ClassID:

207311

H01L21/62 - CPC Classification

Classification description:

Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof the devices having no potential-jump barriers or surface barriers

Recent Application in this class:
#1
20240365683
2024-10-31

METHODS OF MANUFACTURING MAGNETIC RANDOM ACCESS MEMORY, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE

#2
20230298907
2023-09-21

METHOD OF MANUFACTURING STRUCTURE AND METHOD OF MANUFACTURING CAPACITOR

#3
20220336730
2022-10-20

Magnetic random access memory

#4
20220336234
2022-10-20

METHOD OF FABRICATING A LATTICE STRUCTURE

#5
20220254905
2022-08-11

Method for manufacturing an integrated circuit comprising a junction field effect transistor (JFET)

#6
20220130948
2022-04-28

Semiconductor device, solid-state imaging device, and method for manufacturing semiconductor device

#7
20210320214
2021-10-14

Localized strain fields in epitaxial layer over cREO

#8
20200357986
2020-11-12

Magnetic random access memory

#9
20190296236
2019-09-26

Method for fabrication of a CEM device

#10
20190148628
2019-05-16

Magnetic random access memory

#11
20180294329
2018-10-11

Metal resistors having nitridized dielectric surface layers and nitridized metal surface layers

#12
20180219060
2018-08-02

Metal resistors having nitridized metal surface layers with different nitrogen content

#13
20180197941
2018-07-12

Metal resistors having varying resistivity

#14
20170301747
2017-10-19

Metal resistors having nitridized metal surface layers with different nitrogen content

#15
20170301746
2017-10-19

Metal resistors having nitridized dielectric surface layers and nitridized metal surface layers

#16
20170301745
2017-10-19

Metal resistors having varying resistivity

#17
20170166436
2017-06-15

Manufacturing method for a micromechanical pressure sensor device and corresponding micromechanical pressure sensor device

#18
20160176192
2016-06-23

METHOD FOR MACHINING SILICON SUBSTRATE, AND LIQUID EJECTION HEAD

#19
20160146752
2016-05-26

Device for detecting at least one gaseous analyte and method for the production thereof

#20
20140177311
2014-06-26

Memory device structure with decoders in a device level separate from the array level

#21
20140081299
2014-03-20

Micromachined Ultrasonic Scalpel with Embedded Piezoelectric Actuator

#22
20130169713
2013-07-04

Method of making liquid discharge head, liquid discharge head, liquid discharge apparatus having liquid discharge head, and manufacturing apparatus of liquid discharge head