Y10S430/118 - CPC Classification Index

ClassID:

241726 ⎘

Y10S430/118 - CPC Classification

Classification description:

Radiation imagery chemistry: process, composition, or product thereof; Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing; Radiation sensitive composition or product or process of making; Initiator containing with inhibitor or stabilizer

Sub-classes:

Y10S430/119 » Hydroxyl or carbonyl group containing as sole functional groups 6

Recent Application in this class:

20130098870

Method for forming pattern

20080318159

Positive photosensitive composition

20080176170

Resist composition for electron beam or EUV

20070190454

Photoresist composition, method of patterning thin film using the same, and method of manufacturing liquid crystal display panel using the same

20070141513

Positive photosensitive composition

20070077512

Resist composition for electron beam or EUV

20060264526

Low-viscous, radiation curable formulation, particularly for the stereo-lithographical production of earpiece

20060228644

Nanocomposite photoresist composition for imaging thick films

20060160021

Photoresist composition and method of forming a photoresist pattern using the same

20060068328

Photosensitive lithographic printing plate

20060051699

Radiation-sensitive elements and their storage stability

20050158657

Radiation-sensitive resin composition