Pattern-forming method, and radiation-sensitive composition

Resist composition, method of forming resist pattern, polymeric compound and compound

Resist composition, method of forming resist pattern and compound

Coating compositions

Pattern-forming method, and radiation-sensitive composition

Pattern forming method, chemical amplification resist composition and resist film

Hydrophilic photoacid generator and resist composition comprising same

Photosensitive resin composition and cured product thereof

Positive resist composition and patterning process

Compound, polymeric compound, acid generator, resist composition, and method of forming resist pattern

Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same

Resist composition for immersion exposure and method of forming resist pattern

Resist composition and method for producing resist pattern

Resist composition, method of forming resist pattern, novel compound and acid generator

NEGATIVE PHOTOSENSITIVE FLUORINATED AROMATIC RESIN COMPOSITION

Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist

Positive photosensitive composition

Photoacid generator and photoreactive composition

Method for forming resist pattern and method for manufacturing a semiconductor device

Composition for resist underlayer film and process for producing same

Coating composition

Polymer for resist and resist composition manufactured using the same

Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device

Resin and chemically amplified resist composition comprising the same

Copolymer for immersion lithography and compositions

Resist sensitizer

Patterning process

Photoacid generator, resist composition, and patterning process

Compound and radiation-sensitive composition

Polymer, polymer preparation method, resist composition and patterning process

Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same

Photopatternable dielectric materials for BEOL applications and methods for use

FLUORINATED COMPOUND, AND FLUOROPOLYMER, PROCESS FOR ITS PRODUCTION AND RESIST COMPOSITION CONTAINING IT

Polyhydric compound and chemically amplified resist composition containing the same

Photoresists and methods for optical proximity correction

Positive resist composition and patterning process using the same

Silsesquioxane resin systems with base additives bearing electron-attracting functionalities

Positive resist composition and patterning process using the same

Polymer compound, negative resist composition, and method of forming resist pattern

Photosensitive compound and photoresist composition including the same

Positive photosensitive composition

Resin for photoresist composition, photoresist composition and method for forming resist pattern

Positive resist composition and pattern making method using the same

Si-polymers and photoresists comprising same

Photosensitive resin composition and adhesion promoter

Curable composition, image forming material, and planographic printing plate precursor

Positive resist composition and pattern forming method using the same

Method for forming resist pattern and method for manufacturing a semiconductor device

Photosensitive compound and photoresist composition including the same

Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition

Photoresist composition, method of forming pattern using the photoresist composition and inkjet print head

Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator

(Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method

Positive-type resist composition

Resist composition for immersion exposure and method of forming resist pattern

Composition for resist underlayer film and process for producing same

Negative photosensitive fluorinated aromatic resin composition

Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same

Positive photosensitive composition

Patterned photoacid etching and articles therefrom

Photosensitive composition and pattern forming method using the same

Chemical amplification type resist composition

Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride

Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition

Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method

Water soluble resin composition and method for pattern formation using the same

Silphenylene-bearing polymer, photo-curable resin composition, patterning process, and substrate circuit protective film

Photoresists for visible light imaging

Positive photoresist composition

Low activation energy dissolution modification agents for photoresist applications

Negative-working radiation-sensitive compositions and imageable materials

Photoactive compounds

Oxetane-containing compound, photoresist composition having the same, method of preparing pattern using the photoresist composition, and inkjet print head including polymerization products of the oxetane-containing compound

Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process

Use of methanofullerne derivatives as resist materials and method for forming a resist layer

Polymer compound, positive resist composition and process for forming resist pattern

Positive-working photoimageable bottom antireflective coating

Photoactive compounds

Positive-working photoimageable bottom antireflective coating

Resist material and method for forming a patterned resist layer on a substrate

Underlayer coating forming composition for lithography containing cyclodextrin compound

Silsesquioxane resin

Negative-working radiation-sensitive compositions and imageable materials

Negative photoresist compositions

Low activation energy dissolution modification agents for photoresist applications

Fluorinated compound, and fluoropolymer, process for its production and resist composition containing it

Polymerizable composition and planographic printing plate precursor

Negative-working radiation-sensitive compositions and imageable materials

Positive resist composition and process for formation of resist patterns

Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film

Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition

Siloxane compound, photoresist composition including the siloxane compound and method of forming a pattern using the photoresist composition

Positive photosensitive composition

Positive resist composition and pattern making method using the same

Chemical amplification type resist composition

Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method

Resist composition and patterning process using the same

Photoactive compounds

Antireflective hardmask and uses thereof

Photosensitive element, resist pattern formation method and printed wiring board production method

Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process

Negative photoresist for silicon KOH etch without silicon nitride

Ink composition, ink jet recording method, method for producing planographic printing plate and planographic printing plate

Resin for photoresist composition, photoresist composition and method for forming resist pattern

Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions

Barrier coating compositions containing fluorine and methods of forming photoresist patterns using such compositions

Chemical amplification-type resist composition and production process thereof

Photosensitive composition, photosensitive lithography plate and method for producing lithography plate

Positive photosensitive composition

Antireflective hardmask composition and methods for using same

Photoresist monomer polymer thereof and photoresist composition including the same

Photoresists for visible light imaging

Photoresist composition

Negative resist composition comprising base polymer having epoxy ring and si-containing crosslinker and patterning method for semiconductor device using the same

Chemical amplification type positive resist composition

Fluorinated compound, fluoropolymer and process for its production

Organic anti-reflective coating composition and method for forming photoresist patterns using the same

Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern by using the photoresist composition

Water soluble resin composition, method of pattern formation and method of inspecting resist pattern

Resist composition for liquid immersion exposure process and method of forming resist pattern therewith

Photosensitive coating material for a substrate

Resist composition and patterning process using the same

Fluorinated compound, and fluoropolymer, process for its production and resist composition containing it

High resolution resists for next generation lithographies

Nanocomposite negative resists for next generation lithographies

Silicon-containing resist composition and patterning process

Pixelated photoresists

Silicon-containing compositions for spin-on arc/hardmask materials

Aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape

Polymerizable composition and planographic printing plate precursor

Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition

Positive resist composition and method of forming a resist pattern using the same

Photoresist undercoat-forming material and patterning process

Energy harvesting molecules and photoresist technology

Photoresist composition and method of forming a pattern using the same

Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same

Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide

Photoresist composition and method of forming a pattern using same

Planographic printing plate material and preparing process of planographic printing plate

Negative resist composition comprising hydroxy-substituted base polymer and Si-containing crosslinker having epoxy ring and a method for patterning semiconductor devices using the same

Positive-tone radiation-sensitive resin composition

Positive resist compositions and patterning process

Positive resist compositions and patterning process

Positive resist composition

Negative photoresist and method of using thereof

Positive resist composition

Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same

Photoacid generators based on novel superacids

Positive-working photoimageable bottom antireflective coating

Negative photoresist and method of using thereof

Polymer compound, resist material and pattern formation method

Negative photoresist composition involving non-crosslinking chemistry

Negative photoresist composition including non-crosslinking chemistry

Photoimageable composition

Radiation-sensitive resin composition

Chemical amplification type positive resist composition

Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions

Photoresist composition

Positive photosensitive composition

Positive resist composition and base material carrying layer of the positive resist composition

Multi-layer sheet and liquid crystal display device

Photoimageable composition

Photoresist composition for EUV and method for forming photoresist pattern using the same

Radiation-sensitive resin composition

Silicon-containing compositions for spin-on ARC/hardmask materials

Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method

Positive resist composition and pattern-forming method using the same

Photoresists and processes for microlithography

Onium salt compound and radiation-sensitive resin composition

Positive-working chemical-amplification photoresist composition

Photosensitive bilayer composition

MONOMERS CONTAINING AN OXEPAN-2-ONE GROUP, PHOTORESIST COMPOSITIONS COMPRISING POLYMERS PREPARED FROM THE MONOMERS, METHODS FOR PREPARING THE COMPOSITIONS, AND METHODS FOR FORMING PHOTORESIST PATTERNS USING THE COMPOSITIONS

Antireflective hardmask and uses thereof

Recording medium

Photoimageable composition

Positive resist composition

Positive resist composition and method of forming resist pattern using the same

Sulfonate and a resist composition