Y10S438/913 - CPC Classification Index

ClassID:

242002 ⎘

Y10S438/913 - CPC Classification

Classification description:

Semiconductor device manufacturing: process Diverse treatments performed in unitary chamber

Recent Application in this class:

20140070213

2014-03-13

Methods for discretized processing and process sequence integration of regions of a substrate

20130065796

2013-03-14

Advanced Mixing System for Integrated Tool Having Site-Isolated Reactors

20130056101

2013-03-07

Methods for discretized processing and process sequence integration of regions of a substrate

20120231975

2012-09-13

Advanced mixing system for integrated tool having site-isolated reactors

20120074096

2012-03-29

Methods for discretized processing and process sequence integration of regions of a substrate

20120048829

2012-03-01

Methods for discretized processing and process sequence integration of regions of a substrate

20120043298

2012-02-23

Methods for discretized processing and process sequence integration of regions of a substrate

20120021553

2012-01-26

Methods for discretized processing and process sequence integration of regions of a substrate

20110281773

2011-11-17

Advanced mixing method for integrated tool having site-isolated reactors

#10

20110271907

2011-11-10

Device for processing a substrate, method of processing a substrate and method of manufacturing semiconductor device

#11

20110229989

2011-09-22

Large scale method and furnace system for selenization of thin film photovoltaic materials

#12

20100167542

2010-07-01

Methods of titanium deposition

#13

20100136714

2010-06-03

Device for processing a substrate, method of processing a substrate and method of manufacturing semiconductor device

#14

20090170337

2009-07-02

Device for processing substrate and method of manufacturing semiconductor device

#15

20080268633

2008-10-30

Methods of titanium deposition

#16

20080156769

2008-07-03

Advanced mixing system for integrated tool having site-isolated reactors

#17

20080133161

2008-06-05

Methods for discretized processing and process sequence integration of regions of a substrate

#18

20080132089

2008-06-05

Methods for discretized processing and process sequence integration of regions of a substrate

#19

20080012013

2008-01-17

Pattern manufacturing equipments, organic thin-film transistors and manufacturing methods for organic thin-film transistor

#20

20070093072

2007-04-26

Epitaxial wafer and method for producing same

#21

20070082508

2007-04-12

Methods for discretized processing and process sequence integration of regions of a substrate

#22

20060219175

2006-10-05

Oxide-like seasoning for dielectric low k films

#23

20060185596

2006-08-24

Vapor phase growth method by controlling the heat output in the gas introduction region

#24

20060177579

2006-08-10

Method for manufacturing semiconductor device

#25

20050227499

2005-10-13

Oxide-like seasoning for dielectric low k films

#26

20050150460

2005-07-14

Insitu post atomic layer deposition destruction of active species

#27

20050103261

2005-05-19

Epitaxially coated semiconductor wafer

#28

20050032391

2005-02-10

Method for processing a semiconductor wafer

#29

20050025691

2005-02-03

Method for heat treatment of silicon wafers and silicon wafer