ClassID:

208295

H01L29/221 - CPC Classification

Classification description:

Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor; Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AB compounds including two or more compounds, e.g. alloys

Sub-classes:
Recent Application in this class:
#1
20240421231
2024-12-19

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

#2
20240222519
2024-07-04

CARRIER MODIFICATION DEVICES FOR AVOIDING CHANNEL LENGTH REDUCTION AND METHODS FOR FABRICATING THE SAME

#3
20240105854
2024-03-28

TRANSISTOR STRUCTURES WITH A METAL OXIDE CONTACT BUFFER AND A METHOD OF FABRICATING THE TRANSISTOR STRUCTURES

#4
20230352544
2023-11-02

Semiconductor device and manufacturing method thereof

#5
20230299207
2023-09-21

Semiconductor device comprising silicon and oxide semiconductor in channel formation region

#6
20230260556
2023-08-17

SEMICONDUCTOR DEVICE

#7
20230021699
2023-01-26

Carrier modification devices for avoiding channel length reduction and methods for fabricating the same

#8
20220406783
2022-12-22

SEMICONDUCTOR MEMORY DEVICE

#9
20220367645
2022-11-17

Semiconductor device and manufacturing method thereof

#10
20220093141
2022-03-24

Semiconductor device

#11
20220052200
2022-02-17

Transistor structures with a metal oxide contact buffer and a method of fabricating the transistor structures

#12
20210399097
2021-12-23

Semiconductor device and manufacturing method thereof

#13
20210343856
2021-11-04

Ferroelectric or anti-ferroelectric trench capacitor with spacers for sidewall strain engineering

#14
20210202746
2021-07-01

Semiconductor device comprising oxide semiconductor with c-axis-aligned crystals

#15
20210159342
2021-05-27

Semiconductor device and manufacturing method of semiconductor device

#16
20210143213
2021-05-13

Bipolar selector device for a memory array

#17
20210012816
2021-01-14

Semiconductor device

#18
20200411692
2020-12-31

Transistor structures with a metal oxide contact buffer

#19
20200395460
2020-12-17

Ferroelectric or anti-ferroelectric trench capacitor with spacers for sidewall strain engineering

#20
20200212222
2020-07-02

Semiconductor device

#21
20200212188
2020-07-02

LDMOS with high-k drain STI dielectric

#22
20200185518
2020-06-11

Tin oxide layer, TFT having the same as channel layer, and manufacturing method for the TFT

#23
20200119202
2020-04-16

Metal oxide film, semiconductor device, and manufacturing method of semiconductor device

#24
20200066912
2020-02-27

Systems, methods, and apparatuses for implementing bi-layer semiconducting oxides in source and drain for low access and contact resistance of thin film transistors

#25
20200052095
2020-02-13

VERTICAL FIELD EFFECT TRANSISTORS WITH SELF ALIGNED SOURCE/DRAIN JUNCTIONS

#26
20200044056
2020-02-06

Vertical field effect transistors with self aligned source/drain junctions

#27
20190355833
2019-11-21

Vertical field effect transistors with self aligned source/drain junctions

#28
20190229192
2019-07-25

Semiconductor device and method for manufacturing semiconductor device

#29
20190172952
2019-06-06

Semiconductor device

#30
20190103471
2019-04-04

LDMOS with high-k drain STI dielectric

#31
20190058043
2019-02-21

TRANSISTOR GATE-CHANNEL ARRANGEMENTS

#32
20190035939
2019-01-31

Metal oxide film, semiconductor device, and manufacturing method of semiconductor device

#33
20180166580
2018-06-14

Method for manufacturing semiconductor device and method for manufacturing liquid crystal display panel

#34
20170077243
2017-03-16

SINTERED OXIDE, SPUTTERING TARGET, AND OXIDE SEMICONDUCTOR THIN FILM OBTAINED USING SPUTTERING TARGET

#35
20170045524
2017-02-16

Passivated nanoparticles

#36
20160163871
2016-06-09

Semiconductor device and manufacturing method thereof

#37
20160096993
2016-04-07

Semiconductor structure having nanocrystalline core and nanocrystalline shell pairing with compositional transition layer

#38
20150295143
2015-10-15

Semiconductor structure having nanocrystalline core and nanocrystalline shell paring with compositional transition layer

#39
20150122315
2015-05-07

Two-dimensional (2D) material element with in-plane metal chalcogenide-based heterojunctions and devices including said element

#40
20140346501
2014-11-27

Semiconductor device

#41
20140299877
2014-10-09

Coating liquid for forming metal oxide thin film, metal oxide thin film, field-effect transistor, and method for manufacturing field-effect transistor

#42
20140252344
2014-09-11

P-type oxide composition, and method for producing P-type oxide composition

#43
20140117311
2014-05-01

SEMICONDUCTOR STRUCTURE HAVING NANOCRYSTALLINE CORE AND NANOCRYSTALLINE SHELL PAIRING WITH COMPOSITIONAL TRANSITION LAYER

#44
20130082256
2013-04-04

Semiconductor device

#45
20130056691
2013-03-07

Metal Oxide Semiconductor Films, Structures, and Methods

#46
20130039859
2013-02-14

Passivated nanoparticles

#47
20110127523
2011-06-02

Semiconductor device

#48
20110037067
2011-02-17

ZNO-GROUP SEMICONDUCTOR ELEMENT

#49
20110006285
2011-01-13

Core-alloyed shell semiconductor nanocrystals

#50
20100244019
2010-09-30

Metal Oxide Semiconductor Films, Structures and Methods

#51
20090034568
2009-02-05

Zinc oxide based compound semiconductor device

#52
20080296534
2008-12-04

Core-Alloyed Shell Semiconductor Nanocrystals

#53
20080157200
2008-07-03

STRESS LINER SURROUNDED FACETLESS EMBEDDED STRESSOR MOSFET

#54
20060255351
2006-11-16

Metal oxide semiconductor films, structures and methods

#55
20060134883
2006-06-22

Systems and methods for electrical contacts to arrays of vertically aligned nanorods

#56
13733428
2016-03-22

Low cost semiconducting alloy nanoparticles ink and manufacturing process thereof