ClassID:

207463

H01L21/76221 - CPC Classification

Classification description:

Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof; Manufacture of specific parts of devices defined in group; Making of isolation regions between components; Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO with a plurality of successive local oxidation steps

Recent Application in this class:
#1
20250351544
2025-11-13

CONTROL OF LOCOS STRUCTURE THICKNESS WITHOUT A MASK

#2
20240297067
2024-09-05

High voltage device and manufacturing method thereof

#3
20240258175
2024-08-01

CONTROL OF LOCOS STRUCTURE THICKNESS WITHOUT A MASK

#4
20230317508
2023-10-05

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE WITH PRE-CLEANING TREATMENT

#5
20230245919
2023-08-03

GATE AND LOCOS DIELECTRICS GROWN USING LOCOS PROCESSING

#6
20230135889
2023-05-04

INTEGRATED CIRCUIT DEVICE WITH IMPROVED OXIDE EDGING

#7
20220238691
2022-07-28

Semiconductor device including capacitor

#8
20220223464
2022-07-14

High voltage device and manufacturing method thereof

#9
20210359102
2021-11-18

Semiconductor device including capacitor

#10
20210013319
2021-01-14

Semiconductor device including capacitor

#11
20190363095
2019-11-28

Method for manufacturing a semiconductor device

#12
20190013391
2019-01-10

Semiconductor device

#13
20150311111
2015-10-29

Fin structure of semiconductor device

#14
20150194421
2015-07-09

Semiconductor die, integrated circuits and driver circuits, and methods of maufacturing the same

#15
20150054123
2015-02-26

Self-aligned emitter-base region

#16
20130207235
2013-08-15

Self-aligned emitter-base region

#17
20130200485
2013-08-08

Method for manufacturing semiconductor device having element isolation portions

#18
20070087506
2007-04-19

METHOD OF FORMING A SEMICONDUCTOR DEVICE

#19
20070087505
2007-04-19

METHOD OF FORMING A SEMICONDUCTOR DEVICE

#20
20060231902
2006-10-19

LOCOS trench isolation structures

#21
20050266644
2005-12-01

Method of manufacturing semiconductor device having multiple gate oxide films

#22
20050012158
2005-01-20

Locos trench isolation structure