ClassID:

242049

Y10S438/96 - CPC Classification

Classification description:

Semiconductor device manufacturing: process Porous semiconductor

Recent Application in this class:
#1
20120146224
2012-06-14

Semiconductor having interconnects with improved mechanical properties by insertion of nanoparticles

#2
20120068315
2012-03-22

Method of improving mechanical properties of semiconductor interconnects with nanoparticles

#3
20120061622
2012-03-15

SURFACE-ACTIVATION OF SEMICONDUCTOR NANOSTRUCTURES FOR BIOLOGICAL APPLICATIONS

#4
20110192988
2011-08-11

Transmission electron microscope micro-grid and method for manufacturing the same

#5
20100291769
2010-11-18

Alternative methods for fabrication of substrates and heterostructures made of silicon compounds and alloys

#6
20100270536
2010-10-28

Concentric Gate Nanotube Transistor Devices

#7
20100173478
2010-07-08

Concentric gate nanotube transistor devices

#8
20100151661
2010-06-17

Nanostructures formed of branched nanowhiskers and methods of producing the same

#9
20100144111
2010-06-10

Process for production of SOI substrate and process for production of semiconductor device

#10
20100035413
2010-02-11

Active layer for solar cell and the manufacturing method making the same

#11
20100029034
2010-02-04

Method of manufacturing solar cell

#12
20090317926
2009-12-24

Method for making transmission electron microscope grid

#13
20090224216
2009-09-10

Surface-activation of semiconductor nanostructures for biological applications

#14
20090026458
2009-01-29

Porous semiconductive film and process for its production

#15
20080286940
2008-11-20

Process for production of SOI substrate and process for production of semiconductor device including the selective forming of porous layer

#16
20080264176
2008-10-30

Method of making a device for measuring deformation

#17
20080105969
2008-05-08

Semiconductor constructions and semiconductor device fabrication methods

#18
20080076201
2008-03-27

Field-effect transistor, sensor using it, and production method thereof

#19
20080054349
2008-03-06

REDUCED-RESISTANCE FINFETS BY SIDEWALL SILICIDATION AND METHODS OF MANUFACTURING THE SAME

#20
20070246752
2007-10-25

Semiconductor device structures with reduced junction capacitance and drain induced barrier lowering and methods for fabricating such device structures and for fabricating a semiconductor-on-insulator substrate

#21
20070199734
2007-08-30

Method for manufacturing electronic components, mother substrate, and electronic component

#22
20070184581
2007-08-09

Semiconductor constructions and semiconductor device fabrication methods

#23
20070148836
2007-06-28

Reduced-resistance finFETs by sidewall silicidation and methods of manufacturing the same

#24
20070111535
2007-05-17

Method to create damage-free porous low-k dielectric films and structures resulting therefrom

#25
20070108510
2007-05-17

Process for production of SOI substrate and process for production of semiconductor device

#26
20060177994
2006-08-10

Methods and apparatuses for manufacturing ultra thin device layers for integrated circuit devices

#27
20060151025
2006-07-13

Active layer for solar cell and the manufacturing method making the same

#28
20060120918
2006-06-08

Field-effect transistor, sensor using it, and production method thereof

#29
20060116002
2006-06-01

Surface-activation of semiconductor nanostructures for biological applications

#30
20060057360
2006-03-16

Nanostructures formed of branched nanowhiskers and methods of producing the same

#31
20060054507
2006-03-16

Method for producing porous body

#32
20050287770
2005-12-29

Alternative methods for fabrication of substrates and heterostructures made of silicon compounds and alloys

#33
20050233579
2005-10-20

Method for forming metal wires in semiconductor device

#34
20050189318
2005-09-01

Method for forming macropores in a layer and products obtained thereof

#35
20050151201
2005-07-14

Process for production of SOI substrate and process for production of semiconductor device

#36
20050118782
2005-06-02

Method of forming a porous material layer in a semiconductor device

#37
20050059221
2005-03-17

Methods and apparatuses for manufacturing ultra thin device layers for integrated circuit devices

#38
20050037599
2005-02-17

Process for fabricating strained layers of silicon or of a silicon/germanium alloy

#39
20050032256
2005-02-10

Semiconductor device with porous interlayer insulating film