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Inventor profile of:

Eric J. Shero

City:

Phoenix, Arizona

Country:

United States

Published Applications:

26

Last publication date:

2020-04-23

Top Assignees for applications by Eric J. Shero

The entities that hold a legal rights for patent applications filed by inventor Shero Eric J.:

Recent patent applications by Shero Eric J.

Eric J. Shero from Phoenix, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2020-04-23
US20200123013A1
Chemistry; metallurgy

Tritertbutyl aluminum reactants for vapor deposition

 #2 | 2018-11-29
US20180339907A1
Chemistry; metallurgy

Tritertbutyl aluminum reactants for vapor deposition

 #3 | 2017-04-06
US20170096345A1
Chemistry; metallurgy

Tritertbutyl aluminum reactants for vapor deposition

 #4 | 2013-01-03
US20130004288A1
Electricity

Method for minimizing contamination in semiconductor processing chamber

 #5 | 2011-11-10
US20110275166A1
Electricity

Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species

 #6 | 2011-03-03
US20110053383A1
Electricity

High concentration water pulses for atomic layer deposition

 #7 | 2010-10-21
US20100266765A1
Chemistry; metallurgy

METHOD AND APPARATUS FOR GROWING A THIN FILM ONTO A SUBSTRATE

 #8 | 2010-08-12
US20100202860A1
Electricity

Method and apparatus for minimizing contamination in semiconductor processing chamber

 #9 | 2008-11-20
US20080286589A1
Electricity

Incorporation of nitrogen into high k dielectric film

 #10 | 2008-01-24
US20080020593A1
Electricity

ALD of metal silicate films

 #11 | 2007-11-22
US20070269596A1
Chemistry; metallurgy

VALVE FAILURE DETECTION

 #12 | 2007-05-03
US20070098894A1
Chemistry; metallurgy

Reactor surface passivation through chemical deactivation

 #13 | 2007-04-19
US20070084404A1
Performing operations; transporting

Reactor surface passivation through chemical deactivation

 #14 | 2006-10-10
US10841585
-

Reactor surface passivation through chemical deactivation

 #15 | 2006-09-28
US20060216419A1
Chemistry; metallurgy

Sublimation bed employing carrier gas guidance structures

 #16 | 2006-09-14
US20060205230A1
Electricity

Surface preparation prior to deposition

 #17 | 2006-06-06
US10626212
-

Surface preparation prior to deposition

 #18 | 2006-04-11
US10074722
-

Integration of high k gate dielectric

 #19 | 2006-04-04
US10786779
-

Reduced cross-contamination between chambers in a semiconductor processing tool

 #20 | 2005-11-03
US20050241176A1
Chemistry; metallurgy

Reaction system for growing a thin film

 #21 | 2005-11-01
US10260370
-

Incorporation of nitrogen into high k dielectric film

 #22 | 2005-10-25
US10626217
-

Surface preparation prior to deposition

 #23 | 2005-10-20
US20050233529A1
Electricity

Integration of high k gate dielectric

 #24 | 2005-09-29
US20050212119A1
Electricity

Incorporation of nitrogen into high k dielectric film

 #25 | 2005-04-07
US20050072357A1
Chemistry; metallurgy

Sublimation bed employing carrier gas guidance structures

 #26 | 2005-01-06
US20050000428A1
Chemistry; metallurgy

Method and apparatus for vaporizing and delivering reactant
InventorID:

10040 ⎘