Aurora, Illinois
United States
16
2015-02-26
The entities that hold a legal rights for patent applications filed by inventor VACASSY Robert:
Robert VACASSY from Aurora, US has applied for patents for these inventions. The list has both pending applications and granted patents:
ULTRA HIGH VOID VOLUME POLISHING PAD WITH CLOSED PORE STRUCTURE
#2 | 2015-02-26Polishing pad with porous interface and solid core, and related apparatus and methods
#3 | 2010-10-28CMP porous pad with particles in a polymeric matrix
#4 | 2010-07-29COMPOSITIONS AND METHODS FOR CHEMICAL-MECHANICAL POLISHING OF PHASE CHANGE MATERIALS
#5 | 2010-03-16Compositions and methods for dielectric CMP
#6 | 2009-12-24CMP method for metal-containing substrates
#7 | 2009-07-30CMP method for improved oxide removal rate
#8 | 2008-09-11Silicon oxide polishing method utilizing colloidal silica
#9 | 2008-01-24Rate-enhanced CMP compositions for dielectric films
#10 | 2007-11-22Method of polishing a tungsten-containing substrate
#11 | 2007-11-13Tunable selectivity slurries in CMP applications
#12 | 2007-09-20Polishing composition for a tungsten-containing substrate
#13 | 2007-09-13Composition and method to polish silicon nitride
#14 | 2005-12-22Method of polishing a tungsten-containing substrate
#15 | 2005-12-22CMP composition for improved oxide removal rate
#16 | 2005-07-14Methanol-containing silica-based cmp compositions
1079582 ⎘