241722 ⎘
Radiation imagery chemistry: process, composition, or product thereof; Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing; Radiation sensitive composition or product or process of making Initiator containing
Sub-classes:Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
#2Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
#3Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
#4Photoresist overcoat compositions and methods of forming electronic devices
#5Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
#6Pattern-forming method, and radiation-sensitive composition
#7Photoresist overcoat compositions and methods of forming electronic devices
#8Negative-type photoresist composition for thick film and use thereof
#9Chemically amplified negative resist composition and patterning process
#10Resist composition, method of forming resist pattern, polymeric compound and compound
#11Monomer, polymer, resist composition, and patterning process
#12Resist composition, method of forming resist pattern and compound
#13Positive resist composition and patterning process using same
#14Photosensitive polymer, resist composition including the photosensitive polymer and method of preparing resist pattern using the resist composition
#15Hybrid photoresist composition and pattern forming method using thereof
#16Developable bottom antireflective coating composition and pattern forming method using thereof
#17Photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, and pattern forming method and article using the photosensitive resin composition
#18Radiation-sensitive composition, and compound
#19Photoresist overcoat compositions and methods of forming electronic devices
#20Resist composition and method of forming resist pattern
#21Pattern-forming method, and radiation-sensitive composition
#22Resist composition and method of forming resist pattern
#23Radiation-sensitive resin composition, polymer, and resist pattern-forming method
#24Pattern forming method, chemical amplification resist composition and resist film
#25Liquid crystal display
#26Hydrophilic photoacid generator and resist composition comprising same
#27Film, method for manufacturing the film and masking method using the film
#28Hybrid photoresist composition and pattern forming method using thereof
#29Method of forming pattern, actinic-ray- or radiation-sensitive resin composition and actinic-ray- or radiation-sensitive film
#30Positive resist composition and patterning process
#31Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device
#32Photoacid Generators for the Synthesis of Oligo-DNA in a Polymer Matrix
#33Pattern forming method, pattern, chemical amplification resist composition and resist film
#34Patterning process and photoresist with a photodegradable base
#35Chemically amplified negative resist composition and patterning process
#36Polyol photosensitizers, carrier gas UV laser ablation sensitizers, and other additives and methods for making and using same
#37Resist composition and patterning process
#38Resist composition and patterning process
#39Optical waveguides and methods thereof
#40Patterning process and resist composition
#41Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
#42Photoacid generators for the synthesis of oligo-DNA in a polymer matrix
#43Oxime ester compound and photopolymerization initiator containing the same
#44Thermoplastic material comprising polychromic substances
#45Base generator
#46Method of forming patterns
#47Patterning process and chemical amplified photoresist with a photodegradable base
#48Solution processed thin films and laminates, devices comprising such thin films and laminates, and method for their use and manufacture
#49Photoacid generator compounds and compositions
#50Electrode and method for manufacturing the same
#51Photoacid generators for the synthesis of oligo-DNA in a polymer matrix
#52Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board
#53Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board
#54Positive resist composition and pattern forming method using the same
#55Photoacid generator and photoreactive composition
#56Ultra low post exposure bake photoresist materials
#57Positive resist composition and pattern forming method using the same
#58Method for forming resist pattern and method for manufacturing a semiconductor device
#59Photosensitive paste and process for production of pattern using the same
#60Photobase generator and photocurable resin composition
#61Resist composition and method of forming resist pattern
#62Electromagnetic radiation or thermally sensitive composition
#63Polymeric material, containing a latent acid
#64Method of forming fine patterns of a semiconductor device
#65Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device
#66Method of forming resist pattern
#67Optical waveguides and methods thereof
#68Low outgassing photoresist compositions
#69Optical waveguides and methods thereof
#70Resist composition and method for forming a pattern using the same
#71Method of producing semiconductor device using resist underlayer film by photo-crosslinking curing
#72Resist composition and patterning process
#73Chemically-amplified positive resist composition and patterning process thereof
#74Polymer and chemically amplified resist composition comprising the same
#75Photosensitive composition, method for forming pattern, and method for manufacturing semiconductor device
#76Method for manufacturing semiconductor device
#77Polymerizable compound, polymer, positive resist composition, and patterning process using the same
#78Photosensitive hardmask for microlithography
#79Patterning process
#80Photoacid generator, resist composition, and patterning process
#81Polyorganosiloxane, resin composition, and patterning process
#82Resist composition and pattern forming method using the same
#83Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same
#84Resin for hydrophobitizing resist surface, method for manufacturing the resin, and positive resist composition containing the resin
#85Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same
#86Polyhydric compound and chemically amplified resist composition containing the same
#87Si device making method by using a novel material for packing and unpacking process
#88Photosensitive resin composition and circuit substrate employing the same
#89Photosensitive conductive paste for transferring and photosensitive transfer sheet
#90Thermoplastic material comprising polychromic substances
#91Polyol photosensitizers, carrier gas UV laser ablation sensitizers, and other additives and methods for making and using same
#92Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
#93Methods of forming a pattern of a semiconductor device
#94Polymer compound, negative resist composition, and method of forming resist pattern
#95Polymer compound, positive resist composition and resist pattern forming method
#96Resist composition, resist pattern forming method and compound
#97Polymeric material, containing a latent acid
#98Radiation-sensitive resin composition
#99Positive resist composition and pattern making method using the same
#100Photoacid generator compounds and compositions
#101Sacrificial compositions and methods of fabricating a structure using sacrificial compositions
#102Alkali-developable black photosensitive resin composition for forming light-shielding barrier wall
#103Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same
#104Sacrificial compositions and methods of fabricating a structure using sacrificial compositions
#105Positive resist composition and pattern forming method using the same
#106Resist composition and method of forming resist pattern
#107Photoactive compounds
#108Method for forming resist pattern and method for manufacturing a semiconductor device
#109Positive resist composition and method for forming resist pattern
#110Photoacid generators for the synthesis of oligo-DNA in a polymer matrix
#111Photoacid generator, resist composition, and patterning process
#112Photosensitive paste and manufacturing method of member for display panel
#113Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board
#114Initiator compositions, negative-working imageable elements, and methods of use
#115Method of forming patterns
#116Inkless reimageable printing paper and method
#117Inkless printing paper and method
#118Inkless printing paper and method
#119Inkless reimageable printing paper and method
#120Photocurable and thermosetting resin composition, cured product thereof, and printed circuit board
#121Sulfonate derivatives and the use thereof as latent acids
#122Image recording media and image layers
#123Resist composition for electron beam or EUV
#124Composition for forming photosensitive polymer complex and method of preparing photosensitive polymer complex containing silver nanoparticles using the composition
#125Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
#126Pattern forming material, pattern forming apparatus and pattern forming process
#127Soft mold and method of fabricating the same
#128Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto
#129Photoresist composition with antibacterial agent
#130Resist composition and process for formation of resist patterns
#131Positive resist compositions and patterning process
#132High silicon-content thin film thermosets
#133Chemically amplified photoresist composition, laminated product, and connection element
#134Photoacid generators for the synthesis of oligo-DNA in a polymer matrix
#135Polymer compound, acid generator, positive resist composition, and method for formation of resist patterns
#136Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same
#137Polymeric photoinitiators
#138Resist composition and patterning process using the same
#139Photoresist composition, method of patterning thin film using the same, and method of manufacturing liquid crystal display panel using the same
#140Positive resist composition and pattern forming method using the same
#141Polymerizable composition and planographic printing plate precursor using the same
#142Optical waveguides and methods thereof
#143Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same
#144Positive resist composition and pattern making method using the same
#145Photosensitive composition comprising triazine-based photoactive compound containing oxime ester
#146Photocurable and thermosetting resin composition, dry film using the same, and cured product thereof
#147Resist composition and patterning process using the same
#148Photoactive compounds
#149Thick film photoresist composition and method of forming resist pattern
#150Photosensitive element, resist pattern formation method and printed wiring board production method
#151Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
#152NIR/IR curable coatings for light directed imaging
#153Polymeric photoinitiators
#154Pattern forming method and resist composition used therefor
#155Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board
#156Resist composition for electron beam or EUV
#157Positive resist composition for immersion exposure and pattern forming method using the same
#158Positive resist composition and pattern-forming method using the same
#159Polymeric material, containing a latent acid
#160Photoresist composition and method of manufacturing a thin-film transistor substrate using the same
#161Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same
#162Color forming composition containing a plurality of antenna dyes
#163Photoactive compounds
#164Sacrificial compositions and methods of fabricating a structure using sacrificial compositions
#165Radiation-sensitive resin composition
#166Nanocomposite photoresist composition for imaging thick films
#167Photocatalyst composition and photocatalyst containing layer
#168Positive type radiation-sensitive resin composition
#169Positive photosensitive resin composition
#170Chemical amplification type positive resist composition
#171Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same
#172Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator
#173Photoresist compositions
#174Photoresist composition and method of forming a photoresist pattern using the same
#175Photo-curable resin composition comprising a polyimide, a process for forming a pattern therewith, and a substrate protecting film
#176Positive type photosensitive paste composition for PDP electrode, PDP electrode prepared therefrom, and PDP comprising the PDP electrode
#177Photosensitive composition
#178Pixelated photoresists
#179Aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape
#180Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
#181Photosensitive composition and image recording method using the same
#182Planographic printing plate material and preparing process of planographic printing plate
#183Photosensitive resin composition and photosensitive dry film containing the same
#184Photosensitive composition and pattern forming method using the same
#185Curable composition and image forming material containing the same
#186Radiation-sensitive resin composition
#187Sulfonate derivatives and the use thereof as latent acids
#188Planographic printing plate material and preparing process of planographic printing plate
#189Positive resist composition and pattern formation method using the same
#190Light-sensitive sheet comprising support, first and second light-sensitive layers and barrier layer
#191Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device