208503 ⎘
Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor; Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched; Diodes Hi-lo semiconductor devices, e.g. memory devices
PIN DIODE INCLUDING A CONDUCTIVE LAYER, AND FABRICATION PROCESS
#2Pin diode including a conductive layer, and fabrication process
#3Selector devices
#4Crosspoint phase change memory with crystallized silicon diode access device
#5Pin diode including a conductive layer, and fabrication process
#6THRESHOLD SWITCHING DEVICE
#7Diode structure
#8Diode/superionic conductor/polymer memory structure
#9Dielectric-based memory cells having multi-level one-time programmable and bi-level rewriteable operating modes and methods of forming the same
#10Memory device, semiconductor unit and method of operating the same, and electronic apparatus
#11Non-volatile resistive-switching memories
#12Non-volatile resistive-switching memories
#13Two terminal switching device having bipolar switching property, method of fabricating the same, and resistive memory cross-point array having the same
#14Resistance switching device and process for producing thereof
#15Semiconductor device and power conversion device using the same
#16Self-selecting PCM device not requiring a dedicated selector transistor
#17Surface treatment to improve resistive-switching characteristics
#18Self-rectified device, method for manufacturing the same, and applications of the same
#19Conductive bridge resistive memory device and method of manufacturing the same
#20Non-volatile resistive-switching memories
#21Memory cell string based on gated-diode cell and memory array using the same
#22Surface treatment to improve resistive-switching characteristics
#23Vertical diodes for non-volatile memory device
#24METAL OXIDE STRUCTURES, DEVICES, AND FABRICATION METHODS
#25Heterojunction device comprising a semiconductor oxide and a resistivity-switching oxide or nitride
#26Resistive switching memory device
#27Memristors based on mixed-metal-valence compounds
#28Method of forming non-volatile resistive-switching memories
#29Electrically actuated device
#30Switchable junction with an intrinsic diode formed with a voltage dependent resistor
#31Memristive junction with intrinsic rectifier
#32Surface treatment to improve resistive-switching characteristics
#33Semiconductor memristor devices
#34Thermally Stable Nanoscale Switching Device
#35In-situ passivation methods to improve performance of polysilicon diode
#36Self-selecting PCM device not requiring a dedicated selector transistor
#37Memory devices and methods of operating the same
#38Pillar devices and methods of making thereof
#39Multi-Layer Reconfigurable Switches
#40Heterojunction device comprising a semiconductor and a resistivity-switching oxide or nitride
#41Nonvolatile memory device and nonvolatile memory array including the same
#42Method for fabricating a 3-D integrated circuit using a hard mask of silicon-oxynitride on amorphous carbon
#43Vertical diode and method for manufacturing same and semiconductor memory device
#44Surface treatment to improve resistive-switching characteristics
#45Non-volatile resistive-switching memories
#46Reverse leakage reduction and vertical height shrinking of diode with halo doping
#47Patterning of submicron pillars in a memory array
#48Pillar devices and methods of making thereof
#49Memory device using abrupt metal-insulator transition and method of operating the same
#50Memory device including resistance-changing function body
#51Diode and memory device comprising the same
#52Electric element, memory device, and semiconductor integrated circuit formed using a state-variable material whose resistance value varies according to an applied pulse voltage
#53Method for fabricating a 3-D integrated circuit using a hard mask of silicon-oxynitride on amorphous carbon
#54Diode/superionic conductor/polymer memory structure
#55Semiconductor memory device and the production method
#56Non-volatile memory devices including variable resistance material
#57Heterojunction device comprising a semiconductor and a resistivity-switching oxide or nitride
#58Nonvolatile memory device and nonvolatile memory array including the same
#59Phase change RAM including resistance element having diode function and methods of fabricating and operating the same
#60Method for patterning submicron pillars
#61Memory device including resistance-changing function body
#62Memory cell