207254 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups, , , and with or without impurities, e.g. doping materials; Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups - ; Deposition of conductive or insulating materials for electrodes from a liquid, e.g. electrolytic deposition
TWO-DIMENSIONAL SEMICONDUCTOR TRANSISTOR HAVING REDUCED HYSTERESIS AND MANUFACTURING METHOD THEREFOR
#2Coating liquid for forming metal oxide film, oxide insulator film, field-effect transistor, display element, image display device, and system
#3Leakage-free implantation-free ETSOI transistors
#4Plating chuck
#5Substrate processing apparatus and substrate processing method
#6SYSTEM AND METHOD FOR RFID TAG INTERFACING
#7Preparation method for fully transparent thin film transistor
#8Thin film transistor, production method thereof, and electronic apparatus
#9Thin film transistor including high-dielectric insulating thin film and method of fabricating the same
#10Organic polymer gate dielectric material for transistor devices
#11Coplanar double gate electrode oxide thin film transistor and manufacture method thereof
#12Method for manufacturing wiring pattern, method for manufacturing transistor, and member for transfer
#13Electronic device and methods of fabricating the same
#14SEMICONDUCTOR DEVICE AND PRODUCTION METHOD THEREFOR
#15Leakage-free implantation-free ETSOI transistors
#16Leakage-free implantation-free ETSOI transistors
#17Method of forming vias in silicon carbide and resulting devices and circuits
#18Electrolytic copper foil and manufacturing method therefor
#19Precursors for the production of thin oxide layers and the use thereof
#20Electrode pair, method for fabricating the same, substrate for device, and device
#21THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF FABRICATING THE SAME
#22Method of separating a wafer of semiconductor devices
#23Manufacturing method of a thin film transistor
#24Electroconductive thin film, coating liquid for forming electroconductive thin film, field-effect transistor, and method for producing field-effect transistor
#25Substrate processing apparatus
#26Film forming method, semiconductor device, manufacturing method thereof and substrate processing apparatus therefor
#27Method of forming vias in silicon carbide and resulting devices and circuits
#28Method of forming vias in silicon carbide and resulting devices and circuits
#29Method of forming vias in silicon carbide and resulting devices and circuits
#30Method for manufacturing electrodes on a semiconducting material of type II-VI or on a compound of this material
#31Curable polymeric materials and their use for fabricating electronic devices
#32Curable polymeric materials and their use for fabricating electronic devices