241714 ⎘
Radiation imagery chemistry: process, composition, or product thereof; Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing; Radiation sensitive composition or product or process of making Binder containing
Resist composition
#302Pattern forming method
#303Multilayer imageable element containing sulfonamido resin
#304Positive photosensitive composition and method of forming pattern using the same
#305Multilayer imageable element with improved chemical resistance
#306Positive resist composition and pattern forming method using the same
#307Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the same
#308Optical waveguides and methods thereof
#309Positive photosensitive composition
#310NANOCOMPOSITE PHOTOSENSITIVE COMPOSITION AND USE THEREOF
#311Positive resist composition and pattern making method using the same
#312Photosensitive composition comprising triazine-based photoactive compound containing oxime ester
#313Imageable members with improved chemical resistance
#314Photocurable and thermosetting resin composition, dry film using the same, and cured product thereof
#315IMAGE FORMING MATERIAL
#316Photosensitive resin composition for black matrix
#317CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTORESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
#318Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method
#319Photosensitive resin composition, photosensitive layer using the same and photosensitive resin printing original plate
#320Antireflective hardmask and uses thereof
#321Positive resist composition and pattern formation method using the positive resist composition
#322Resist composition and patterning process
#323Thick film photoresist composition and method of forming resist pattern
#324Photosensitive element, resist pattern formation method and printed wiring board production method
#325Sulfonamide compound, polymer compound, resist material and pattern formation method
#326Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
#327Photosensitive film
#328NIR/IR curable coatings for light directed imaging
#329Compositions and processes for photolithography
#330Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board
#331Resist composition for electron beam or EUV
#332Image-forming method employing a composition
#333Positive resist composition for immersion exposure and pattern forming method using the same
#334Positive resist composition and pattern-forming method using the same
#335Non-outgassing low activation energy resist
#336Polymeric material, containing a latent acid
#337Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions
#338Photoresist composition and method of manufacturing a thin-film transistor substrate using the same
#339Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same
#340Positive photoresist composition and method for forming resist pattern
#341Chemically amplified positive resist composition and patterning process
#342Radiation sensitive material and method for forming pattern
#343Color forming composition containing a plurality of antenna dyes
#344Resist protective coating material and patterning process
#345Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process
#346Photoresist monomer polymer thereof and photoresist composition including the same
#347Composition for forming anti-reflective coating for use in lithography
#348Chemically amplified resist material and pattern formation method using the same
#349Polymer for immersion lithography and photoresist composition
#350On-press developable negative-working imageable elements
#351Polymer, resist composition and patterning process
#352Resist material and pattern formation method using the same
#353Polymerizable composition and lithographic printing plate precursor
#354Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer
#355Positive resist composition and method for forming resist pattern
#356Novel ester compounds, polymers, resist compositions and patterning process
#357Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
#358Nanocomposite photosensitive composition and use thereof
#359Nanocomposite photoresist composition for imaging thick films
#360Heat-sensitive positive working lithographic printing plate precursor
#361Photocatalyst composition and photocatalyst containing layer
#362Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use
#363Positive resist composition and pattern forming method using the same
#364Photostorage solid drawing medium
#365Positive resist composition and pattern forming method using the resist composition
#366Positive photoresist composition and method of forming resist pattern
#367Underlayer coating forming composition for lithography containing compound having protected carboxyl group
#368Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer
#369Dyed photoresists and methods and articles of manufacture comprising same
#370Infrared dye compositions
#371Resist composition, compound for use in the resist composition and pattern forming method using the resist composition
#372Low blur molecular resist
#373Chemically amplified positive resist composition and patterning process
#374Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same
#375Norbornene polymer for photoresist and photoresist composition comprising the same
#376Polymer, resist composition and patterning process
#377Photoresist compositions
#378Organic anti-reflective coating composition and method for forming photoresist patterns using the same
#379Positive resist composition for immersion exposure and pattern-forming method using the same
#380Photoresist compositions comprising resin blends
#381Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern by using the photoresist composition
#382Method of forming resist pattern, positive resist composition, and layered product
#383Resist composition, multilayer body, and method for forming resist pattern
#384Resist composition for liquid immersion exposure process and method of forming resist pattern therewith
#385Resist composition and patterning process using the same
#386Resist exposure system and method of forming a pattern on a resist
#387Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal
#388Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition
#389Positive type resist composition and resist pattern formation method using same
#390Positive type resist composition and resist pattern formation method using same
#391Positive type resist composition and resist pattern formation method using same
#392Positive type resist composition and resist pattern formation method using same
#393Positive type resist composition and resist pattern formation method using same
#394Positive working thermal plates
#395Low-temperature curable photosensitive compositions
#396Low-temperature curable photosensitive compositions
#397Photoresist composition for deep UV and process thereof
#398Nanocomposite negative resists for next generation lithographies
#399Positive-tone radiation-sensitive resin composition
#400Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for producing the same
#401Multilayer imageable element
#402Silicon-containing resist composition and patterning process
#403Positive type photosensitive paste composition for PDP electrode, PDP electrode prepared therefrom, and PDP comprising the PDP electrode
#404Photosensitive composition
#405Photosensitive lithographic printing plate
#406Planographic printing plate precursor
#407Antireflection film, polarizing plate and display device
#408Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings
#409Silicon-containing compositions for spin-on arc/hardmask materials
#410Aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape
#411Photosensitive film
#412Positive resist composition and pattern forming method utilizing the same
#413Photoresist polymer and photoresist composition containing the same
#414Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the same
#415Positive resist composition and resist pattern formation method
#416Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
#417Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films
#418Photosensitive composition and image recording method using the same
#419Chemical amplified positive photo resist composition and method for forming resist pattern
#420Photosensitive composition and method for forming pattern using same
#421Energy harvesting molecules and photoresist technology
#422Photosensitive composition and method for forming pattern using the same
#423Novel fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same
#424Photoresist composition and method of forming a pattern using the same
#425Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography
#426Chemically amplified positive photosensitive resin composition
#427Polymers, resist compositions and patterning process
#428Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide
#429Photoresist composition for organic layer of liquid crystal display, spin-less coating method thereof, fabrication method of organic layer pattern and liquid crystal display fabricated using the same
#430Resist material and pattern formation method
#431Photosensitive composition and pattern-forming method using the photosensitive composition
#432Radiation sensitive resin composition, cathode separator and EL display device
#433Chemically amplified positive resist composition, a haloester derivative and a process for producing the same
#434Dissolution inhibitors in photoresist compositions for microlithography
#435Negative resist composition comprising hydroxy-substituted base polymer and Si-containing crosslinker having epoxy ring and a method for patterning semiconductor devices using the same
#436Positive-tone radiation-sensitive resin composition
#437Chemically amplified positive photo resist composition and method for forming resist pattern
#438Photosensitive resin composition and photosensitive dry film containing the same
#439Photosensitive composition, compound used in the same, and patterning method using the same
#440Chemically amplified positive resist composition and patterning process
#441Photosensitive composition and pattern forming method using the same
#442Negative photoresist and method of using thereof
#443Positive resist composition
#444Resist compounds including acid labile groups having hydrophilic groups attached thereto
#445Radiation-sensitive resin composition
#446Chemically amplified positive resist composition
#447Cyanoadamantyl compounds and polymers
#448Cyanoadamantyl compounds and polymers and photoresists comprising same
#449Negative photoresist and method of using thereof
#450Positive resist composition and pattern forming method using the same
#451Polymer compound, resist material and pattern formation method
#452Chemically amplified resist composition and method for forming patterned film using same
#453Negative photoresist composition involving non-crosslinking chemistry
#454Printing plates using binder resins having polyethylene oxide segments
#455Polymers based on cinnamic acid as a bottom antireflective coating for 157 NM photolithography
#456Photoresist suitable for use in 157 nm photolithography and including a polymer based on fluorinated norbornene derivatives
#457Composition for forming wiring protective film and uses thereof
#458Negative photoresist composition including non-crosslinking chemistry
#459Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern and method for producing printed wiring board
#460Microcapsule composition
#461Photosensitive resin composition for black matrix
#462Radiation-sensitive resin composition
#463Norbornene-type monomers and polymers containing pendent lactone or sultone groups
#464Planographic printing plate material and preparing process of planographic printing plate
#465Norbornene-type monomers and polymers containing pendent lactone or sultone groups
#466Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use
#467Photoresist composition
#468Image recording material
#469Light absorbent agent polymer for organic anti-reflective coating and preparation method and organic anti-reflective coating composition comprising the same
#470Infrared absorbing N-alkylsulfate cyanine compounds
#471Photoresist composition for deep UV and process thereof
#472Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition
#473Positive resist composition and base material carrying layer of the positive resist composition
#474Method for patterning a low activation energy photoresist
#475Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device
#476Molecular photoresists containing nonpolymeric silsesquioxanes
#477Enabling chain scission of branched photoresist
#478Photoresist composition for EUV and method for forming photoresist pattern using the same
#479Positive type resist composition and resist pattern formation method using same
#480Photosensitive composition and pattern forming method using the same
#481Radiation-sensitive resin composition
#482Polymers, resist compositions and patterning process
#483Photosensitive conductive composition and plasma display panel formed by using the same
#484Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same
#485Silicon-containing compositions for spin-on ARC/hardmask materials
#486Negative-working photoresist composition
#487Photosensitive composition and lithographic printing plate precursor using the same
#488Positive resist composition and pattern formation method using the same
#489Positive resist composition and pattern-forming method using the same
#490Photoresists and processes for microlithography
#491Sulfonamide compound, polymer compound, resist material and pattern formation method
#492Photosensitive composition
#493Enabling chain scission of branched photoresist
#494Polybutadiene (meth)acrylate composition and method
#495Resist resin
#496Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same
#497Positive-working chemical-amplification photoresist composition
#498Photosensitive bilayer composition
#499Positive resist composition and method of forming resist pattern
#500MONOMERS CONTAINING AN OXEPAN-2-ONE GROUP, PHOTORESIST COMPOSITIONS COMPRISING POLYMERS PREPARED FROM THE MONOMERS, METHODS FOR PREPARING THE COMPOSITIONS, AND METHODS FOR FORMING PHOTORESIST PATTERNS USING THE COMPOSITIONS
#501Antireflective hardmask and uses thereof
#502Resist composition
#503Resist resin
#504Photoresists processable under biocompatible conditions for multi-biomolecule patterning
#505Process for producing a semiconductor device
#506Pattern forming process
#507Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device
#508Photoimageable composition
#509Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties
#510Resist exposure system and method of forming a pattern on a resist
#511Positive photoresist composition and patterning process using the same
#512Positive photosensitive composition and method of forming resist pattern
#513Organic anti-reflective coating composition and pattern forming method using the same
#514Resist composition
#515Photoresist polymeric compound and photoresist resin composition
#516Resist composition comprising photosensitive polymer having lactone in its backbone
#517Basic compound, resist composition and patterning process
#518Intermediate layer composition for multilayer resist process, pattern-forming process using the same, and laminate
#519Imageable element with solvent-resistant polymeric binder