240281 ⎘
Active solid-state devices, e.g. transistors, solid-state diodes Polysilicon containing oxygen, nitrogen, or carbon, e.g. sipos
Coatings for relatively movable surfaces
#2Semiconductor memory device and method for manufacturing the same
#3Coatings for relatively movable surfaces
#4Dynamic access point based positioning
#5Coatings for relatively movable surfaces
#6High-k dielectric film, method of forming the same and related semiconductor device
#7Method of selectively depositing materials on a substrate using a supercritical fluid
#8INCREASING AN ELECTRICAL RESISTANCE OF A RESISTOR BY NITRIDIZATION
#9INCREASING AN ELECTRICAL RESISTANCE OF A RESISTOR BY NITRIDIZATION
#10High-k dielectric film, method of forming the same and related semiconductor device
#11Semiconductor device and method of manufacturing the same
#12Increasing an electrical resistance of a resistor by oxidation
#13Complementary metal-oxide-semiconductor transistor including multiple gate conductive layers and method of manufacturing the same
#14Method of controlling grain size in a polysilicon layer and in semiconductor devices having polysilicon structure
#15Fingerprint detection device and method of its manufacture, and apparatus for forming a protective film
#16Increasing an electrical resistance of a resistor by nitridization
#17Method of selectively depositing materials on a substrate using a supercritical fluid
#18Method of eliminating photoresist poisoning in damascene applications
#19High-k dielectric film, method of forming the same and related semiconductor device
#20Fingerprint detection device and method of its manufacture, and apparatus for forming a protective film
#21Semiconductor device and method of manufacturing the same