242062 ⎘
Semiconductor device manufacturing: process Substrate orientation
Integrated circuits with aligned (100) NMOS and (110) PMOS finFET sidewall channels
#2Integrated circuits with aligned (100) NMOS and (110) PMOS FinFET sidewall channels
#3Plasma processing apparatus and plasma processing method
#4OPTO-ELECTRONIC AND ELECTRONIC DEVICES USING AN N-FACE OR M-PLANE GALLIUM NITRIDE SUBSTRATE PREPARED VIA AMMONOTHERMAL GROWTH
#5Integrated circuits with aligned (100) NMOS and (110) PMOS FinFET sidewall channels
#6Method for forming integrated circuits with aligned (100) NMOS and (110) PMOS FinFET sidewall channels
#7Orientation of electronic devices on mis-cut substrates
#8Hybrid orientation semiconductor structure with reduced boundary defects and method of forming same
#9Semiconductor device and method for manufacturing the same
#10Semiconductor thin film and semiconductor device
#11Opto-electronic and electronic devices using an N-face or M-plane gallium nitride substrate prepared via ammonothermal growth
#12Method and system for contacting of a flexible sheet and a substrate
#13Display substrate and method of manufacturing the same
#14METHOD OF FABRICATING A SEMICONDUCTOR DEVICE
#15High brightness light emitting diode with a bidirectionally angled substrate
#16Hybrid orientation semiconductor structure with reduced boundary defects and method of forming same
#17GaN substrate, substrate with epitaxial layer, semiconductor device, and method of manufacturing GaN substrate
#18Method of making (100) NMOS and (110) PMOS sidewall surface on the same fin orientation for multiple gate MOSFET with DSB substrate
#19Laser diode orientation on mis-cut substrates
#20Structure and method of fabricating a hybrid substrate for high-performance hybrid-orientation silicon-on-insulator CMOS devices
#21Method of fabricating a semiconductor device
#22Method of fabricating a semiconductor device
#23Semiconductor thin film and semiconductor device
#24Method of fabricating a semiconductor device
#25Method of fabricating a semiconductor device
#26Method of fabricating a semiconductor device
#27Semiconductor laser device including transparent electrode
#28Opto-electronic and electronic devices using N-face or M-plane GaN substrate prepared with ammonothermal growth
#29Structure and method of fabricating a hybrid substrate for high-performance hybrid-orientation silicon-on-insulator CMOS devices
#30Laser apparatus, laser irradiation method, semiconductor manufacturing method, semiconductor device, and electronic equipment
#31Method to selectively form regions having differing properties and structure
#32Semiconductor device
#33Method of fabricating a semiconductor device
#34Highly manufacturable SRAM cells in substrates with hybrid crystal orientation
#35Growing [110] silicon on [001] oriented substrate with rare-earth oxide buffer film
#36Structure and method of fabricating a hybrid substrate for high-performance hybrid-orientation silicon-on-insulator CMOS devices
#37Fabrication method of a high brightness light emitting diode with a bidirectionally angled substrate
#38Method and apparatus on (110) surfaces of silicon structures with conduction in the <110> direction
#39Growing [110] silicon on [001]-oriented substrate with rare-earth oxide buffer film
#40Semiconductor laser device and manufacturing method thereof
#41Methods for sidewall etching and etching during filling of a trench
#42Semiconductor thin film and semiconductor device
#43Method and apparatus on (110) surfaces of silicon structures with conduction in the <110> direction
#44Method of fabricating a semiconductor device