleaning device using micro/nano-bubbles
#29Array substrate and manufacturing method for the same
#30Electrical devices with electrodes on softening polymers and methods of manufacturing thereof
#31Reactive ion etching assisted lift-off processes for fabricating thick metallization patterns with tight pitch
#32Array substrate and manufacturing method for the same
#33Lift off process for chip scale package solid state devices on engineered substrate
#34System and method for producing a nano metal mesh using a brittle film template for lithography
#35Methods for processing a semiconductor workpiece
#36Masking methods for ALD processes for electrode-based devices
#37Lithography process for the encapsulation of patterned thin film coatings
#38Direct and pre-patterned synthesis of two-dimensional heterostructures
#39Method for increasing pattern density in self-aligned patterning schemes without using hard masks
#40Method for preparing film patterns
#41Process for the transfer of at least a portion of a composite film onto a flexible polymer membrane
#42SEMICONDUCTOR DEVICE
#43Fabrication method of plate pattern
#44DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME
#45Manufacturing method for display device
#46Base film-forming composition, and directed self-assembly lithography method
#47Dicing-free LED fabrication
#48Highly etch-resistant polymer block for use in block copolymers for directed self-assembly
#49Semiconductor device including insulating films with different moisture resistances and fabrication method thereof
#50Light emitting device
#51METHOD FOR FABRICATION OF NANO-STRUCTURES
#52APPARATUS AND METHOD FOR CONFORMAL MASK MANUFACTURING
#53Method for processing a semiconductor wafer or die, and particle deposition device
#54Method for patterning using phase-change material
#55Dicing-free LED fabrication
#56Particulate nanosorting stack
#57Method for the realization of a crossbar array of crossed conductive or semi-conductive access lines
#58Apparatus and method for conformal mask manufacturing
#59METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#60Double patterning method
#61Configuration and manufacturing method of low-resistance gate structures for semiconductor devices and circuits
#62Method of removing a compound semiconductor layer from a compound semiconductor device
#63Method of depositing localized coatings
#64METHOD OF MANUFACTURING ELECTRONIC DEVICE
#65Method for patterning nanowires on substrate using novel sacrificial layer material
#66Method for patterning a semiconductor device
#67Method of forming fine pattern of semiconductor device using sige layer as sacrificial layer, and method of forming self-aligned contacts using the same
#68Double patterning method
#69Double patterning method
#70Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers
#71Method for Patterning Using Phase-Change Material
#72Method of forming semiconductor device having nanotube structures
#73Methods of fabrication employing nanoscale mandrels
#74Method for fabricating monolithic two-dimensional nanostructures
#75METHOD OF MANUFACTURING DISPLAY DEVICE AND DISPLAY DEVICE THEREFROM
#76Methods of minimizing etch undercut and providing clean metal liftoff
#77Method of fabricating T-gate
#78Method of manufacturing nanoelectrode lines using nanoimprint lithography process
#79SEMICONDUCTOR APPARATUS AND MANUFACTURING METHOD THEREOF
#80Multilayer hardmask scheme for damage-free dual damascene processing of SiCOH dielectrics
#81Patterned material layer, method of forming the same, microdevice, and method of manufacturing the same
#82Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same
#83Selectively coated self-aligned mask
#84Columnar structured material and method of manufacturing the same
#85Apparatus and method for conformal mask manufacturing
#86Method for patterning a semiconductor device
#87Multilayer hardmask scheme for damage-free dual damascene processing of SiCOH dielectrics
#88Subtractive - Additive Edge Defined Lithography
#89Method of fabricating T-gate
#90Lift-off patterning processing employing energetically-stimulated local removal of solid-condensed-gas layers
#91Method of etching a dielectric layer to form a contact hole and a via hole and damascene method
#92Method for forming gate pattern for electronic device
#93Multiple mask process with etch mask stack
#94Critical dimension control for integrated circuits
#95Patterned ferroelectric thin films for microwave devices
#96Patterning method for fabricating high resolution structures
#97Subtractive-Additive Edge Defined Lithography
#98Multilayer hardmask scheme for damage-free dual damascene processing of SiCOH dielectrics
#99Process for making an array of wells
#100Critical dimension control for integrated circuits
#101Columnar structured material and method of manufacturing the same
#102Method of forming fine pattern of semiconductor device using SiGe layer as sacrificial layer, and method of forming self-aligned contacts using the same
#103Manufacturing method for molecular rulers
#104Semiconductor multilevel interconnect structure
#105Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same
#106Liquid discharge head
#107Method for forming macropores in a layer and products obtained thereof
#108Forming a contact in a thin-film device
#109Inverse resist coating process
#110Method for fabricating field effect transistor
#111Method for patterning films
#112Method for producing a hard mask in a capacitor device and a hard mask for use in a capacitor device
#113Means and method for patterning a substrate with a mask
#114Semiconductor structure having layer with re-entrant profile and method of forming the same
#115Positioning device for aligning semiconductor tool and overhead hoist transport system
#116Application of titanium-oxide as a patterning hardmask
#117Surface modification process for laser application
#118Methods for making a semiconductor chip device
#119High precision metal thin film liftoff technique