ClassID:

242050

Y10S438/961 - CPC Classification

Classification description:

Semiconductor device manufacturing: process Ion beam source and generation

Recent Application in this class:
#1
20140041711
2014-02-13

Apparatus pertaining to solar cells having nanowire titanium oxide cores and graphene exteriors and the co-generation conversion of light into electricity using such solar cells

#2
20110186749
2011-08-04

Ion source

#3
20100270536
2010-10-28

Concentric Gate Nanotube Transistor Devices

#4
20100173478
2010-07-08

Concentric gate nanotube transistor devices

#5
20100171033
2010-07-08

Ion source vessel and methods

#6
20090272896
2009-11-05

Pulsed ultraviolet ion source

#7
20090238999
2009-09-24

Organic electroluminescent display device and method of preparing the same

#8
20090194687
2009-08-06

Ion source vessel and methods

#9
20090104750
2009-04-23

Method for manufacturing semiconductor substrate, display panel, and display device

#10
20080261393
2008-10-23

Reducing wire erosion during damascene processing

#11
20070178652
2007-08-02

Structure and method to form source and drain regions over doped depletion regions

#12
20070166842
2007-07-19

Method for modifying circuit within substrate

#13
20070105355
2007-05-10

Method of implanting a substrate and an ion implanter for performing the method

#14
20070004122
2007-01-04

Method for fabricating semiconductor memory device

#15
20060230937
2006-10-19

Composite material for ultra thin membranes

#16
20060219954
2006-10-05

Methods and apparatus for glitch recovery in stationary-beam ion implantation process using fast ion beam control

#17
20060172514
2006-08-03

Reducing wire erosion during damascene processing

#18
20050277222
2005-12-15

Organic electroluminescent display device and method of preparing the same

#19
20050156253
2005-07-21

Structure and method to form source and drain regions over doped depletion regions

#20
20050085088
2005-04-21

Method and device for cutting wire formed on semiconductor substrate

#21
20050085041
2005-04-21

Method for fabricating semiconductor memory device