Y10S430/121 - CPC Classification Index

ClassID:

241729 ⎘

Y10S430/121 - CPC Classification

Classification description:

Radiation imagery chemistry: process, composition, or product thereof; Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing; Radiation sensitive composition or product or process of making; Initiator containing; Nitrogen compound containing Nitrogen in heterocyclic ring

Recent Application in this class:

20130344436

2013-12-26

Resist composition and method of forming resist pattern

20130115555

2013-05-09

Resist composition and method of forming resist pattern

20130089819

2013-04-11

Resist composition, method of forming resist pattern, polymeric compound, and compound

20130017491

2013-01-17

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

20130017490

2013-01-17

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

20130017489

2013-01-17

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

20130011795

2013-01-10

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

20130011794

2013-01-10

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

20130011793

2013-01-10

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

#10

20130011792

2013-01-10

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

#11

20130011790

2013-01-10

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

#12

20130011789

2013-01-10

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

#13

20130011788

2013-01-10

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

#14

20130011787

2013-01-10

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

#15

20130011786

2013-01-10

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

#16

20120258403

2012-10-11

Salt and photoresist composition comprising the same

#17

20120231392

2012-09-13

Salt, resist composition and method for producing resist pattern

#18

20120219906

2012-08-30

Resist composition and method for producing resist pattern

#19

20120219905

2012-08-30

Resist composition and method for producing resist pattern

#20

20120148955

2012-06-14

Resist composition, method of forming resist pattern, and new compound

#21

20120141939

2012-06-07

Photoacid generators

#22

20120009521

2012-01-12

Resist composition, method of forming resist pattern, compound and acid generator

#23

20110183259

2011-07-28

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

#24

20110008731

2011-01-13

Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition

#25

20100304300

2010-12-02

Photosensitive composition and pattern-forming method using the photosensitive composition

#26

20100285408

2010-11-11

Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board

#27

20100279229

2010-11-04

Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board

#28

20100209846

2010-08-19

Negative-working imageable elements

#29

20100193841

2010-08-05

Method for forming resist pattern and method for manufacturing a semiconductor device

#30

20100136479

2010-06-03

Positive photosensitive composition

#31

20100112479

2010-05-06

Photopolymerization initiator containing unsaturated double bond and oxime ester group and photosensitive resin composition comprising the same

#32

20100015552

2010-01-21

Resist composition, method of forming resist pattern, compound and acid generator

#33

20090311626

2009-12-17

Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s

#34

20090202944

2009-08-13

Photosensitive resin composition, and, photosensitive element, method for forming resist pattern, method for manufacturing printed wiring board and method for manufacturing partition wall for plasma display panel using the composition

#35

20090202786

2009-08-13

Photosensitive resin composition and circuit substrate employing the same

#36

20090142697

2009-06-04

Photosensitive resin, and photosensitive composition

#37

20090142695

2009-06-04

Imageable elements with components having 1H-tetrazole groups

#38

20090136872

2009-05-28

Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same

#39

20090104563

2009-04-23

Resist composition, method of forming resist pattern, novel compound, and acid generator

#40

20090098483

2009-04-16

Positive resist composition and method for forming resist pattern

#41

20090087788

2009-04-02

Curable composition, image forming material, and planographic printing plate precursor

#42

20090081593

2009-03-26

Method for forming resist pattern and method for manufacturing a semiconductor device

#43

20090075202

2009-03-19

Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition

#44

20090042127

2009-02-12

Photoresist composition and method of forming a photoresist pattern using the same

#45

20090038834

2009-02-12

Alkali development-type solder resist, cured product thereof, and printed wiring board prepared by using the same

#46

20090035698

2009-02-05

Positive resist composition and resist pattern forming method

#47

20090029289

2009-01-29

Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board

#48

20090004599

2009-01-01

Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s

#49

20080318159

2008-12-25

Positive photosensitive composition

#50

20080299488

2008-12-04

Negative-working imageable elements and methods of use

#51

20080286467

2008-11-20

Method of use for photopatternable dielectric materials for BEOL applications

#52

20080275154

2008-11-06

Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition

#53

20080268372

2008-10-30

Lithographic printing plate precursor

#54

20080241736

2008-10-02

Resist composition and patterning process

#55

20080206678

2008-08-28

Radiation-sensitive composition and elements with basic development enhancers

#56

20080199806

2008-08-21

Patterning process and resist composition

#57

20080085469

2008-04-10

Photoacid generators, resist compositions, and patterning process

#58

20080085468

2008-04-10

Resist composition and pattern forming method using the same

#59

20070269745

2007-11-22

Lithographic printing plate precursors with oligomeric or polymeric sensitizers

#60

20070269744

2007-11-22

Resist composition for electron beam or EUV (extreme ultraviolet) and method for forming resist pattern

#61

20070212645

2007-09-13

Photo sensitive composition, pattern-forming method using the photosensitive composition and compound for use in the photosensitive composition

#62

20070190450

2007-08-16

Negative radiation-sensitive resin composition

#63

20070141513

2007-06-21

Positive photosensitive composition

#64

20070141509

2007-06-21

Negative photoresist composition

#65

20070106075

2007-05-10

Triazine based photoactive compound containing oxime ester

#66

20070099112

2007-05-03

Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process

#67

20070066702

2007-03-22

Photocurable composition and coating composition

#68

20070065752

2007-03-22

Positive resist composition and pattern forming method using the same

#69

20060228647

2006-10-12

Photoresist composition

#70

20060210912

2006-09-21

Photosensitive resin film and cured film made therefrom

#71

20060154172

2006-07-13

1,4-dihydropyridine-containing IR-sensitive composition and use thereof for the production of imageable elements

#72

20060051701

2006-03-09

Polymerizable composition and planographic printing plate precursor

#73

20060040203

2006-02-23

Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition

#74

20060019195

2006-01-26

Photoresist undercoat-forming material and patterning process

#75

20050266336

2005-12-01

Photosensitive composition and pattern-forming method using the photosensitive composition

#76

20050255405

2005-11-17

Photoresist resin composition

#77

20050250045

2005-11-10

Functional polymer

#78

20050250044

2005-11-10

Functional polymer

#79

20050244747

2005-11-03

Positive-tone radiation-sensitive resin composition

#80

20050181300

2005-08-18

Photobase generator and curable composition

#81

20050170285

2005-08-04

Polymerizable composition

#82

20050164124

2005-07-28

Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern and method for producing printed wiring board

#83

20050164120

2005-07-28

Photopolymerizable composition

#84

20050038261

2005-02-17

Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition

#85

20050003285

2005-01-06

Imageable element with solvent-resistant polymeric binder