242035 ⎘
Semiconductor device manufacturing: process; Masking Step and repeat
Single spacer process for multiplying pitch by a factor greater than two and related intermediate IC structures
#2Methods for fabricating integrated circuits with improved semiconductor fin structures
#3Single spacer process for multiplying pitch by a factor greater than two and related intermediate IC structures
#4Nanowire growth on dissimilar material
#5Growth of III-V compound semiconductor nanowires on silicon substrates
#6Manufacturing method of semiconductor device
#7Single spacer process for multiplying pitch by a factor greater than two and related intermediate IC structures
#8Method for adjusting feature size and position
#9Methods of manufacturing semiconductor device
#10Single spacer process for multiplying pitch by a factor greater than two and related intermediate IC structures
#11Fabrication method
#12Semiconductor device and method of manufacturing semiconductor device
#13Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light
#14Method for realizing a multispacer structure, use of said structure as a mold and circuital architectures obtained from said mold
#15Method for repairing photoresist layer defects using index matching overcoat
#16Substrate holder and device manufacturing method
#17Method and apparatus for adjusting feature size and position
#18Liquid crystal display device and fabricating method thereof, and thin film patterning method applied thereto
#19Forming a plurality of thin-film devices
#20Methods of forming openings, and methods of forming container capacitors
#21Capacitor structures, and DRAM arrays
#22Methods of forming openings, and methods of forming container capacitors
#23Controlled dry etch of a film
#24Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light
#25Method of manufacturing a semiconductor device with outline of cleave marking regions and alignment or registration features
#26Controlled dry etch of a film