208294 ⎘
Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor; Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AB compounds Amorphous materials
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
#2SEMICONDUCTOR DEVICE
#3Semiconductor device comprising silicon and oxide semiconductor in channel formation region
#4Laminate, semiconductor device, and method for manufacturing laminate
#5Laminate, semiconductor device, and method for manufacturing laminate
#6COMPOSITE OXIDE SEMICONDUCTOR AND TRANSISTOR
#7Integrated Assemblies Having Semiconductor Oxide Channel Material, and Methods of Forming Integrated Assemblies
#8Laminate, semiconductor device, and method for manufacturing laminate
#9Semiconductor device with a fin-shaped active region and a gate electrode
#10Semiconductor device comprising oxide semiconductor with c-axis-aligned crystals
#11Thin film transistor array substrate for digital x-ray detector device, digital x-ray detector device, and manufacturing method thereof
#12Composite oxide semiconductor and transistor
#13Semiconductor devices
#14Semiconductor device
#15Tin oxide layer, TFT having the same as channel layer, and manufacturing method for the TFT
#16Integrated assemblies having semiconductor oxide channel material, and methods of forming integrated assemblies
#17Transistor and electronic device
#18Metal oxide film, semiconductor device, and manufacturing method of semiconductor device
#19Semiconductor-on-insulator (SOI) substrate comprising a trap-rich layer with small grain sizes
#20Thin film transistors with a crystalline oxide semiconductor source/drain
#21Self-aligned top-gated non-planar oxide semiconductor thin film transistors
#22TFT, MANUFACTURING METHOD THEREOF, AND LCD DEVICE
#23Semiconductor device
#24SEMICONDUCTOR DEVICE AND DISPLAY DEVICE
#25Semiconductor device with a fin-shaped active region and a gate electrode
#26Layer, multilevel element, method for fabricating multilevel element, and method for driving multilevel element
#27Semiconductor device
#28Layer, multilevel element, method for fabricating multilevel element, and method for driving multilevel element
#29Layer, multilevel element, method for fabricating multilevel element, and method for driving multilevel element
#30Metal oxide film, semiconductor device, and manufacturing method of semiconductor device
#31THIN FILM TRANSISTOR SUBSTRATE, MANUFACTURING METHOD FOR THIN FILM TRANSISTOR SUBSTRATE, AND LIQUID CRYSTAL DISPLAY
#32Method for manufacturing semiconductor device and method for manufacturing liquid crystal display panel
#33Composite oxide semiconductor and transistor
#34Electronic device including two-dimensional electron gas and method of fabricating the same
#35Semiconductor device having a fin-shaped active region and a gate electrode
#36Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
#37Reduction of defect induced leakage in III-V semiconductor devices
#38Semiconductor device and manufacturing method thereof
#39Reduction of defect induced leakage in III-V semiconductor devices
#40Fabrication method of an array substrate
#41Semiconductor device having an oxide semiconductor layer
#42Field-effect transistor and semiconductor device
#43Semiconductor device and manufacturing method thereof
#44Oxide and method for forming the same
#45Semiconductor device and manufacturing method thereof
#46Semiconductor device including transistor whose gate is electrically connected to capacitor
#47Semiconductor device
#48Semiconductor device and manufacturing method thereof
#49Transistor having sulfur-doped zinc oxynitride channel layer and method of manufacturing the same
#50Thin film transistor
#51Precursor composition and method for forming amorphous conductive oxide film
#52Composite oxide sintered body and sputtering target comprising same
#53Semiconductor device
#54Semiconductor device comprising an oxide semiconductor
#55Composite oxide sintered body and sputtering target comprising same
#56Semiconductor device