208303 ⎘
Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor; Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, elements provided for in two or more of the groups , , , , , e.g. alloys Amorphous materials
SEMICONDUCTOR STRUCTURE WITH WRAPAROUND BACKSIDE AMORPHOUS LAYER
#2SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
#3SEMICONDUCTOR ELEMENT AND PRODUCTION METHOD FOR SEMICONDUCTOR ELEMENT
#4Semiconductor structure with wraparound backside amorphous layer
#5METHOD FOR MANUFACTURING TELLURIUM-BASED SEMICONDUCTOR DEVICE, TELLURIUM-BASED SEMICONDUCTOR DEVICE MANUFACTURED THEREBY, AND THIN FILM TRANSISTOR
#6Semiconductor device comprising silicon and oxide semiconductor in channel formation region
#7FDSOI device structure and preparation method thereof
#8Semiconductor structure with wraparound backside amorphous layer
#9Semiconductor memory device and method of manufacturing the same
#10FDSOI device structure and preparation method thereof
#11Silicon carbide semiconductor device
#12Semiconductor device comprising oxide semiconductor with c-axis-aligned crystals
#13Leakage-free implantation-free ETSOI transistors
#14Semiconductor device provided with oxide semiconductor TFT
#15Semiconductor device
#16Semiconductor-on-insulator (SOI) substrate comprising a trap-rich layer with small grain sizes
#17Oxide semiconductor film, thin film transistor, oxide sintered body, and sputtering target
#18Semiconductor device
#19ARRAY SUBSTRATE, MANUFACTURING METHOD, AND LCD PANEL
#20Method for manufacturing semiconductor device and method for manufacturing liquid crystal display panel
#21Method for manufacturing semiconductor device
#22Leakage-free implantation-free ETSOI transistors
#23Semiconductor device including write access transistor whose oxide semiconductor layer including channel formation region
#24Leakage-free implantation-free ETSOI transistors
#25Reduction of defect induced leakage in III-V semiconductor devices
#26Leakage-free implantation-free ETSOI transistors
#27Oxide semiconductor film including indium, tungsten and zinc and thin film transistor device
#28Method for manufacturing semiconductor device
#29Semiconductor device
#30Reduction of defect induced leakage in III-V semiconductor devices
#31Semiconductor device and manufacturing method thereof
#32Semiconductor device and method for manufacturing the same
#33Method for manufacturing semiconductor device
#34Semiconductor device including write access transistor having channel region including oxide semiconductor
#35Semiconductor device
#36Methods and Systems for Evaluating IGZO with Respect to NBIS
#37IGZO devices with composite channel layers and methods for forming the same
#38Method of producing thin film transistor, thin film transistor, display device, image sensor, and X-ray sensor
#39Semiconductor device
#40Semiconductor device
#41Method for manufacturing semiconductor device
#42Method for driving semiconductor device
#43Active-matrix Panel Display Device, TFT and Method for Forming the Same
#44Semiconductor device and method for manufacturing the same
#45Thin film transistor and method for manufacturing the same
#46Semiconductor device and manufacturing method thereof
#47Oxide semiconductor field effect transistor and method for manufacturing the same
#48Method for manufacturing semiconductor device
#49Semiconductor memory device with transistor having oxide semiconductor channel formation region
#50Method for manufacturing semiconductor device
#51Method for manufacturing semiconductor device
#52Semiconductor memory device
#53Multi-nary group IB and VIA based semiconductor
#54Semiconductor device and manufacturing method thereof
#55Method for manufacturing semiconductor device
#56Semiconductor device
#57Semiconductor device
#58Oxide semiconductor field effect transistor and method for manufacturing the same
#59Method for manufacturing semiconductor device
#60Compound semiconductor formed from a heated portion of a layered structure including rare earth transition metal
#61MOSFET with ultra low drain leakage