Cabot Microelectronics Corporation

Composition for tungsten CMP

#2 | 2019-12-05 ✅ Patent 10,479,911 granted on 2019-11-19

US20190367774A1

Composition and method for polishing memory hard disks exhibiting reduced edge roll off

#3 | 2019-09-19 ✅ Patent 10,584,266 granted on 2020-03-10

US20190284434A1

CMP compositions containing polymer complexes and agents for STI applications

#4 | 2019-07-11 ✅ Patent 10,647,887 granted on 2020-05-12

US20190211227A1

Tungsten buff polishing compositions with improved topography

#5 | 2019-06-20 ✅ Patent 10,619,076 granted on 2020-04-14

US20190185716A1

Self-stopping polishing composition and method for bulk oxide planarization

#6 | 2019-02-28 ✅ Patent 10,486,124 granted on 2019-11-26

US20190060855A1

Systems for mixing a liquid and related methods

#7 | 2018-10-18 ✅ Patent 10,640,680 granted on 2020-05-05

US20180298234A1

Chemical-mechanical processing slurry and methods

#8 | 2018-10-18 ✅ Patent 10,639,766 granted on 2020-05-05

US20180297169A1

Methods and compositions for processing dielectric substrate

#9 | 2018-08-30 ✅ Patent 10,619,075 granted on 2020-04-14

US20180244956A1

Self-stopping polishing composition and method for bulk oxide planarization

#10 | 2018-07-05 ✅ Patent 10,294,399 granted on 2019-05-21

US20180190506A1

Composition and method for polishing silicon carbide

#11 | 2018-06-14 ✅ Patent 10,522,341 granted on 2019-12-31

US20180166273A1

Composition and method for removing residue from chemical-mechanical planarization substrate

#12 | 2018-04-19 ✅ Patent 10,640,679 granted on 2020-05-05

US20180105721A1

CMP compositions selective for oxide and nitride with improved dishing and pattern selectivity

#13 | 2017-12-28 ✅ Patent 10,344,186 granted on 2019-07-09

US20170369742A1

Polishing composition comprising an amine-containing surfactant

#14 | 2017-12-07 ✅ Patent 10,792,785 granted on 2020-10-06

US20170348820A1

Chemical-mechanical processing slurry and methods for processing a nickel substrate surface

#15 | 2017-09-14 ✅ Patent 9,850,403 granted on 2017-12-26

US20170260421A1

Cobalt polishing accelerators

#16 | 2017-08-17 ✅ Patent 10,418,248 granted on 2019-09-17

US20170236718A1

Method of polishing group III-V materials

#17 | 2017-07-27 ✅ Patent 10,301,508 granted on 2019-05-28

US20170210946A1

Polishing composition comprising cationic polymer additive

#18 | 2017-07-20 ✅ Patent 10,293,459 granted on 2019-05-21

US20170203409A1

Polishing pad having polishing surface with continuous protrusions

#19 | 2017-07-06 ✅ Patent 10,066,126 granted on 2018-09-04

US20170190936A1

Tungsten processing slurry with catalyst

#20 | 2017-06-29 ✅ Patent 9,796,882 granted on 2017-10-24

US20170183540A1

CMP processing composition comprising alkylamine and cyclodextrin

#21 | 2017-06-08

US20170158993A1

STABILIZATION OF TRIS(2 HYDROXYETHYL)METHYLAMMONIUM HYDROXIDE AGAINST DECOMPOSITION WITH DIALKYHYDROXYLAMINE

#22 | 2017-06-08 ✅ Patent 10,100,272 granted on 2018-10-16

US20170158992A1

Cleaning composition following CMP and methods related thereto

#23 | 2017-05-04 ✅ Patent 9,631,122 granted on 2017-04-25

US20170121561A1

Tungsten-processing slurry with cationic surfactant

#24 | 2017-05-04 ✅ Patent 9,771,496 granted on 2017-09-26

US20170121560A1

Tungsten-processing slurry with cationic surfactant and cyclodextrin

#25 | 2017-05-04 ✅ Patent 9,868,185 granted on 2018-01-16

US20170120417A1

Polishing pad with foundation layer and window attached thereto

#26 | 2017-03-30 ✅ Patent 10,562,149 granted on 2020-02-18

US20170087688A1

Polyurethane CMP pads having a high modulus ratio

#27 | 2017-03-09 ✅ Patent 9,597,768 granted on 2017-03-21

US20170066102A1

Selective nitride slurries with improved stability and improved polishing characteristics

#28 | 2017-02-23 ✅ Patent 10,508,219 granted on 2019-12-17

US20170051181A1

Polishing composition and method utilizing abrasive particles treated with an aminosilane

#29 | 2017-02-16 ✅ Patent 9,828,528 granted on 2017-11-28

US20170044403A1

Polishing composition containing ceria abrasive

#30 | 2017-01-19 ✅ Patent 10,029,345 granted on 2018-07-24

US20170014969A1

Methods and compositions for processing dielectric substrate

#31 | 2016-12-27 ✅ Patent 9,528,030 granted on 2016-12-27

US14918756

Cobalt inhibitor combination for improved dishing

#32 | 2016-10-06 ✅ Patent 10,315,285 granted on 2019-06-11

US20160288290A1

CMP composition and method for polishing rigid disks

#33 | 2016-09-08 ✅ Patent 9,505,952 granted on 2016-11-29

US20160257856A1

Polishing composition containing ceria abrasive

#34 | 2016-09-08 ✅ Patent 10,414,947 granted on 2019-09-17

US20160257855A1

Polishing composition containing ceria particles and method of use

#35 | 2016-09-08 ✅ Patent 9,758,697 granted on 2017-09-12

US20160257853A1

Polishing composition containing cationic polymer additive

#36 | 2016-08-25 ✅ Patent 9,481,811 granted on 2016-11-01

US20160244639A1

Composition and method for polishing memory hard disks exhibiting reduced edge roll-off

#37 | 2016-08-11 ✅ Patent 10,220,487 granted on 2019-03-05

US20160229025A1

Customized polishing pads for CMP and methods of fabrication and use thereof

#38 | 2016-08-04 ✅ Patent 9,803,109 granted on 2017-10-31

US20160222254A1

CMP composition for silicon nitride removal

#39 | 2016-07-14 ✅ Patent 9,828,574 granted on 2017-11-28

US20160201016A1

Cleaning composition and method for cleaning semiconductor wafers after CMP

#40 | 2016-06-16 ✅ Patent 9,422,455 granted on 2016-08-23

US20160168421A1

CMP compositions exhibiting reduced dishing in STI wafer polishing

#41 | 2016-04-28 ✅ Patent 9,688,885 granted on 2017-06-27

US20160115353A1

Cobalt polishing accelerators

#42 | 2016-04-21 ✅ Patent 9,944,828 granted on 2018-04-17

US20160108286A1

Slurry for chemical mechanical polishing of cobalt

#43 | 2016-04-21 ✅ Patent 9,834,704 granted on 2017-12-05

US20160108285A1

Cobalt dishing control agents

#44 | 2016-04-21 ✅ Patent 10,124,464 granted on 2018-11-13

US20160107289A1

Corrosion inhibitors and related compositions and methods

#45 | 2016-04-14 ✅ Patent 9,469,787 granted on 2016-10-18

US20160102227A1

Nickel phosphorous CMP compositions and methods

#46 | 2016-03-31 ✅ Patent 9,566,686 granted on 2017-02-14

US20160089763A1

Composition for tungsten CMP

#47 | 2016-03-10 ✅ Patent 9,528,031 granted on 2016-12-27

US20160068713A1

Slurry composition and method of substrate polishing

#48 | 2015-12-31 ✅ Patent 9,556,363 granted on 2017-01-31

US20150376463A1

Copper barrier chemical-mechanical polishing composition

#49 | 2015-12-31 ✅ Patent 9,567,491 granted on 2017-02-14

US20150376462A1

Tungsten chemical-mechanical polishing composition

#50 | 2015-12-31 ✅ Patent 9,422,457 granted on 2016-08-23

US20150376461A1

Colloidal silica chemical-mechanical polishing concentrate

#51 | 2015-12-31 ✅ Patent 9,803,106 granted on 2017-10-31

US20150376460A1

Methods for fabricating a chemical-mechanical polishing composition

#52 | 2015-12-31 ✅ Patent 9,499,721 granted on 2016-11-22

US20150376459A1

Colloidal silica chemical-mechanical polishing composition

#53 | 2015-12-31 ✅ Patent 9,422,456 granted on 2016-08-23

US20150376458A1

Colloidal silica chemical-mechanical polishing composition

#54 | 2015-11-12 ✅ Patent 9,818,618 granted on 2017-11-14

US20150325451A1

Multi-layer polishing pad for CMP

#55 | 2015-11-05 ✅ Patent 9,401,104 granted on 2016-07-26

US20150315417A1

Polishing composition for edge roll-off improvement

#56 | 2015-10-22 ✅ Patent 9,687,956 granted on 2017-06-27

US20150298287A1

Polishing pad with offset concentric grooving pattern and method for polishing a substrate therewith

#57 | 2015-10-01 ✅ Patent 9,931,728 granted on 2018-04-03

US20150273655A1

Polishing pad with foundation layer and polishing surface layer

#58 | 2015-09-24 ✅ Patent 9,303,190 granted on 2016-04-05

US20150267083A1

Mixed abrasive tungsten CMP composition

#59 | 2015-09-24 ✅ Patent 9,127,187 granted on 2015-09-08

US20150267082A1

Mixed abrasive tungsten CMP composition

#60 | 2015-09-24 ✅ Patent 9,309,442 granted on 2016-04-12

US20150267081A1

Composition for tungsten buffing

#61 | 2015-09-24 ✅ Patent 9,931,729 granted on 2018-04-03

US20150266160A1

Polishing pad with grooved foundation layer and polishing surface layer

#62 | 2015-09-17 ✅ Patent 9,303,189 granted on 2016-04-05

US20150259574A1

Composition for tungsten CMP

#63 | 2015-09-17 ✅ Patent 9,303,188 granted on 2016-04-05

US20150259573A1

Composition for tungsten CMP

#64 | 2015-09-17 ✅ Patent 9,238,754 granted on 2016-01-19

US20150259572A1

Composition for tungsten CMP

#65 | 2015-08-06 ✅ Patent 9,752,057 granted on 2017-09-05

US20150221521A1

CMP method for suppression of titanium nitride and titanium/titanium nitride removal

#66 | 2015-07-16 ✅ Patent 9,909,032 granted on 2018-03-06

US20150197669A1

Composition and method for polishing memory hard disks

#67 | 2015-07-02 ✅ Patent 9,617,450 granted on 2017-04-11

US20150184029A1

Polishing composition and method utilizing abrasive particles treated with an aminosilane

#68 | 2015-06-11 ✅ Patent 9,850,402 granted on 2017-12-26

US20150159046A1

CMP compositions and methods for selective removal of silicon nitride

#69 | 2015-06-04 ✅ Patent 10,358,579 granted on 2019-07-23

US20150152289A1

CMP compositions and methods for polishing nickel phosphorous surfaces

#70 | 2015-04-30 ✅ Patent 9,534,147 granted on 2017-01-03

US20150114929A1

Polishing composition and method for nickel-phosphorous coated memory disks

#71 | 2015-04-23 ✅ Patent 9,409,276 granted on 2016-08-09

US20150111476A1

CMP polishing pad having edge exclusion region of offset concentric groove pattern

#72 | 2015-04-16 ✅ Patent 9,281,210 granted on 2016-03-08

US20150104939A1

Wet-process ceria compositions for polishing substrates, and methods related thereto

#73 | 2015-04-16 ✅ Patent 9,340,706 granted on 2016-05-17

US20150102012A1

Mixed abrasive polishing compositions

#74 | 2015-04-16 ✅ Patent 9,279,067 granted on 2016-03-08

US20150102010A1

Wet-process ceria compositions for polishing substrates, and methods related thereto

#75 | 2015-03-26 ✅ Patent 9,434,859 granted on 2016-09-06

US20150083689A1

Chemical-mechanical planarization of polymer films

#76 | 2015-02-26 ✅ Patent 9,463,551 granted on 2016-10-11

US20150056892A1

Polishing pad with porous interface and solid core, and related apparatus and methods

#77 | 2015-01-29 ✅ Patent 9,701,871 granted on 2017-07-11

US20150028254A1

Composition and method for polishing bulk silicon

#78 | 2015-01-22 ✅ Patent 9,303,187 granted on 2016-04-05

US20150024595A1

Compositions and methods for CMP of silicon oxide, silicon nitride, and polysilicon materials

#79 | 2014-11-27 ✅ Patent 9,165,489 granted on 2015-10-20

US20140349483A1

CMP compositions selective for oxide over polysilicon and nitride with high removal rate and low defectivity

#80 | 2014-09-18 ✅ Patent 10,160,092 granted on 2018-12-25

US20140273777A1

Polishing pad having polishing surface with continuous protrusions having tapered sidewalls

#81 | 2014-09-18 ✅ Patent 8,961,807 granted on 2015-02-24

US20140263184A1

CMP compositions with low solids content and methods related thereto

#82 | 2014-09-04 ✅ Patent 9,358,659 granted on 2016-06-07

US20140248823A1

Composition and method for polishing glass

#83 | 2014-07-31 ✅ Patent 8,920,667 granted on 2014-12-30

US20140209566A1

Chemical-mechanical polishing composition containing zirconia and metal oxidizer

#84 | 2014-03-13 ✅ Patent 8,821,215 granted on 2014-09-02

US20140073226A1

Polypyrrolidone polishing composition and method

#85 | 2014-01-23 ✅ Patent 8,778,211 granted on 2014-07-15

US20140024216A1

GST CMP slurries

#86 | 2014-01-23 ✅ Patent 9,157,010 granted on 2015-10-13

US20140020305A1

Magnetorheological fluid for ultrasmooth polishing

#87 | 2014-01-16 ✅ Patent 9,633,863 granted on 2017-04-25

US20140017892A1

Compositions and methods for selective polishing of silicon nitride materials

#88 | 2013-11-28 ✅ Patent 9,039,914 granted on 2015-05-26

US20130313226A1

Polishing composition for nickel-phosphorous-coated memory disks

#89 | 2013-11-28 ✅ Patent 8,778,212 granted on 2014-07-15

US20130313225A1

CMP composition containing zirconia particles and method of use

#90 | 2013-10-17 ✅ Patent 9,156,125 granted on 2015-10-13

US20130273813A1

Polishing pad with light-stable light-transmitting region

#91 | 2013-09-19 ✅ Patent 9,238,753 granted on 2016-01-19

US20130244433A1

CMP compositions selective for oxide and nitride with high removal rate and low defectivity

#92 | 2013-09-19 ✅ Patent 8,916,061 granted on 2014-12-23

US20130244432A1

CMP compositions selective for oxide and nitride with high removal rate and low defectivity

#93 | 2013-08-29 ✅ Patent 8,623,767 granted on 2014-01-07

US20130224955A1

Method for polishing aluminum/copper and titanium in damascene structures

#94 | 2013-08-27 ✅ Patent 8,518,135 granted on 2013-08-27

US13594947

Polishing composition containing hybrid abrasive for nickel-phosphorous coated memory disks

#95 | 2013-03-21 ✅ Patent 8,623,766 granted on 2014-01-07

US20130072021A1

Composition and method for polishing aluminum semiconductor substrates

#96 | 2012-11-08 ✅ Patent 8,597,540 granted on 2013-12-03

US20120280170A1

Compositions for polishing silicon-containing substrates

#97 | 2012-11-01 ✅ Patent 8,557,137 granted on 2013-10-15

US20120273715A1

Polishing composition for nickel phosphorous memory disks

#98 | 2012-10-18 ✅ Patent 8,808,573 granted on 2014-08-19

US20120264304A1

Compositions and methods for selective polishing of silicon nitride materials

#99 | 2012-07-26 ✅ Patent 9,425,037 granted on 2016-08-23

US20120190199A1

Silicon polishing compositions with improved PSD performance

#100 | 2012-04-19 ✅ Patent 8,691,695 granted on 2014-04-08

US20120094489A1