Chemically amplified positive resist composition and patterning process

Chemically amplified negative resist composition and patterning process

Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s

Method for formation of miniaturized pattern and resist substrate treatment solution for use in the method

Base soluble polymers for photoresist compositions

Patterned photoacid etching and articles therefrom

Negative-working imageable elements and methods of use

Water soluble resin composition and method for pattern formation using the same

Compositions for use in forming a pattern and methods of forming a pattern

Low activation energy dissolution modification agents for photoresist applications

Heat-sensitive transfer image-receiving sheet and coating composition for forming heat-sensitive transfer image-receiving sheet

Low activation energy dissolution modification agents for photoresist applications

Base soluble polymers for photoresist compositions

Photosensitive resin composition, electronic component using the same, and display unit using the same

Photosensitive resin based on saponified polyvinyl acetate photosensitive resin composition, method of forming aqueous gel from the same, and compound

Positive working thermal plates

Top anti-reflective coating composition, method for forming the pattern of a semiconductor device using the same, and semiconductor device comprising the pattern

Thermally cured undercoat for lithographic application

Negative photoresist and method of using thereof

Photoresist composition

Image recording material

Photoresist composition for EUV and method for forming photoresist pattern using the same

Composition for an organic bottom anti-reflective coating and method for forming pattern using the same

Photosensitive bilayer composition

Photoimageable composition