ClassID:

242053

Y10S438/964 - CPC Classification

Classification description:

Semiconductor device manufacturing: process Roughened surface

Recent Application in this class:
#1
20150318369
2015-11-05

Conductive nanoparticles

#2
20100258904
2010-10-14

Bottle-shaped trench capacitor with enhanced capacitance

#3
20100240219
2010-09-23

Method of treating a semiconductor substrate

#4
20100151602
2010-06-17

Laser roughening to improve LED emissions

#5
20100075504
2010-03-25

Method of treating a semiconductor substrate

#6
20100047945
2010-02-25

Methods of forming particle-containing materials

#7
20100025715
2010-02-04

Ultra dark polymer

#8
20090311874
2009-12-17

Method of treating surface of semiconductor substrate

#9
20090302371
2009-12-10

CONDUCTIVE NANOPARTICLES

#10
20090296413
2009-12-03

Lamp and method of making the same

#11
20090246935
2009-10-01

Method for producing SOI substrate

#12
20090238953
2009-09-24

Method for making electrode

#13
20090233399
2009-09-17

Method of manufacturing photoelectric device

#14
20080284034
2008-11-20

Method of reducing the surface roughness of spin coated polymer films

#15
20080061307
2008-03-13

Method of fabricating light emitting device and thus-fabricated light emitting device

#16
20080012093
2008-01-17

Capacitor constructions

#17
20070161184
2007-07-12

Liquid crystal display array board and method of fabricating the same

#18
20070148923
2007-06-28

Nitride semiconductor device and method of manufacturing the same

#19
20070141516
2007-06-21

Ultra dark polymer

#20
20070134818
2007-06-14

Method of reducing the surface roughness of spin coated polymer films

#21
20070108462
2007-05-17

FABRICATION METHOD OF LIGHT EMITTING DIODE INCORPORATING SUBSTRATE SURFACE TREATMENT BY LASER AND LIGHT EMITTING DIODE FABRICATED THEREBY

#22
20070093034
2007-04-26

Methods of forming semiconductor constructions

#23
20070092989
2007-04-26

Method for making conductive nanoparticle charge storage element

#24
20070049007
2007-03-01

Interconnect structure and method for forming the same

#25
20070034965
2007-02-15

CMOS image sensor having drive transistor with increased gate surface area and method of manufacturing the same

#26
20070007572
2007-01-11

Capacitor fabrication methods and capacitor constructions

#27
20060263936
2006-11-23

Surface roughening method for embedded semiconductor chip structure

#28
20060258134
2006-11-16

Methods of forming particle-containing materials

#29
20060252201
2006-11-09

Capacitor constructions

#30
20060246679
2006-11-02

Methods of forming HSG layers and devices

#31
20060237763
2006-10-26

Electronic systems

#32
20060228857
2006-10-12

DRAM cells

#33
20060220769
2006-10-05

Electrode with nano-sized structures

#34
20060216902
2006-09-28

Rugged metal electrodes for metal-insulator-metal capacitors

#35
20060211266
2006-09-21

Semiconductor constructions comprising particle-containing materials

#36
20060175666
2006-08-10

Integrated circuit arrangement with low-resistance contacts and method for production thereof

#37
20060141734
2006-06-29

Method for fabricating semiconductor device

#38
20060073424
2006-04-06

Optical coatings

#39
20060063363
2006-03-23

Semiconductor structures

#40
20060038190
2006-02-23

Fabrication method of light emitting diode incorporating substrate surface treatment by laser and light emitting diode fabricated thereby

#41
20060006407
2006-01-12

Nitride semiconductor device and method of manufacturing the same

#42
20050264976
2005-12-01

Silicon nanocrystal capacitor and process for forming same

#43
20050247967
2005-11-10

High surface area capacitor structures and precursors

#44
20050243601
2005-11-03

Highly compact Eprom and flash EEprom devices

#45
20050227463
2005-10-13

Doping method and manufacturing method for a semiconductor device

#46
20050227438
2005-10-13

Semiconductor device and method of manufacturing same

#47
20050191437
2005-09-01

Method of forming a catalytic surface comprising at least one of Pt, Pd, Co and Au in at least one of elemental and alloy forms

#48
20050173745
2005-08-11

Capacitor structures, DRAM cell structures, and integrated circuitry, and methods of forming capacitor structures, integrated circuitry and DRAM cell structures

#49
20050118449
2005-06-02

Methods of forming particle-containing materials

#50
20050079737
2005-04-14

MEMS based contact conductivity electrostatic chuck

#51
20050079728
2005-04-14

Method of reducing the surface roughness of spin coated polymer films

#52
20050051827
2005-03-10

Capacitor constructions and rugged silicon-containing surfaces

#53
20050051826
2005-03-10

Methods of forming rugged silicon-containing surfaces

#54
20050042824
2005-02-24

Capacitor constructions and semiconductor structures

#55
20050029571
2005-02-10

Method of producing rough polysilicon by the use of pulsed plasma chemical vapor deposition and products produced by same

#56
20050029570
2005-02-10

Method of producing rough polysilicon by the use of pulsed plasma chemical vapor deposition and products produced by same

#57
20050020026
2005-01-27

Capacitor constructions, semiconductor constructions, and methods of forming electrical contacts and semiconductor constructions

#58
20050017359
2005-01-27

Capacitor constructions, semiconductor constructions, and methods of forming electrical contacts and semiconductor constructions

#59
14023423
2015-02-10

Solar cell texturing