ClassID:

208236

H01L29/0813 - CPC Classification

Classification description:

Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor; Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes; Emitter regions of bipolar transistors Non-interconnected multi-emitter structures

Recent Application in this class:
#1
20220029004
2022-01-27

Bipolar transistor and radio-frequency power amplifier module

#2
20200251579
2020-08-06

Bipolar transistor and radio-frequency power amplifier module

#3
20200144401
2020-05-07

Method of forming epitaxial silicon layer and semiconductor device thereof

#4
20190267479
2019-08-29

Semiconductor device

#5
20190267478
2019-08-29

Bipolar junction transistor

#6
20190140058
2019-05-09

Semiconductor device

#7
20190131439
2019-05-02

Method of forming epitaxial silicon layer and semiconductor device thereof

#8
20190131175
2019-05-02

Semiconductor structure with strain reduction

#9
20190088768
2019-03-21

Bipolar transistor and radio-frequency power amplifier module

#10
20190081597
2019-03-14

Hybrid cascode constructions with multiple transistor types

#11
20190081163
2019-03-14

Semiconductor device including insulated gate bipolar transistor element and freewheeling diode element

#12
20190058054
2019-02-21

Bipolar transistor semiconductor device

#13
20180323292
2018-11-08

Bipolar junction transistor

#14
20180212071
2018-07-26

Junction barrier schottky diode with enhanced surge current capability

#15
20180175022
2018-06-21

Method of forming MOS and bipolar transistors

#16
20180174840
2018-06-21

Forming a metal contact layer on silicon carbide and semiconductor device with metal contact structure

#17
20180083129
2018-03-22

Semiconductor device

#18
20170338155
2017-11-23

Method of manufacturing semiconductor device

#19
20170309620
2017-10-26

Bipolar junction transistor and method of manufacturing the same

#20
20170236818
2017-08-17

Semiconductor device

#21
20160372548
2016-12-22

Bipolar junction transistors with double-tapered emitter fingers

#22
20160247745
2016-08-25

Semiconductor structure including a thermally conductive, electrically insulating layer

#23
20160218193
2016-07-28

Semiconductor device with multilayer contact and method of manufacturing the same

#24
20160111528
2016-04-21

Semiconductor device with auxiliary structure including deep level dopants

#25
20150380534
2015-12-31

Power semiconductor device and corresponding module

#26
20150001679
2015-01-01

ESD protection element

#27
20140027776
2014-01-30

Transistor and method of manufacturing a transistor

#28
20130334566
2013-12-19

Power semiconductor device and method for manufacturing such a power semiconductor device

#29
20130105911
2013-05-02

Semiconductor device

#30
20120248575
2012-10-04

Semiconductor device with multilayer contact and method of manufacturing the same

#31
20120132999
2012-05-31

Method of manufacturing a bipolar transistor and bipolar transistor

#32
20120068309
2012-03-22

Transistor and method of manufacturing a transistor

#33
20100230719
2010-09-16

ESD protection element

#34
20090079031
2009-03-26

METHOD AND DEVICE WITH IMPROVED BASE ACCESS RESISTANCE FOR NPN BIPOLAR TRANSISTOR

#35
20080246115
2008-10-09

Robust ESD cell

#36
20050121749
2005-06-09

Bipolar transistor including divided emitter structure

#37
16013363
2019-06-04

Heterojunction bipolar transistors with multiple emitter fingers and undercut extrinsic base regions