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Inventor profile of:

Akinori Kitamura

City:

Miyagi

Country:

Japan

Published Applications:

10

Last publication date:

2026-01-08

Top Assignees for applications by Akinori Kitamura

The entities that hold a legal rights for patent applications filed by inventor Kitamura Akinori:

  • TOKYO ELECTRON LIMITED 10 Tokyo, Japan

Recent patent applications by Kitamura Akinori

Akinori Kitamura from Miyagi, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-01-08
US20260011565A1
Electricity

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

#2 | 2019-02-28
US20190067031A1
Electricity

Etching method and etching apparatus

#3 | 2017-11-09
US20170323796A1
Electricity

Method for etching silicon layer and plasma processing apparatus

#4 | 2016-05-05
US20160126071A1
Electricity

Method of etching organic film

#5 | 2015-06-11
US20150162203A1
Electricity

Method for etching silicon layer and plasma processing apparatus

#6 | 2015-04-09
US20150099366A1
Electricity

Plasma etching method

#7 | 2015-03-05
US20150064922A1
Electricity

Method of selectively removing a region formed of silicon oxide and plasma processing apparatus

#8 | 2015-02-12
US20150044877A1
Electricity

Etching method

#9 | 2015-01-22
US20150024603A1
Electricity

Plasma etching method and plasma etching apparatus

#10 | 2014-11-13
US20140332372A1
Chemistry; metallurgy

Plasma etching method

InventorID:

1044237 ⎘

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