ClassID:

210792

H01L2224/80075 - CPC Classification

Classification description:

Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by; Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by connecting a bonding area directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding; Bonding environment; Composition of the atmosphere being inert

Recent Application in this class:
#1
20260047466
2026-02-12

BONDING APPARATUS AND METHOD OF BONDING SEMIOCONDUCTOR CHIPS

#2
20250279391
2025-09-04

SEMICONDUCTOR PACKAGE

#3
20240243085
2024-07-18

CONDUCTIVE BARRIER DIRECT HYBRID BONDING

#4
20240222314
2024-07-04

Bonding method for copper-copper metal with hydrazine hydrate

#5
20230075263
2023-03-09

WAFER BONDING METHOD USING SELECTIVE DEPOSITION AND SURFACE TREATMENT

#6
20220367391
2022-11-17

Semiconductor structure

#7
20220254746
2022-08-11

Conductive barrier direct hybrid bonding

#8
20210043547
2021-02-11

Front-to-back bonding with through-substrate via (TSV)

#9
20200321294
2020-10-08

Semiconductor structure and method for forming the same

#10
20200126941
2020-04-23

Semiconductor device for bonding conductive layers exposed from surfaces of respective interconnection layers

#11
20200027868
2020-01-23

Hybrid bonding with through substrate via (TSV)

#12
20190237419
2019-08-01

Conductive barrier direct hybrid bonding

#13
20190096830
2019-03-28

Semiconductor structure and method for forming the same

#14
20190051628
2019-02-14

Hybrid bonding systems and methods for semiconductor wafers

#15
20180350639
2018-12-06

Gas-controlled bonding platform for edge defect reduction during wafer bonding

#16
20180151436
2018-05-31

Direct bonding method

#17
20180145011
2018-05-24

Front-to-back bonding with through-substrate via (TSV)

#18
20170358551
2017-12-14

Hybrid bonding systems and methods for semiconductor wafers

#19
20170047260
2017-02-16

Apparatus and method for verification of bonding alignment

#20
20160204084
2016-07-14

Front-to-back bonding with through-substrate via (TSV)

#21
20150287694
2015-10-08

Hybrid bonding systems and methods for semiconductor wafers

#22
20150233698
2015-08-20

Apparatus and method for verification of bonding alignment

#23
20150021784
2015-01-22

Front-to-back bonding with through-substrate via (TSV)

#24
20150021771
2015-01-22

Mechanisms for forming three-dimensional integrated circuit (3DIC) stacking structure

#25
20140256087
2014-09-11

Hybrid bonding and apparatus for performing the same

#26
20140209908
2014-07-31

Flattened substrate surface for substrate bonding

#27
20140131874
2014-05-15

Semiconductor apparatus, electronic device, and method of manufacturing semiconductor apparatus

#28
20140011324
2014-01-09

Hybrid bonding systems and methods for semiconductor wafers

#29
20130113106
2013-05-09

Three-dimensional (3D) integrated circuit with enhanced copper-to-copper bonding

#30
20130105981
2013-05-02

Flattened substrate surface for substrate bonding

#31
20120241961
2012-09-27

Semiconductor apparatus, electronic device, and method of manufacturing semiconductor apparatus

#32
20120184069
2012-07-19

Method for bonding of chips on wafers

#33
20100122456
2010-05-20

Integrated Alignment and Bonding System