241714 ⎘
Radiation imagery chemistry: process, composition, or product thereof; Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing; Radiation sensitive composition or product or process of making Binder containing
Sub-classes:Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
#2Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
#3Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
#4Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
#5Radiation-sensitive composition
#6Photoacid generators and lithographic resists comprising the same
#7Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method
#8Photosensitive resin composition for color filter and color filter using the same
#9Composition for forming resist underlayer film for EUV lithography
#10Aqueous base-developable negative-tone films based on functionalized norbornene polymers
#11Film, method for manufacturing the film and masking method using the film
#12Resist composition and method of forming resist pattern
#13Positive resist composition and patterning process
#14Compound for resist and radiation-sensitive composition specification
#15Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device
#16Photoacid Generators for the Synthesis of Oligo-DNA in a Polymer Matrix
#17Patterning process and photoresist with a photodegradable base
#18Thermally imageable dielectric layers, thermal transfer donors and receivers
#19Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same
#20Radiation-sensitive composition
#21RADIATION-SENSITIVE RESIN COMPOSITION
#22Pattern forming method, chemical amplification resist composition and resist film
#23Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method
#24Optical waveguides and methods thereof
#25Positive photosensitive composition and method of forming pattern using the same
#26COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY
#27Positive resist composition and pattern forming method
#28Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
#29Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition
#30Photoactive compound and photosensitive resin composition containing the same
#31Positive resist composition and pattern-forming method
#32Photoacid generators for the synthesis of oligo-DNA in a polymer matrix
#33Polymers and photoresist compositions
#34Polymer, chemically amplified positive resist composition and pattern forming process
#35Compound for resist and radiation-sensitive composition
#36Photoresist materials and photolithography processes
#37Photosensitive self-assembled monolayer for selective placement of hydrophilic structures
#38Photoresist materials and photolithography processes
#39Photoacid generators and lithographic resists comprising the same
#40Thermoplastic material comprising polychromic substances
#41Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern
#42Aqueous base-developable negative-tone films based on functionalized norbornene polymers
#43Patterning process and chemical amplified photoresist with a photodegradable base
#44Resist composition for negative tone development and pattern forming method using the same
#45Functionalized carbosilane polymers and photoresist compositions containing the same
#46Calixarene blended molecular glass photoresists and processes of use
#47Salt and photoresist composition containing the same
#48Photoacid generator compounds and compositions
#49Electrode and method for manufacturing the same
#50Photoacid generators for the synthesis of oligo-DNA in a polymer matrix
#51Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method
#52COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY AND PRODUCING METHOD THEREOF, AND COMPOSITION
#53Resist pattern-forming method and resist pattern miniaturizing resin composition
#54Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for producing the same
#55Photosensitive composition and pattern-forming method using the photosensitive composition
#56Salt and photoresist composition containing the same
#57Positive resist composition and method of forming resist pattern
#58Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board
#59Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board
#60FLUORINATED POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND PARTITION WALLS
#61Positive photosensitive composition and method of forming resist pattern
#62Polymer and positive-tone radiation-sensitive resin composition
#63Thermally imageable dielectric layers, thermal transfer donors and receivers
#64Positive resist composition and patterning process
#65Production Of Chain Agglomerations Of Nano-Scale Metal Particles
#66Production Of Chain Agglomerations Of Nano-Scale Metal Particles
#67Positive photosensitive composition, pattern forming method using the composition and resin for use in the composition
#68UV curable photochromic composition and products formed by using the same
#69Positive resist composition and pattern forming method using the same
#70Positive resist composition for immersion exposure and method of forming resist pattern
#71Method for pattern formation and resin composition for use in the method
#72Resist composition for negative tone development and pattern forming method using the same
#73Photosensitive paste and process for production of pattern using the same
#74Photobase generator and photocurable resin composition
#75Composition for resist underlayer film and process for producing same
#76Photosensitive self-assembled monolayer for selective placement of hydrophilic structures
#77Positive resist composition and method of forming resist pattern
#78Resist composition
#79Positive photosensitive composition
#80Polymer and resist composition comprising the same
#81Resist composition, method of forming resist pattern, novel compound, and acid generator
#82Positive resist composition and pattern forming method
#83Compound, acid generator, resist composition, and method of forming resist pattern
#84Electromagnetic radiation or thermally sensitive composition
#85Polymeric material, containing a latent acid
#86Method of forming fine patterns of a semiconductor device
#87Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective film
#88Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition
#89Radiation-sensitive resin composition
#90Optical waveguides and methods thereof
#91Low outgassing photoresist compositions
#92Optical waveguides and methods thereof
#93Radiation-sensitive composition
#94SPIN BOWL COMPATIBLE POLYAMIC ACIDS/IMIDES AS WET DEVELOPABLE POLYMER BINDERS FOR ANTI-REFLECTIVE COATINGS
#95Radiation-sensitive resin composition
#96Method for formation of miniaturized pattern and resist substrate treatment solution for use in the method
#97ON-PRESS DEVELOPABLE NEGATIVE-WORKING IMAGEABLE ELEMENTS
#98Resist sensitizer
#99Photosensitive self-assembled monolayer for selective placement of hydrophilic structures
#100Photosensitive composition, method for forming pattern, and method for manufacturing semiconductor device
#101Positive resist composition, method of forming resist pattern, polymeric compound, and compound
#102Method for manufacturing semiconductor device
#103Polymerizable compound, polymer, positive resist composition, and patterning process using the same
#104Photopatternable dielectric materials for BEOL applications and methods for use
#105Patterning process
#106Resist protective coating composition and patterning process
#107Resist composition and patterning process
#108Carboxyl-containing lactone compound, polymer, resist composition, and patterning process
#109Photoacid generator, resist composition, and patterning process
#110Coating materials consisting of low- or medium-molecular organic compounds
#111Positive resist composition and method of forming resist pattern
#112Polymer, polymer preparation method, resist composition and patterning process
#113Resin for hydrophobitizing resist surface, method for manufacturing the resin, and positive resist composition containing the resin
#114PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS
#115Photopatternable dielectric materials for BEOL applications and methods for use
#116Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same
#117Chemically amplified resist composition and chemically amplified resist composition for immersion lithography
#118Dyed photoresists and methods and articles of manufacture comprising same
#119Polyhydric compound and chemically amplified resist composition containing the same
#120Coating compositions comprising a latent activator for marking substrates
#121Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films
#122Photoresists and methods for optical proximity correction
#123Positive resist composition and patterning process using the same
#124Silsesquioxane resin systems with base additives bearing electron-attracting functionalities
#125Positive resist composition and patterning process using the same
#126Method for manufacturing a semiconductor device
#127Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same
#128Thermoplastic material comprising polychromic substances
#129Coating composition for marking substrates
#130Laser coloration of coated substrates
#131Hydrogenated ring-opening metathesis polymer, resist composition and patterning process
#132Protective overcoats for thermally developable materials
#133Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
#134Methods of forming a pattern of a semiconductor device
#135Compound, acid generator, resist composition and method of forming resist pattern
#136Positive resist composition and method of forming resist pattern
#137Polymer compound, positive resist composition and resist pattern forming method
#138Resist composition, resist pattern forming method and compound
#139Photosensitive polymer, resist composition, and associated methods
#140Polymeric material, containing a latent acid
#141Compositions and processes for preparing color filter elements
#142Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern
#143Photosensitive resin, and photosensitive composition
#144Positive resist composition and pattern making method using the same
#145Photoacid generator compounds and compositions
#146Si-polymers and photoresists comprising same
#147Resist composition
#148Resist composition, method of forming resist pattern, novel compound, and acid generator
#149Pattern forming method
#150Photosensitive resin composition and adhesion promoter
#151Positive resist composition for immersion lithography and method for forming resist pattern
#152Negative resist composition and method of forming resist pattern
#153Positive resist composition and pattern forming method using the same
#154Alkali-developable black photosensitive resin composition for forming light-shielding barrier wall
#155Method for air gap formation using UV-decomposable materials
#156Composition for forming lower layer film and pattern forming method
#157Positive resist composition and pattern forming method using the same
#158Photosensitive self-assembled monolayer for selective placement of hydrophilic structures
#159Resist composition and pattern-forming method using the same
#160Positive resist composition and pattern forming method using the same
#161Image-forming method and lithographic printing plate precursor
#162Positive resist composition and pattern forming method using the same
#163FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME
#164Functionalized carbosilane polymers and photoresist compositions containing the same
#165Functionalized carbosilane polymers and photoresist compositions containing the same
#166Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern
#167FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME
#168Norbornene polymer for photoresist and photoresist composition comprising the same
#169Curable composition, image forming material, and planographic printing plate precursor
#170Azo compound, curable composition, color filter, and method of producing the same
#171Positive resist composition and resist pattern forming method
#172Positive resist composition and method for forming resist pattern
#173Photosensitive resin composition
#174Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator
#175(Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method
#176Photoacid generators for the synthesis of oligo-DNA in a polymer matrix
#177Base soluble polymers for photoresist compositions
#178Composition for resist underlayer film and process for producing same
#179Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern
#180Resist composition for electron beam, X-ray, or EUV, and pattern-forming method using the same
#181Lead-free bismuth glass
#182Positive resist composition, method of forming resist pattern, polymeric compound, and compound
#183Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
#184Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound
#185Positive resist composition, method for forming resist pattern and compound
#186Photosensitive paste and manufacturing method of member for display panel
#187Positive resist composition for thin-film implantation process and method for forming resist pattern
#188Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board
#189Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern
#190Imageable elements with low pH developer solubility
#191Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method
#192Chemically amplified positive resist composition
#193Chemically amplified positive resist composition
#194Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
#195Positive photosensitive composition
#196Inkless reimageable printing paper and method
#197Inkless printing paper and method
#198Inkless printing paper and method
#199Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing
#200Photochromic material, inkless reimageable printing paper, and methods
#201Inkless reimageable printing paper and method
#202Inkless reimageable printing paper and method
#203Inkless reimageable printing paper and method
#204Inkless reimageable printing paper and method
#205Positive resist composition and pattern-forming method
#206Patterned photoacid etching and articles therefrom
#207Resist composition and method of forming resist pattern
#208Chemically amplified positive resist composition
#209Method of use for photopatternable dielectric materials for BEOL applications
#210Photosensitive composition and pattern forming method using the same
#211Positive resist compositions and patterning process
#212Fluorinated polymer, negative photosensitive resin composition and partition walls
#213Image-forming method using heat-sensitive transfer system
#214Positive resist composition and pattern-forming method
#215Chemically amplified resist composition
#216Resist composition, method of forming resist pattern, compound and acid generator
#217Polyhydric phenol compound and chemically amplified resist composition containing the same
#218Negative resist composition
#219Resist composition and pattern formation method using the same
#220Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same
#221Positive resist composition and method of forming resist pattern
#222Positive resist composition and pattern forming method
#223Positive resist composition and pattern forming method using the same
#224Resist composition and pattern-forming method using same
#225Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use
#226Chemicallly amplified resist composition
#227Composition for forming anti-reflective coating for use in lithography
#228Polymers and photoresist compositions
#229High etch resistant underlayer compositions for multilayer lithographic processes
#230Water soluble resin composition and method for pattern formation using the same
#231Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process
#232Photosensitive polymeric material for worm optical data storage with two-photon fluorescent readout
#233Bleachable materials for lithography
#234Silphenylene-bearing polymer, photo-curable resin composition, patterning process, and substrate circuit protective film
#235Resist composition for electron beam or EUV
#236Positive photoresist composition
#237Photoresist composition and method for forming pattern of a semiconductor device
#238Method of forming pattern by utilizing coatable inorganic material
#239Chemically amplified positive resist composition
#240Low activation energy dissolution modification agents for photoresist applications
#241Photoactive compounds
#242Positive resist composition, method for resist pattern formation and compound
#243Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
#244Positive resist composition and patterning process
#245Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers
#246Multilayer element with low pH developer solubility
#247Polymer, resist composition, and patterning process
#248Copolymer for semiconductor lithography and producing method thereof, and composition
#249Compound for resist and radiation-sensitive composition
#250Monomer having sulfonyl group, polymer thereof and photoresist composition including the same
#251Method for using negative tone silicon-containing resist for e-beam lithography
#252Resist composition and patterning process
#253Polymer, resist composition and patterning process using the same
#254Heat-sensitive transfer image-receiving sheet and coating composition for forming heat-sensitive transfer image-receiving sheet
#255Hydrogenated ring-opening metathesis polymer, resist composition comprising the same and patterning method
#256Photoacid generators, resist compositions, and patterning process
#257Positive photosensitive composition, polymer compounds for use in the positive photosensitive composition, manufacturing method of the polymer compounds, compounds for use in the manufacture of the polymer compounds, and pattern-forming method using the positive photosensitive composition
#258Heat-sensitive transfer image-receiving sheet and coating composition for forming heat-sensitive transfer image-receiving sheet
#259Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition
#260Materials for photoresist, photoresist composition and method of forming resist pattern
#261Monomer, polymer and composition for photoresist
#262Methods of fabricating an electronic device and an sililation polyvinyl phenol for a dielectric layer of an electronic device
#263Photosensitive polymer and photoresist composition
#264Resin composition and thermo/photosensitive composition
#265Positive resist composition and pattern formation method using the positive resist composition
#266Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
#267Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto
#268Novel resins and photoresist compositions comprising same
#269Photoresist materials and photolithography process
#270Photoresist composition with antibacterial agent
#271Negative resist composition and patterning process using the same
#272Resist top coat composition and patterning process
#273Resist material and method for forming a patterned resist layer on a substrate
#274Photoacid generators, chemically amplified resist compositions, and patterning process
#275Photoacid generators, chemically amplified resist compositions, and patterning process
#276Silsesquioxane resin
#277Resist composition for electron beam or EUV (extreme ultraviolet) and method for forming resist pattern
#278Photoacid generators for the synthesis of oligo-DNA in a polymer matrix
#279Near infrared ray activation type positive resin composition
#280Radiation-sensitive resin composition
#281Pattern forming method and bilayer film
#282Photosensitive composition and method for forming pattern using same
#283Negative photoresist compositions
#284Low activation energy dissolution modification agents for photoresist applications
#285Polymer compound, acid generator, positive resist composition, and method for formation of resist patterns
#286Photosensitive composition and method for forming pattern using same
#287Photosensitive composition and method for forming pattern using same
#288Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same
#289Positive resist composition and pattern forming method using the same
#290Positive resist composition and pattern formation method using the positive resist composition
#291Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process
#292Base soluble polymers for photoresist compositions
#293Method of coloring a coating composition
#294Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomers
#295Polymers, positive resist compositions and patterning process
#296Polymerizable composition and planographic printing plate precursor
#297Positive type resist composition and resist pattern formation method using same
#298Photoresist composition, method of patterning thin film using the same, and method of manufacturing liquid crystal display panel using the same
#299Resist cover film-forming material, process for forming resist pattern, semiconductor device and process for manufacturing the same
#300Resist composition