Inventor profile of:

Errol Sanchez

City:

Tracy, California

Country:

United States

Published Applications:

17

Last publication date:

2018-09-13

Top Assignees for applications by Errol Sanchez

The entities that hold a legal rights for patent applications filed by inventor Sanchez Errol:

Recent patent applications by Sanchez Errol

Errol Sanchez from Tracy, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2018-09-13
US20180261454A9
Electricity

SEMICONDUCTOR DEVICE

#2 | 2017-01-05
US20170004968A1
Electricity

SEMICONDUCTOR DEVICE

#3 | 2015-02-19
US20150050800A1
Electricity

Fin formation by epitaxial deposition

#4 | 2012-11-08
US20120282714A1
Electricity

Susceptor with backside area of constant emissivity

#5 | 2012-03-29
US20120077335A1
Electricity

Methods for depositing germanium-containing layers

#6 | 2012-01-05
US20120003599A1
Electricity

Substrate support for use with multi-zonal heating sources

#7 | 2011-09-08
US20110217466A1
Chemistry; metallurgy

Apparatus and methods for chemical vapor deposition

#8 | 2011-06-30
US20110155058A1
Electricity

SUBSTRATE PROCESSING APPARATUS HAVING A RADIANT CAVITY

#9 | 2010-12-16
US20100317177A1
Electricity

Methods for forming silicon germanium layers

#10 | 2010-10-07
US20100255661A1
Electricity

Methods for depositing layers having reduced interfacial contamination

#11 | 2010-05-13
US20100120235A1
Electricity

METHODS FOR FORMING SILICON GERMANIUM LAYERS

#12 | 2009-12-17
US20090311850A1
Electricity

Method for surface treatment of semiconductor substrates

#13 | 2009-08-27
US20090211523A1
Chemistry; metallurgy

Apparatus to control semiconductor film deposition characteristics

#14 | 2008-11-06
US20080274604A1
Electricity

Susceptor with backside area of constant emissivity

#15 | 2007-11-08
US20070256627A1
Electricity

Method of ultra-shallow junction formation using Si film alloyed with carbon

#16 | 2007-07-26
US20070170148A1
Electricity

Methods for in-situ generation of reactive etch and growth specie in film formation processes

#17 | 2007-02-22
US20070042117A1
Chemistry; metallurgy

Method to control semiconductor film deposition characteristics

InventorID:

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