233419 ⎘
X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
RADIATION SOURCE APPARATUS AND METHOD FOR OPERATING THE SAME
#2HIGH PRESSURE COUPLING ASSEMBLY
#3CLEANING APPARATUS, EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM, AND METHOD OF CLEANING EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
#4APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION
#5CALIBRATION SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE
#6EXTREME ULTRAVIOLET LIGHT GENERATING DEVICE
#7Light Source Using Pre-Ionization
#8EXTREME ULTRAVIOLET (EUV) SOURCE AND A SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
#9NEW DESIGN OF EUV VESSEL PERIMETER FLOW AUTO ADJUSTMENT
#10APPARATUS FOR SUPPLYING LIQUID TARGET MATERIAL TO A RADIATION SOURCE
#11Acoustic Xenon Droplet Generator
#12EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
#13EXTREME ULTRAVIOLET LIGHT SOURCE WITH THERMAL STABILIZATION
#14LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SOURCE
#15OPTICAL MODULE FOR EXTREME ULTRAVIOLET LIGHT SOURCE
#16LITHOGRAPHY THERMAL CONTROL
#17ENTANGLED PHOTON LIGHT SOURCE SYSTEMS AND METHODS
#18CONTROL OF DYNAMIC GAS LOCK FLOW INLETS OF AN INTERMEDIATE FOCUS CAP
#19APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION
#20EUV LITHOGRAPHY APPARATUS
#21SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM
#22SYSTEM AND METHOD FOR MONITORING AND CONTROLLING EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY PROCESSES
#23METHOD AND APPARATUS FOR MITIGATING CONTAMINATION
#24EXTREME ULTRAVIOLET (EUV) RADIATION SOURCE APPARATUS, EUV LITHOGRAPHY SYSTEM, AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION
#25LITHOGRAPHY CONTAMINATION CONTROL
#26PARTICLE IMAGE VELOCIMETRY OF EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS
#27DROPLET DETECTION METROLOGY UTILIZING METROLOGY BEAM SCATTERING
#28EUV light source with a beam positioning device
#29METHODS OF SERVICING PHOTOLITHOGRAPHIC APPARATUS
#30ILLUMINATION APPARATUS AND ILLUMINATION METHOD
#31METHODS AND SYSTEMS FOR ALIGNING MASTER OSCILLATOR POWER AMPLIFIER SYSTEMS
#32Lithography Apparatus and Method
#33APPARATUS AND METHOD FOR PRODUCING DROPLETS OF TARGET MATERIAL IN AN EUV SOURCE
#34VUV LASER-SUSTAINED PLASMA LIGHT SOURCE WITH LONG-PASS FILTERING
#35A SEED LASER OPTICAL ISOLATOR, SEED ISOLATOR MODULE, EUV RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND OPTICAL ISOLATOR OPERATING METHOD
#36HIGH-POWER COMPACT VUV LASER-SUSTAINED PLASMA LIGHT SOURCE
#37TARGET SUPPLY DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
#38METHOD AND DEVICE FOR GENERATING LASER PULSES
#39Semiconductor manufacturing apparatus and operating method thereof
#40PICOSECOND LASER-DRIVEN PLASMA X-RAY SOURCE
#41SOURCE VESSEL FOR EUV
#42EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
#43CONNECTION ASSEMBLY
#44MODULAR LASER-PRODUCED PLASMA X-RAY SYSTEM
#45EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD
#46TARGET MATERIAL TRANSFER SYSTEM COMPONENTS AND METHODS OF MAKING THE SAME
#47EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
#48SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
#49SYSTEM AND METHOD FOR VACUUM ULTRAVIOLET LAMP ASSISTED IGNITION OF OXYGEN-CONTAINING LASER SUSTAINED PLASMA SOURCES
#50EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD
#51HIGH BRIGHTNESS LPP EUV LIGHT SOURCE WITH FAST ROTATING TARGET AND METHOD OF COOLING THEREOF
#52EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE
#53APPARATUS FOR AND METHOD OF REDUCING CONTAMINATION FROM SOURCE MATERIAL IN AN EUV LIGHT SOURCE
#54Laser sustained plasma and endoscopy light source
#55Confocal Chromatic Metrology for EUV Source Condition Monitoring
#56Target delivery system
#57TARGET CONTROL IN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS USING ABERRATION OF REFLECTION IMAGE
#58GUIDING DEVICE AND ASSOCIATED SYSTEM
#59EUV EXCITATION LIGHT SOURCE AND EUV LIGHT SOURCE
#60POSITION DETECTION APPARATUS, POSITION DETECTION METHOD AND NON-TRANSITORY COMPUTER-READABLE MEDIUM
#61EUV light source with a separation device
#62EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD
#63EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD
#64EUV LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD
#65FOIL TRAP COVER DEVICE AND DEBRIS REDUCTION APPARATUS
#66EUV LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD
#67Rotating target for extreme ultraviolet source with liquid metal
#68LIGHT SOURCE APPARATUS
#69EUV light source and apparatus for lithography
#70EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD
#71Shock wave visualization for extreme ultraviolet plasma optimization
#72Device and method to remove debris from an extreme ultraviolet (EUV) lithography system
#73EUV light source device and plasma gas recycling system for high-density plasma generation
#74Device for EUV light source
#75RADIATION SOURCE MODULE AND LITHOGRAPHIC APPARATUS
#76Apparatus and method for generating extreme ultraviolet radiation
#77EUV vessel perimeter flow auto adjustment
#78APPARATUS AND METHOD FOR GENERATING X-RAYS BY LASER IRRADIATION OF SUPERFLUID HELIUM DROPLETS
#79Extreme ultraviolet light source device and protection method for receiving plate member
#80Method for performing lithography process, light source, and EUV lithography system
#81LIGHT SOURCE APPARATUS
#82Light source apparatus
#83EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD
#84EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD
#85EUV light source target metrology
#86System and method for detecting debris in a photolithography system
#87Particle image velocimetry of extreme ultraviolet lithography systems
#88Extreme ultraviolet light generation apparatus and electronic device manufacturing method
#89EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS
#90Lithography thermal control
#91EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD
#92Target supply system, extreme ultraviolet light generation apparatus, and electronic device manufacturing method
#93LIQUID TAMPED TARGETS FOR EXTREME ULTRAVIOLET LITHOGRAPHY
#94Robust fluid coupling apparatus
#95Radiation source apparatus and method for using the same
#96Lithography contamination control
#97Method and apparatus for mitigating contamination
#98SYSTEMS AND METHODS FOR LASER-TO-DROPLET ALIGNMENT
#99Extreme ultraviolet light generation apparatus and electronic device manufacturing method
#100Apparatus and method for generating extreme ultraviolet radiation
#101EUV lithography apparatus
#102Extreme ultraviolet light source device
#103Particle based X-ray source
#104Methods and systems for aligning master oscillator power amplifier systems
#105Method and system for generating droplets for EUV photolithography processes
#106Target debris collection device and extreme ultraviolet light source apparatus including the same
#107Control of dynamic gas lock flow inlets of an intermediate focus cap
#108Hybrid droplet generator for extreme ultraviolet light sources in lithographic radiation systems
#109Laser sustained plasma and endoscopy light source
#110Method for using radiation source apparatus
#111APPARATUS FOR AND METHOD OF ACCELERATING DROPLETS IN A DROPLET GENERATOR FOR AN EUV SOURCE
#112EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS
#113EUV light generation apparatus, electronic device manufacturing method, and inspection method
#114Optical isolation module
#115Lithography apparatus and method
#116Extreme ultraviolet light generation method, extreme ultraviolet light generation apparatus, and electronic device manufacturing method
#117EXTREME-ULTRAVIOLET LIGHT SOURCE DEVICE USING ELECTRON BEAMS
#118Replacement and refill method for droplet generator
#119EUV LIGHT GENERATION APPARATUS, ELECTRONIC DEVICE MANUFACTURING METHOD, AND INSPECTION METHOD
#120Contamination trap
#121EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD
#122Collector mirror and apparatus for creating extreme ultraviolet light including the same
#123Lithography thermal control
#124Method and apparatus for mitigating contamination
#125Method and apparatus for mitigating contamination
#126EUV lithography apparatus
#127EUV vessel perimeter flow auto adjustment
#128Lithography contamination control
#129Apparatus and method for generating extreme ultraviolet radiation
#130Semiconductor processing tool and methods of operation
#131Laser amplification device and extreme ultraviolet light generation apparatus
#132EUV GENERATOR, EUV LITHOGRAPHY APPARATUS INCLUDING THE SAME, AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
#133Semiconductor processing tool and methods of operation
#134Extreme ultraviolet control system
#135Vessel for a radiation source
#136CIRCULATION MECHANISM AND OPERATION APPARATUS
#137Calibration system for an extreme ultraviolet light source
#138System and method for supplying target material in an EUV light source
#139Target substance replenishment device, extreme ultraviolet light generation apparatus, and electronic device manufacturing method
#140SEMICONDUCTOR SYSTEM INSPECTION TOOL AND METHODS OF OPERATION
#141Droplet collecting system and method of using the same
#142Method and apparatus for efficient high harmonic generation
#143EUV radiation generation methods and systems
#144EUV RADIATION SOURCE APPARATUS FOR LITHOGRAPHY
#145Droplet generator nozzle
#146Shock wave visualization for extreme ultraviolet plasma optimization
#147Radiation source apparatus and method for using the same
#148OPTICAL MODULATOR
#149Device and method to remove debris from an extreme ultraviolet (EUV) lithography system
#150Droplet generator and method of servicing extreme ultraviolet imaging tool
#151Method and system for generating droplets for EUV photolithography processes
#152EUV LIGHT SOURCE AND APPARATUS FOR LITHOGRAPHY
#153Laser system for source material conditioning in an EUV light source
#154Radiation source apparatus and method for using the same
#155System and method for detecting debris in a photolithography system
#156NOZZLE APPARATUS
#157Foil trap and light source apparatus including the same
#158Target control in extreme ultraviolet lithography systems using aberration of reflection image
#159Control of dynamic gas lock flow inlets of an intermediate focus cap
#160Light source, EUV lithography system, and method for performing circuit layout patterning process
#161Droplet generator and method of servicing a photolithographic tool
#162Method for controlling extreme ultraviolet light
#163Modular laser-produced plasma x-ray system
#164Extreme ultraviolet light generation system and electronic device manufacturing method
#165Guiding device
#166System and method for monitoring and controlling extreme ultraviolet photolithography processes
#167Extreme ultraviolet lithography system with heated tin vane bucket having a heated cover
#168Laser and drum control for continuous generation of broadband light
#169Laser focussing module
#170RADIATION SYSTEM
#171Light emitting unit and light source device
#172Radiation source for lithography process
#173Contamination trap
#174LASER SYSTEM FOR SOURCE MATERIAL CONDITIONING IN AN EUV LIGHT SOURCE
#175EUV light source and apparatus for lithography
#176System and method for pumping laser sustained plasma with an illumination source having modified pupil power distribution
#177Droplet accelerating assembly and extreme ultra-violet lithography apparatus including the same
#178Apparatus for generating extreme ultraviolet (EUV), method of manufacturing the same, and EUV system
#179Target supply device, extreme ultraviolet light generation apparatus, and electronic device manufacturing method
#180Target material control in an EUV light source
#181System for monitoring a plasma
#182Extreme ultraviolet light generation system and electronic device manufacturing method
#183Tin trap device, extreme ultraviolet light generation apparatus, and electronic device manufacturing method
#184High-brightness laser produced plasma source and method of generation and collection radiation
#185Apparatus and method for generating extreme ultraviolet radiation
#186SYSTEMS AND METHODS FOR COMPACT LASER WAKEFIELD ACCELERATED ELECTRONS AND X-RAYS
#187Target debris collection device and extreme ultraviolet light source apparatus including the same
#188Extreme ultraviolet light generation system and electronic device manufacturing method
#189Extreme ultraviolet light generation apparatus and electronic device manufacturing method
#190Extreme ultraviolet light source systems
#191Plasma field faraday cage system
#192Determining moving properties of a target in an extreme ultraviolet light source
#193Extreme ultraviolet light generation apparatus and electronic device manufacturing method
#194Extreme ultraviolet light generation apparatus and electronic device manufacturing method
#195Extreme ultraviolet light source system
#196Method of exposure using extreme ultraviolet and method of manufacturing a semiconductor device using the same
#197Light source and extreme ultraviolet light source system using the same
#198Plasma field faraday cage system
#199Target delivery system
#200Broadband laser-pumped plasma light source
#201Extreme ultraviolet light generation system and electronic device manufacturing method
#202Soft X-ray light source
#203Target supply device, extreme ultraviolet light generation apparatus, and electronic device manufacturing method
#204Target control in extreme ultraviolet lithography systems using aberration of reflection image
#205Extreme ultraviolet light generation system and electronic device manufacturing method
#206Target supply device, target supply method, and electronic device manufacturing method
#207Extreme ultraviolet light concentrating mirror and electronic device manufacturing method
#208Tunable source of intense, narrowband, fully coherent, soft X-rays
#209Semiconductor manufacturing apparatus and operating method thereof
#210Method and apparatus for controlling extreme ultraviolet light
#211Tin trap device, extreme ultraviolet light generation apparatus, and electronic device manufacturing method
#212Target supply device, target supply method, and electronic device manufacturing method
#213Extreme ultraviolet light generation apparatus, target control method, and electronic device manufacturing method
#214Nanopatterned electron beams for temporal coherence and deterministic phase control of x-ray free-electron lasers
#215Electron diffraction intensity from single crystal silicon in a photoinjector
#216Light generator including debris shielding assembly, photolithographic apparatus including the light generator
#217EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD
#218EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME
#219Apparatus for and method of reducing contamination from source material in an EUV light source
#220Thermal controlling method in lithography system
#221Self-aligning vacuum feed-through for liquid nitrogen
#222Extreme ultraviolet light generation apparatus, and electronic device manufacturing method
#223Replacement method for droplet generator
#224Extreme ultraviolet light generation apparatus, extreme ultraviolet light generation system, and electronic device manufacturing method
#225Droplet generator and method of servicing extreme ultraviolet radiation source apparatus
#226Particle image velocimetry of extreme ultraviolet lithography systems
#227Chamber device, extreme ultraviolet light generation apparatus, and electronic device manufacturing method
#228Laser plasma optical device and method for generating ultra-short ultra-intense mid-infrared pulses
#229Apparatus and method for generating extreme ultraviolet radiation
#230Laser system for target metrology and alteration in an EUV light source
#231Apparatus for producing a filamented auxiliary discharge for an apparatus for producing x-radiation and particle radiation and also for a fusion reactor with the apparatus for producing x-radiation and particle radiation and method for producing x-radiation and particle radiation
#232Extreme ultraviolet lithography system with heated tin vane bucket having a heated cover
#233Light source for lithography exposure process
#234Residual gain monitoring and reduction for EUV drive laser
#235Extreme ultraviolet light generation apparatus and electronic device manufacturing method
#236Extreme ultraviolet control system
#237Method and system of laser-driven intense x-ray photons imaging
#238Device and method for measuring the beam angle of a light beam guided by a beam guiding optical unit
#239Laser beam delivery apparatus for extreme ultra violet light source
#240Extreme ultraviolet light condensation mirror, extreme ultraviolet light condensation mirror manufacturing method, and electronic device manufacturing method
#241Metrology system and method for measuring an excitation laser beam in an EUV plasma source
#242Radiation source for lithography process
#243EUV radiation modification methods and systems
#244EUV light concentrating apparatus and lithography apparatus including the same
#245DROPLET GENERATOR AND EXTREME ULTRAVIOLET EXPOSURE DEVICE INCLUDING THE SAME
#246Beam delivery system, focal length selecting method, and electronic device manufacturing method
#247Guiding device and associated system
#248Laser produced plasma light source having a target material coated on a cylindrically-symmetric element
#249Laser produced plasma illuminator with low atomic number cryogenic target
#250Laser produced plasma illuminator with liquid sheet jet target
#251Extreme ultraviolet light condensation mirror, extreme ultraviolet light generation apparatus, and electronic device manufacturing method
#252System and method for vacuum ultraviolet lamp assisted ignition of oxygen-containing laser sustained plasma sources
#253Extreme ultraviolet light condensation mirror, extreme ultraviolet light generation apparatus, and electronic device manufacturing method
#254Droplet generation for a laser produced plasma light source
#255Optical apparatus
#256Extreme ultraviolet generation apparatus
#257Short-wavelength radiation source with multisectional collector module and method of collecting radiation
#258Stop for arrangement in a constriction of an EUV illumination beam
#259Extreme ultraviolet light generation device and electronic device manufacturing method
#260Method of operating semiconductor apparatus and semiconductor apparatus
#261Extreme ultraviolet light generating apparatus and method of manufacturing electronic device
#262Extreme ultraviolet light generating apparatus, extreme ultraviolet light generating method, and electronic device manufacturing method
#263System and method for extreme ultraviolet source control
#264Sensor system
#265Focusing device and EUV radiation generating device having same
#266Refill and replacement method for droplet generator
#267Target debris collection device and extreme ultraviolet light source apparatus including the same
#268Light source, EUV lithography system, and method for generating EUV radiation
#269Target image capturing device and extreme ultraviolet light generation apparatus
#270Reflective optical element, beam guiding device and EUV-beam generating device
#271Droplet generator, EUV lithography device and method of generating a series of droplets using a droplet generator
#272Extreme ultraviolet light generation apparatus and electronic device manufacturing method
#273EUV chamber apparatus, extreme ultraviolet light generation system, and electronic device manufacturing method
#274Extreme ultraviolet light generation system and electronic device manufacturing method
#275High efficiency laser-sustained plasma light source with collection of broadband radiation
#276Lithography system and method thereof
#277Extreme ultraviolet photolithography method
#278Method for exposing wafer
#279Target supply device, extreme ultraviolet light generation apparatus, and electronic device manufacturing method
#280Lithographic apparatus and method
#281Extreme ultraviolet exposure apparatus and method, and method of manufacturing semiconductor device by using the exposure method
#282Extreme ultraviolet light generation system, laser beam size controlling method, and electronic device manufacturing method
#283Extreme ultraviolet light generation apparatus and electronic device manufacturing method
#284Method for protecting an X-ray source and an X-ray source
#285Target supply device, extreme ultraviolet light generating apparatus, and electronic device manufacturing method
#286Extreme ultraviolet light generating system and electronic device manufacturing method
#287Target supply device, extreme ultraviolet light generation apparatus, and electronic device manufacturing method
#288Droplet generator and method of servicing extreme ultraviolet radiation source apparatus
#289System for monitoring a plasma
#290Laser beam monitoring system
#291Target supply device, extreme ultraviolet light generating apparatus, and electronic device manufacturing method
#292Laser system
#293Laser-driven microplasma XUV source
#294Method and apparatus for removing debris from collector
#295Radiation source apparatus
#296Extreme ultraviolet radiation source and cleaning method thereof
#297Extreme ultraviolet chamber apparatus, extreme ultraviolet light generation system, and method for manufacturing electronic device
#298Extreme ultraviolet light generation apparatus and electronic device manufacturing method
#299Optical isolation module
#300Radiation source