240267 ⎘
Active solid-state devices, e.g. transistors, solid-state diodes MOSFET type gate sidewall insulating spacer
Method of manufacturing a semiconductor device with wider sidewall spacer for a high voltage MISFET
#2Semiconductor device and fabrication method thereof
#3Electronic device with asymmetric gate strain
#4Method of manufacturing a semiconductor device with wider sidewall spacer for a high voltage MISFET
#5Semiconductor device and fabrication method thereof
#6Method of manufacturing a semiconductor device that includes a MISFET
#7Integrated circuits with aligned (100) NMOS and (110) PMOS finFET sidewall channels
#8Semiconductor device and fabrication method thereof
#9Electronic device with asymmetric gate strain
#10JFET devices with increased barrier height and methods of making same
#11Semiconductor devices including a resistor structure
#12Method of manufacturing a semiconductor device that includes a misfet
#13Integrated circuits with aligned (100) NMOS and (110) PMOS FinFET sidewall channels
#14Semiconductor device and fabrication method thereof
#15Integrated circuits with aligned (100) NMOS and (110) PMOS FinFET sidewall channels
#16JFET devices with increased barrier height and methods of making the same
#17Electronic device with asymmetric gate strain
#18Semiconductor device and manufacturing method of the same
#19SEMICONDUCTOR INTEGRATED CIRCUIT AND METHOD OF FABRICATING SAME
#20Method for forming integrated circuits with aligned (100) NMOS and (110) PMOS FinFET sidewall channels
#21Contact implement structure for high density design
#22Bi-layer nFET embedded stressor element and integration to enhance drive current
#23SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME
#24Semiconductor device and fabrication method thereof
#25Asymmetric semiconductor devices and method of fabricating
#26FinFET field effect transistor insulated from the substrate
#27Method of forming a structure over a semiconductor substrate
#28MOSFET including epitaxial halo region
#29Extended drain transistor and method of manufacturing the same
#30Method of manufacturing transistor
#31Carbon Nanotube Transistor Structure
#32Electronic device with asymmetric gate strain
#33Low-k isolation spacers for conductive regions
#34Air gap spacer formation
#35Semiconductor transistors having high-K gate dielectric layers, metal gate electrode regions, and low fringing capacitances
#36Semiconductor device and method for fabricating the same
#37Heterostructure Nanotube Devices
#38Semiconductor device and method for forming the same
#39JFET devices with increased barrier height and methods of making same
#40Semiconductor device and manufacturing method of the same
#41Short channel vertical FETs
#42Non-volatile semiconductor memory device with contact plug electrically conductive in response to light
#43Self-aligned impact-ionization field effect transistor
#44Gate structure
#45Slim Spacer Implementation to Improve Drive Current
#46Semiconductor transistors having high-K gate dielectric layers, metal gate electrode regions, and low fringing capacitances
#47Semiconductor device having MOSFET with offset-spacer, and manufacturing method thereof
#48Semiconductor device and method for forming the same
#49Method of reducing embedded SiGe loss in semiconductor device manufacturing
#50Semiconductor integrated circuit and method of fabricating same
#51Semiconductor device and fabrication method thereof
#52Transistor structure and method for making same
#53Semiconductor device having deep trench charge compensation regions and method
#54Self-assembled sidewall spacer
#55Transistors with high-k dielectric spacer liner to mitigate lateral oxide encroachement
#56Apparatus and method for selectively recessing spacers on multi-gate devices
#57Power semiconductor device having improved performance and method
#58Finfet field effect transistor insulated from the substrate
#59Semiconductor device with discontinuous CESL structure
#60Method of making (100) NMOS and (110) PMOS sidewall surface on the same fin orientation for multiple gate MOSFET with DSB substrate
#61Carbon nanotube transistor fabrication
#62Method of forming a structure over a semiconductor substrate
#63Semiconductor memory device and method of manufacturing the same
#64Methods of fabricating semiconductor devices and structures thereof
#65Manufacturing method of flash memory device
#66Carbon nanotube transistor process with transferred carbon nanotubes
#67Low-temperature electrically activated gate electrode and method of fabricating same
#68Semiconductor device including liner insulating film
#69Stack SiGe for short channel improvement
#70Slim spacer implementation to improve drive current
#71Isolation spacer for thin SOI devices
#72Isolation spacer for thin SOI devices
#73Apparatus and method for selectively recessing spacers on multi-gate devices
#74Nonvolatile semiconductor memory device and method of fabricating the same
#75Structure and method for making high density MOSFET circuits with different height contact lines
#76Low-k isolation spacers for conductive regions
#77High performance CMOS device structures and method of manufacture
#78N-channel MOSFETs comprising dual stressors, and methods for forming the same
#79Semiconductor device including a selectively formed ETCH stopping layer and methods thereof
#80Semiconductor devices having gate structures and contact pads that are lower than the gate structures
#81Gate stacks
#82STRUCTURE AND METHOD TO INDUCE STRAIN IN A SEMICONDUCTOR DEVICE CHANNEL WITH STRESSED FILM UNDER THE GATE
#83Hosting structure of nanometric elements and corresponding manufacturing method
#84Structure and method for making high density mosfet circuits with different height contact lines
#85CMOS device with asymmetric gate strain
#86Semiconductor device and method of forming the same
#87Methods of fabricating memory devices with memory cell transistors having gate sidewall spacers with different dielectric properties
#88Semiconductor memory device
#89Semiconductor memory device
#90Methods of fabricating semiconductor devices and structures thereof
#91Semiconductor device including active matrix circuit
#92Semiconductor device and method of manufacturing the same
#93Semiconductor device and method for fabricating the same
#94Semiconductor device having deep trench charge compensation regions and method
#95Fringing field induced localized charge trapping memory
#96Semiconductor integrated circuit and method of fabricating same
#97High performance MOS device with graded silicide
#98Nonvolatile semiconductor memory with transistor whose gate electrode has bird's beak
#99Semiconductor device and method for forming the same
#100Nanotube transistor and rectifying devices
#101Closed loop CESL high performance CMOS device
#102Electrically erasable programmable read only memory (EEPROM) cell and method for making the same
#103Integrated circuitry
#104Semiconductor device and method of manufacturing the same
#105Semiconductor device including air gap between semiconductor substrate and L-shaped spacer and method of fabricating the same
#106Power semiconductor device having improved performance and method
#107Method of manufacturing a semiconductor device and semiconductor device
#108MOS TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
#109Method for fabricating semiconductor device
#110Methods of fabricating scalable two transistor memory devices
#111Structure and method to induce strain in a semiconductor device channel with stressed film under the gate
#112Semiconductor device and method for fabricating the same
#113Semiconductor device having MOSFET with offset-spacer, and manufacturing method thereof
#114Tensile strained substrate
#115Semiconductor device and fabrication method thereof
#116Semiconductor memory device with cell transistors having electrically floating channel bodies to store data
#117Isolation spacer for thin SOI devices
#118Method of forming shallow doped junctions having a variable profile gradation of dopants
#119Gate stacks
#120FinFET with low gate capacitance and low extrinsic resistance
#121Temperature stable metal nitride gate electrode
#122Semiconductor device with gate spacer of positive slope and fabrication method thereof
#123Anti-reflective coating doped with carbon for use in integrated circuit technology and method of formation
#124Methods of forming transistors
#125Mask ROM devices of semiconductor devices and method of forming the same
#126Temperature stable metal nitride gate electrode
#127Stepped tip junction with spacer layer
#128Offset spacer formation for strained channel CMOS transistor
#129Method of forming a raised source/drain and a semiconductor device employing the same
#130Semiconductor device having a side wall insulating film and a manufacturing method thereof
#131Semiconductor memory device and manufacturing method therefor
#132Semiconductor memory device
#133Semiconductor device having shared contact and fabrication method thereof
#134Semiconductor device having MOSFET with offset-spacer, and manufacturing method thereof
#135Process for integration of a high dielectric constant gate insulator layer in a CMOS device
#136Semiconductor device with an L-shaped/reversed L-shaped gate side-wall insulating film and method of manufacturing same
#137Semiconductor device and method of manufacturing the same
#138Magnetoresistive memory device and method for fabricating the same
#139Transistor sidewall spacer stress modulation
#140Temporary self-aligned stop layer is applied on silicon sidewall
#141Semiconductor fabrication process with asymmetrical conductive spacers
#142Method of forming a conductive line
#143Fully silicided NMOS device for electrostatic discharge protection
#144Semiconductor device and method for fabricating the same
#145Method of manufacturing semiconductor device
#146SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
#147Memory devices with memory cell transistors having gate sidewell spacers with different dielectric properties
#148Semiconductor device including air gap between semiconductor substrate and L-shaped spacer and method of fabricating the same
#149Method for manufacturing semiconductor device having metal silicide
#150Semiconductor integrated circuitry and method for manufacturing the circuitry
#151Semiconductor component and method of manufacture