208201 ⎘
Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor; Capacitors; Electrodes with an enlarged surface, e.g. formed by texturisation being a rough surface, e.g. using hemispherical grains
SEMICONDUCTOR DEVICE STRUCTURE WITH ELECTRODE LAYER AND METHOD FOR FORMING THE SAME
#2METAL PLATE CORNER STRUCTURE ON METAL INSULATOR METAL
#3SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE
#4Metal plate corner structure on metal insulator metal
#5THIN FILM CAPACITOR, ITS MANUFACTURING METHOD, AND ELECTRONIC CIRCUIT SUBSTRATE HAVING THE THIN FILM CAPACITOR
#6SEMICONDUCTOR DEVICE INCLUDING POLYSILICON STRUCTURES AND METHOD OF MAKING
#7Thin film capacitor and electronic circuit substrate having the same
#8Thin film capacitor and electronic circuit substrate having the same
#9Thin film capacitor and electronic circuit substrate having the same
#10SEMICONDUCTOR DEVICE AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME
#11ELECTRONIC SYSTEM WITH POWER DISTRIBUTION NETWORK INCLUDING CAPACITOR COUPLED TO COMPONENT PADS
#12MANUFACTURING METHOD FOR DEEP TRENCH CAPACITOR WITH SCALLOPED PROFILE
#13Method for fabricating metal-insulator-metal capacitor
#14Semiconductor device and method of fabricating the same
#15Semiconductor device and manufacturing method thereof
#16CAPACITOR AND METHOD FOR PRODUCING THE SAME
#17Memory cell, capacitive memory structure, and methods thereof
#18Substrate structure having roughned upper surface of conductive layer
#19Method for manufacturing semiconductor structure, and semiconductor structure
#20Semiconductor device including polysilicon structures and method of making
#21Semiconductor device and manufacturing method for semiconductor device
#22Metal-insulator-metal capacitor and method for fabricating the same
#23Metal-insulator-metal capacitors including nanofibers
#24Capacitor and method for manufacturing the same
#25SINUSOIDAL SHAPED CAPACITOR ARCHITECTURE IN OXIDE
#26Semiconductor device and manufacturing method thereof
#27Fingerprint sensors
#28Method of forming semiconductor device including polysilicon structures
#29Capacitor devices and fabrication methods thereof
#30Fingerprint sensors and fabrication methods thereof
#31Semiconductor device including polysilicon structures having differing grain sizes and including a barrier layer therebetween
#32Sinusoidal shaped capacitor architecture in oxide
#33Oscillating capacitor architecture in polysilicon for improved capacitance
#34METHOD OF FABRICATING BOTTOM ELECTRODE
#35SEMICONDUCTOR MEMORY DEVICES AND METHODS OF FABRICATING THE SAME
#36Method of forming a capacitor structure and capacitor structure
#37Thin film capacitor and semiconductor device with improved heat dissipation
#38Electrochemical capacitor and semiconductor chip having an electrochemical capacitor
#39Capacitors and Methods of Forming Capacitors
#40Integration of energy storage devices onto substrates for microelectronics and mobile devices
#41Light emitting device having interstitial elements in grain boundaries of barrier layer
#42Method and device for a dram capacitor having low depletion ratio
#43Silicon structure and manufacturing methods thereof and of capacitor including silicon structure
#44Enhanced capacitance trench capacitor
#45TRENCH CAPACITOR STRUCTURES AND METHOD OF MANUFACTURING THE SAME
#46Method of forming enhanced capacitance trench capacitor
#47Manufacturing method of power storage device
#48Methods for forming roughened surfaces and applications thereof
#49Method and device for a DRAM capacitor having low depletion ratio
#50Electrically and/or thermally actuated device
#51Methods for forming small-scale capacitor structures
#52Transistor with reduced depletion field width
#53SYSTEM AND METHOD FOR FORMING AN INTEGRATED BARRIER LAYER
#54METHOD AND STRUCTURE FOR SILICON NANOCRYSTAL CAPACITOR DEVICES FOR INTEGRATED CIRCUITS
#55Integrated circuit comprising a capacitor with HSG metal electrodes
#56SYSTEMS AND METHODS FOR FABRICATING HIGH-DENSITY CAPACITORS
#57Systems and methods for providing high-density capacitors
#58SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF
#59Method for manufacturing a semiconductor device
#60Process for deposition of semiconductor films
#61METHOD OF MODIFYING SURFACE AREA AND ELECTRONIC DEVICE
#62Methods for enhancing capacitors having roughened features to increase charge-storage capacity
#63Apparatus for storing electrical energy
#64Method for forming roughened surface
#65Metal capacitor including lower metal electrode having hemispherical metal grains
#66Method for Preparing Doped Polysilicon Conductor and Method for Preparing Trench Capacitor Structure Using the Same
#67Capacitor with nanotubes and method for fabricating the same
#68Semiconductor Device and Method for Producing the Same
#69DRAM STACK CAPACITOR AND FABRICATION METHOD THEREOF
#70Localized masking for semiconductor structure development
#71Method of forming inside rough and outside smooth HSG electrodes and capacitor structure
#72Methods for forming conductive structures and structures regarding same
#73DEEP TRENCH AND FABRICATING METHOD THEREOF, TRENCH CAPACITOR AND FABRICATING METHOD THEREOF
#74Increasing the capacitance of a capacitive device by micromasking
#75Methods for fabricating a capacitor
#76Enhanced atomic layer deposition
#77METHODS FOR ENHANCING TRENCH CAPACITANCE AND TRENCH CAPACITOR
#78Semiconductor device having projection on lower electrode and method for forming the same
#79Integrated circuit comprising a capacitor with metal electrodes and process for fabricating such a capacitor
#80Semiconductor device and method for manufacturing the same
#81Semiconductor constructions
#82Doped aluminum oxide dielectrics
#83CAPACITOR IN SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD
#84Method and structure for fabricating capacitor devices for integrated circuits
#85Methods for enhancing trench capacitance and trench capacitor
#86Method for fabricating capacitor of semiconductor device
#87Thin films and methods of making them
#88Method for burying resist and method for manufacturing semiconductor device
#89Capacitor with hemispherical silicon-germanium grains and a method for making the same
#90METHOD FOR FABRICATING FIRST ELECTRODE OF CAPACITOR
#91Method for forming capacitor of semiconductor device
#92Deposition over mixed substrates using trisilane
#93System and method for forming an integrated barrier layer
#94Capacitor constructions
#95Semiconductor device and manufacturing method thereof
#96Metal-insulator-metal-structured capacitor formed with polysilicon
#97Conductive container structures having a dielectric cap
#98MEMORY STRUCTURE AND MEMORY DEVICE
#99Methods for forming roughened surfaces and applications thereof
#100Methods for fabricating a capacitor
#101SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
#102Method for forming a metal oxide film
#103MIM capacitor
#104Low selectivity deposition methods
#105METAL CAPACITOR INCLUDING LOWER METAL ELECTRODE HAVING HEMISPHERICAL METAL GRAINS
#106Capacitor fabrication methods and capacitor constructions
#107Method of forming dielectric film and capacitor manufacturing method using the same
#108Semiconductor device and method for fabricating the same
#109MEMORY STRUCTURE, MEMORY DEVICE AND MANUFACTURING METHOD THEREOF
#110Method of manufacturing charge storage device
#111Semiconductor device having capacitor large in capacitance and high in reliability and method of manufacturing the same
#112Capacitor in semiconductor device and manufacturing method
#113Method of forming inside rough and outside smooth HSG electrodes and capacitor structure
#114Method of forming a contact using a sacrificial structure
#115MIS capacitor and method of formation
#116Reduced cell-to-cell shorting for memory arrays
#117Etch process used during the manufacture of a semiconductor device and systems including the semiconductor device
#118Method for production of semiconductor device having a hole extending through a first insulating film, a second insulating film and a third insulating film
#119Method for fabricating capacitor in semiconductor device using hafnium terbium oxide dielectric layer
#120Process for deposition of semiconductor films
#121Semiconductor constructions
#122HSG PROCESS AND PROCESS OF FABRICATING LARGE-AREA ELECTRODE
#123Method for enhancing electrode surface area in DRAM cell capacitors
#124Method for manufacturing a semiconductor device
#125Capacitor of semiconductor device and method of fabricating the same
#126Method for manufacturing semiconductor storage device comprising a slow cooling step
#127Semiconductor capacitor structure and method to form same
#128Capacitor fabrication methods and capacitor constructions
#129In-line processing for forming a silicon nitride film
#130Methods for forming material layers with substantially planar surfaces on semiconductor device structures
#131Semiconductor device fabrication methods employing substantially planar buffer material layers to improve the planarity of subsequent planarazation processes
#132Method of forming a storage electrode of a semiconductor device
#133Method for enhancing electrode surface area in DRAM cell capacitors
#134Methods for enhancing capacitors having roughened features to increase charge-storage capacity
#135Semiconductor capacitor structure and method to form same
#136Semiconductor capacitor structure and method to form same
#137Semiconductor capacitor structure and method to form same
#138Semiconductor capacitor structure and method to form same
#139Semiconductor capacitor structure and method to form same
#140Methods of forming integrated circuit electrodes and capacitors by wrinkling a layer that includes a high percentage of impurities
#141Capacitor constructions
#142Methods of forming HSG layers and devices
#143Semiconductor device including a stacked capacitor
#144Conductive container structures having a dielectric cap
#145MIS capacitor and method of formation
#146Bubbler for substrate processing
#147Electronic systems
#148Method for preparing a deep trench
#149DRAM cells
#150Single wafer thermal CVD processes for hemispherical grained silicon and nano-crystalline grain-sized polysilicon
#151Capacitor with nanotubes and method for fabricating the same
#152Rugged metal electrodes for metal-insulator-metal capacitors
#153Methods of fabricating double-sided hemispherical silicon grain electrodes and capacitor modules
#154Methods of forming semiconductor constructions
#155Methods of fabricating double-sided hemispherical silicon grain electrodes and capacitor modules
#156ANTIFUSE HAVING TANTALUM OXYNITRIDE FILM AND METHOD FOR MAKING SAME
#157Semiconductor device and method for fabricating the same
#158Method of manufacturing a hemisperical grain silicon layer and method of manufacturing a semiconductor device using the same
#159Process for fabricating dynamic random access memory
#160Method for fabricating semiconductor device
#161Method of improved high K dielectric-polysilicon interface for CMOS devices
#162Capacitor structures with oxynitride layer between capacitor plate and capacitor dielectric layer
#163Method of forming a capacitor
#164Method for forming capacitor of semiconductor device
#165Semiconductor device having a cylindrical capacitor and method for manufacturing the same using a two-layer structure and etching to prevent blockage
#166Structures having an electrode formed from a transition metal or a conductive metal-oxide
#167Semiconductor device having a stacked capacitor
#168Methods for forming and integrated circuit structures containing ruthenium and tungsten containing layers
#169Hemispherical silicon grain capacitor with variable grain size
#170Reduction in size of hemispherical grains of hemispherical grained film
#171Method for forming a capacitor for an integrated circuit and integrated circuit
#172Field-effect transistors having doped aluminum oxide dielectrics
#173Boron-doped amorphous carbon film for use as a hard etch mask during the formation of a semiconductor device
#174Capacitors having doped aluminum oxide dielectrics
#175Localized masking for semiconductor structure development
#176Floating-gate field-effect transistors having doped aluminum oxide dielectrics
#177Electronic systems having doped aluminum oxide dielectrics
#178Semiconductor constructions
#179Memory devices with dual-sided capacitors
#180Method of fabricating capacitor in semiconductor device and semiconductor device using the same
#181Method and structure for integrated stacked capacitor formation
#182Capacitor in semiconductor device having dual dielectric film structure and method for fabricating the same
#183Capacitor and method for manufacturing the same
#184Capacitor constructions and methods of forming
#185Even nucleation between silicon and oxide surfaces for thin silicon nitride film growth
#186Capacitor and method for fabricating the same
#187Silicon nanocrystal capacitor and process for forming same
#188Reduced cell-to-cell shorting for memory arrays
#189Semiconductor device and method for manufacturing the same
#190Thin films and methods of making them
#191High surface area capacitor structures and precursors
#192Diffusion-enhanced crystallization of amorphous materials to improve surface roughness
#193Process for fabrication of a ferrocapacitor with a large effective area
#194Methods for forming conductive structures and structures regarding same
#195Semiconductor memory device having capacitor and method of forming the same
#196Memory device with platinum-rhodium stack as an oxygen barrier
#197Storage electrode of a semiconductor device and method of forming the same
#198Methods for forming rough ruthenium-containing layers and structures/methods using same
#199Process for deposition of semiconductor films
#200Method of forming a double-sided capacitor
#201Method for forming capacitor of semiconductor device
#202Capacitor with conducting nanostructure
#203Methods of forming capacitors, methods of forming capacitor-over-bit line memory circuitry, and related integrated circuitry constructions
#204Methods of providing ohmic contact
#205Selective hemispherical silicon grain (HSG) conversion inhibitor for use during the manufacture of a semiconductor device
#206Hemi-spherical grain silicon enhancement
#207Capacitor structures, DRAM cell structures, and integrated circuitry, and methods of forming capacitor structures, integrated circuitry and DRAM cell structures
#208Method for forming a capacitor for use in a semiconductor device
#209Methods for forming small-scale capacitor structures
#210Word lines for memory cells
#211Capacitor having tantalum oxynitride film and method for making same
#212Ultra-high capacitance device based on nanostructures
#213Method for filling trench and relief geometries in semiconductor structures
#214Method for fabricating capacitor in semiconductor device
#215Method for fabricating semiconductor device
#216Semiconductor device precursor structures to a double-sided capacitor or a contact
#217Method of selectively etching HSG layer in deep trench capacitor fabrication
#218Capacitor structure having hemispherical grains
#219Reduced cell-to-cell shorting for memory arrays
#220Methods of forming a double-sided capacitor or a contact using a sacrificial structure
#221DRAM constructions, memory arrays and semiconductor constructions
#222Method and device for on-chip decoupling capacitor using nanostructures as bottom electrode
#223Capacitor constructions
#224Electronic deivce and method for its fabrication
#225Method for forming capacitor of semiconductor device
#226Capacitor for use in an integrated circuit
#227Even nucleation between silicon and oxide surfaces for thin silicon nitride film growth
#228Method for fabricating a capacitor containing metastable polysilicon
#229Capacitor having low resistance electrode including a thin silicon layer
#230Process for deposition of semiconductor films
#231Capacitor constructions and rugged silicon-containing surfaces
#232Methods of forming rugged silicon-containing surfaces
#233Methods of forming hemisperical grained silicon on a template on a semiconductor work object
#234Deposition over mixed substrates
#235Capacitor constructions and semiconductor structures
#236Hemi-spherical grain silicon enhancement
#237Semiconductor capacitor structure and method to form same
#238Double-sided capacitor structure for a semiconductor device and a method for forming the structure
#239Methods of forming hemispherical grained silicon on a template on a semiconductor work object
#240Method of fabricating semiconductor device
#241Capacitor element, semiconductor integrated circuit and method of manufacturing those
#242Method for manufacturing semiconductor integrated circuit device
#243Conductive container structures having a dielectric cap
#244Capacitor constructions and methods of forming
#245Methods for making semiconductor device structures with capacitor containers and contact apertures having increased aspect ratios
#246Semiconductor device and method of manufacturing semiconductor device
#247Methods of fabricating double-sided hemispherical silicon grain electrodes and capacitor modules