INTRACARDIAC CATHETER WITH X-RAY EMITTING PROBE

ELECTRON BEAM-BASED EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE

METROLOGY APPARATUS BASED ON HIGH HARMONIC GENERATION AND ASSOCIATED METHOD

EUV radiation source, insert for an EUV radiation source and insert for an insert for an EUV radiation source

Method of operating semiconductor apparatus and semiconductor apparatus

Extreme ultraviolet radiation in genomic sequencing and other applications

High-temperature plasma raw material supply apparatus and extreme ultra violet light source apparatus

Charged particle beam irradiation apparatus, charged particle beam image acquisition apparatus, and charged particle beam inspection apparatus

Radiation system and optical device

Extreme ultraviolet lithography system with debris trapper on exhaust line

Device for monitoring a radiation source, radiation source, method of monitoring a radiation source, device manufacturing method

Extreme ultraviolet radiation in genomic sequencing and other applications

Differential phase contrast X-ray imaging system and components

Extreme ultraviolet generation device and exposure system including the same

APPARATUS GENERATING EXTREME ULTRAVIOLET LIGHT AND EXPOSURE SYSTEM INCLUDING THE SAME

Extreme ultraviolet lithography collector contamination reduction

Method of aligning a laser-based radiation source

Apparatus, a device and a device manufacturing method

Foil trap and light source device using such foil trap

Laser-driven light source for generating light from a plasma in an pressurized chamber

EUV light source for generating a used output beam for a projection exposure apparatus

Photo-masks for lithography

System and method for transverse pumping of laser-sustained plasma

Electron-coupled transformer

Arrangement for cooling a plasma-based radiation source with a metal cooling liquid and method for starting up a cooling arrangement of this type

Final focus assembly for extreme ultraviolet light source

EUV light source for generating a usable output beam for a projection exposure apparatus

Fuel system for lithographic apparatus, EUV source, lithographic apparatus and fuel filtering method

Differential phase contrast X-ray imaging system and components

Method and system for manufacturing a target for the emission of photon radiation, particularly X rays, or of particles, particularly protons or electrons, by laser firing

Method and arrangement for generating a jet of fluid, method and system for transforming the jet into a plasma, and uses of said system

Method for controlling an EUV source

High brightness laser-driven light source

Targets and processes for fabricating same

Target supply apparatus, chamber, and extreme ultraviolet light generation apparatus

Collector mirror exchanging apparatus and method for extreme ultraviolet light source apparatus

Lithographic apparatus, EUV radiation generation apparatus and device manufacturing method

Differential phase contrast X-ray imaging system and components

ILLUMINANCE DISTRIBUTION DETECTION METHOD IN EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND POSITIONING METHOD OF LIGHT FOCUSING OPTICAL MEANS

Collector mirror assembly and extreme ultraviolet light source device using said collector mirror assembly

Targets and processes for fabricating same

METHOD FOR CLEANING OPTICAL ELEMENT OF EUV LIGHT SOURCE DEVICE AND OPTICAL ELEMENT CLEANING DEVICE

Evaporative thermal management of grazing incidence collectors for EUV lithography

EUV radiation source comprising a droplet accelerator and lithographic apparatus

Method and arrangement for the adjustment of characteristics of a beam bundle of high-energy radiation emitted from a plasma

EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS

BIOLOGICAL LASER PLASMA X-RAY POINT SOURCE

EUV light source glint reduction system

Laser-driven light source

Laser-driven light source

Radiation source

SYSTEM AND METHOD FOR LIGHT SOURCE EMPLOYING LASER-PRODUCED PLASMA

Laser-based accelerator for interrogation of remote containers

Laser device

METHOD FOR REGENERATING A SURFACE OF AN OPTICAL ELEMENT IN AN XUV RADIATION SOURCE, AND XUV RADIATION SOURCE

EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE

Source module, radiation source and lithographic apparatus

Extreme ultraviolet light source apparatus

Light source employing laser-produced plasma

Radiation source, lithographic apparatus and device manufacturing method

HIGH REPETITION-RATE, ALL LASER DIODE-PUMPED EXTREME ULTRAVIOLET/SOFT X-RAY LASER AND PUMP SYSTEM

Targets and processes for fabricating same

Method for cleaning optical element of EUV light source device and optical element cleaning device

System and methods for filtering out-of-band radiation in EUV exposure tools

Extreme ultra violet light source apparatus

Laser-driven light source

Electro-less discharge extreme ultraviolet light source

Laser beam formatting module and method for fabricating semiconductor dies using same

LPP EUV plasma source material target delivery system

Extreme ultraviolet light and X-ray source target and manufacturing method thereof

Method and Apparatus For Generating Radiation or Particles By Interaction Between a Laser Beam and a Target

Reducing fast ions in a plasma radiation source

Phase matching of high order harmonic generation using dynamic phase modulation caused by a non-collinear modulation pulse

Exposure apparatus and exposure method

Collector mirror exchanging apparatus and method for extreme ultraviolet light source apparatus

Extreme ultra violet light source apparatus

Extreme ultra violet light source apparatus

Method and system for inertial confinement fusion reactions

Extreme ultra violet light source device

Plasma-based debris mitigation for extreme ultraviolet (EUV) light source

Target supplier

X-ray computed tomography apparatus with light beam-controlled x-ray source

Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source

Collector for EUV light source

Collector for EUV light source

Collector for EUV light source

Arrangement for the suppression of unwanted spectral components in a plasma-based EUV radiation source

Systems for protecting internal components of a EUV light source from plasma-generated debris

Method for filtering particles out of a beam of radiation and filter for a lithographic apparatus

Systems and methods for achieving a required spot says for nanoscale surface analysis using soft x-rays

Systems for protecting internal components of an EUV light source from plasma-generated debris

Laser plasma EUV light source, target material, tape material, a method of producing target material, a method of providing targets, and an EUV exposure device

LPP EUV plasma source material target delivery system

LPP EUV drive laser input system

Laser x-ray source apparatus and target used therefore

Systems for protecting internal components of an EUV light source from plasma-generated debris

Lithographic apparatus, radiation system and filter system

Extreme UV radiation source device and method for eliminating debris which forms within the device

Exposure apparatus and exposure method

Method for providing an operable filter system for filtering particles out of a beam of radiation, filter system, apparatus and lithographic apparatus comprising the filter system

Extreme ultraviolet light source and extreme ultraviolet light source target

Collector for EUV light source

Systems and methods for cleaning a chamber window of an EUV light source

Inductively-driven plasma light source

Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source

Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source

Exposure apparatus and device fabrication method using the same

System and method for laser X-ray generation

Morphology and Spectroscopy of Nanoscale Regions using X-Rays Generated by Laser Produced Plasma

Radiation generating apparatus, radiation generating method, exposure apparatus, and exposure method

EUV light spectrum measuring apparatus and calculating method of EUV light intensity

Systems and methods for tape advancement in laser produced plasma equipment

Light generator and exposure apparatus

Plasma-based debris mitigation for extreme ultraviolet (EUV) light source

Apparatus for decontaminating windows of an EUV source module

Systems and methods to avoid instability conditions in a source plasma chamber

Optical characterization systems employing compact synchrotron radiation sources