ClassID:

241715

Y10S430/107 - CPC Classification

Classification description:

Radiation imagery chemistry: process, composition, or product thereof; Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing; Radiation sensitive composition or product or process of making; Binder containing Polyamide or polyurethane

Recent Application in this class:
#1
20140134540
2014-05-15

Photosensitive composition, planographic printing plate precursor, polyurethane, and method for producing polyurethane

#2
20130171564
2013-07-04

Positive photosensitive resin composition, and display device and organic light emitting device using the same

#3
20120308928
2012-12-06

Resist composition, method of forming resist pattern, polymeric compound and method of producing the same

#4
20120301826
2012-11-29

Polyimide-based polymers, copolymers thereof and positive type photoresist compositions comprising the same

#5
20120097435
2012-04-26

Photosensitive modified polyimide resin composition and use thereof

#6
20110171578
2011-07-14

Positive photosensitive resin composition

#7
20110171436
2011-07-14

Negative-type photosensitive resin composition, pattern forming method and electronic parts

#8
20110143103
2011-06-16

Photo-curable resin composition, pattern forming method and substrate protecting film, and film-shaped adhesive and adhesive sheet using said composition

#9
20110076458
2011-03-31

Photosensitive polymer composition, method of forming relief patterns, and electronic equipment

#10
20110003248
2011-01-06

Positive photosensitive resin composition

#11
20100304298
2010-12-02

Negative photosensitive material, photosensitive board employing the negative photosensitive material, and negative pattern forming method

#12
20100233618
2010-09-16

Polyimide-based polymers, copolymers thereof and positive type photoresist compositions comprising the same

#13
20100099043
2010-04-22

Positive photosensitive resin composition

#14
20100021700
2010-01-28

Method for formation of miniaturized pattern and resist substrate treatment solution for use in the method

#15
20090208869
2009-08-20

Lithographic-printing plate precursor and image forming method using the same

#16
20090208868
2009-08-20

Positive photosensitive resin composition and method for forming pattern

#17
20090181324
2009-07-16

Photosensitive polyimides

#18
20090181224
2009-07-16

Negative-type photosensitive resin composition, pattern forming method and electronic parts

#19
20090176172
2009-07-09

Photosensitive polyimide composition and polyimide precursor composition

#20
20090170028
2009-07-02

Heat-sensitive positive-working lithographic printing plate precursor

#21
20090087785
2009-04-02

Polymerizable composition and planographic printing plate precursor using the same, alkali-soluble polyurethane resin, and process for producing diol compound

#22
20090075206
2009-03-19

Curable composition, image forming material, and planographic printing plate precursor

#23
20090068587
2009-03-12

(Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method

#24
20090053653
2009-02-26

Polymerizable composition and lithographic printing plate precursor

#25
20090035693
2009-02-05

Photosensitive resin composition, production method for cured relief pattern using it, and semiconductor device

#26
20080268372
2008-10-30

Lithographic printing plate precursor

#27
20080234403
2008-09-25

Radiation curable and developable polyurethane and radiation curable and developable photo resist composition containing the same

#28
20080233513
2008-09-25

Heat-resistant photosensitive resin composition, method for forming pattern using the composition, and electronic part

#29
20080187867
2008-08-07

Photosensitive polyimide composition, polyimide film and semiconductor device using the same

#30
20080106713
2008-05-08

Immersion lithography apparatus and exposure method

#31
20080090178
2008-04-17

Heat-sensitive transfer image-receiving sheet and coating composition for forming heat-sensitive transfer image-receiving sheet

#32
20080081765
2008-04-03

Heat-sensitive transfer image-receiving sheet and coating composition for forming heat-sensitive transfer image-receiving sheet

#33
20080081290
2008-04-03

Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition

#34
20080070152
2008-03-20

Negative-working radiation-sensitive compositions and imageable materials

#35
20080057446
2008-03-06

Polyimide resin soluble in aqueous alkaline solution, composition comprising the resin and cured coating prepared from the composition

#36
20080044763
2008-02-21

Resin composition and thermo/photosensitive composition

#37
20070275322
2007-11-29

Negative-working radiation-sensitive compositions and imageable materials

#38
20070202439
2007-08-30

Polymerizable composition and planographic printing plate precursor

#39
20070190450
2007-08-16

Negative radiation-sensitive resin composition

#40
20070154843
2007-07-05

Resin and resin composition

#41
20070122743
2007-05-31

Planographic printing plate precursor

#42
20070099117
2007-05-03

Sulfonamide compound, polymer compound, resist material and pattern formation method

#43
20070072122
2007-03-29

Photosensitive polymer composition, method of forming relief patterns, and electronic equipment

#44
20070071953
2007-03-29

Ink composition, ink jet recording method, method for producing planographic printing plate and planographic printing plate

#45
20060210819
2006-09-21

Polyimide composite coverlays and methods and compositions relating thereto

#46
20060159839
2006-07-20

Photosensitive resin composition, electronic component using the same, and display unit using the same

#47
20060079658
2006-04-13

Photo-curable resin composition comprising a polyimide, a process for forming a pattern therewith, and a substrate protecting film

#48
20060063104
2006-03-23

Top anti-reflective coating composition, method for forming the pattern of a semiconductor device using the same, and semiconductor device comprising the pattern

#49
20060035165
2006-02-16

Positive resist composition and method of forming a resist pattern using the same

#50
20050227167
2005-10-13

Negative photoresist and method of using thereof

#51
20050202339
2005-09-15

Negative photoresist and method of using thereof

#52
20050196698
2005-09-08

Polymerizable composition and lithographic printing plate precursor

#53
20050147915
2005-07-07

Photoresist composition

#54
20050064331
2005-03-24

Photosensitive composition and lithographic printing plate precursor using the same

#55
20050058935
2005-03-17

Sulfonamide compound, polymer compound, resist material and pattern formation method

#56
20050058934
2005-03-17

Photosensitive composition

#57
20050058930
2005-03-17

Negative resist composition with fluorosulfonamide-containing polymer

#58
20050026082
2005-02-03

Polymerizable composition and image-recording material using the same

#59
14229251
2015-09-22

Aromatic diamines containing three ether-linked-benzonitrile moieties, polymers thereof, and methods of making the same