207247 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups, , , and with or without impurities, e.g. doping materials Bombardment with radiation
Sub-classes:NANOSCALE RESOLUTION, SPATIALLY-CONTROLLED CONDUCTIVITY MODULATION OF DIELECTRIC MATERIALS USING A FOCUSED ION BEAM
#2Radiation hardened thin-film transistors
#3Nanoscale resolution, spatially-controlled conductivity modulation of dielectric materials using a focused ion beam
#4Radiation hardened thin-film transistors
#5Semiconductor processing systems with in-situ electrical bias
#6Aluminum oxide semiconductor manufacturing method and aluminum oxide semiconductor manufacturing device
#7Radiation hardened thin-film transistors
#8Thin-film transistor, liquid crystal display panel, and thin-film transistor manufacturing method
#9INTEGRATION OF ABSORPTION BASED HEATING BAKE METHODS INTO A PHOTOLITHOGRAPHY TRACK SYSTEM
#10Semiconductor Annealing Method Utilizing a Vacuum Environment
#11Light emitting diode with a current concentrating structure
#12MOSFET with improved performance through induced net charge region in thick bottom insulator
#13Method and structure for using discontinuous laser scribe lines
#14Light emitting diode with a current concentrating structure
#15Method for the heat treatment of substrates
#16Three-dimensional lithographic fabrication technique
#17Light-emitting semiconductor device and method of fabrication