Austin, Texas
United States
17
2021-03-11
The entities that hold a legal rights for patent applications filed by inventor Somervell Mark:
Mark Somervell from Austin, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Systems and methods to monitor particulate accumulation for bake chamber cleaning
#2 | 2021-01-21System and method of planarization control using a cross-linkable material
#3 | 2020-12-17Planarization of semiconductor devices
#4 | 2020-10-20Systems and methods for developer drain line monitoring
#5 | 2018-04-12Hot plate with programmable array of lift devices for multi-bake process optimization
#6 | 2017-10-05Method of evaluating aligned patterns in directed self-assembly and using in feedback control scheme
#7 | 2017-08-24Photo-sensitized chemically amplified resist (PS-CAR) model calibration
#8 | 2015-03-05UV-assisted stripping of hardened photoresist to create chemical templates for directed self-assembly
#9 | 2010-10-28Dual tone development with plural photo-acid generators in lithographic applications
#10 | 2010-10-28Dual tone development with a photo-activated acid enhancement component in lithographic applications
#11 | 2010-10-28Flood exposure process for dual tone development in lithographic applications
#12 | 2010-09-30Using electric-field directed post-exposure bake for double-patterning (D-P)
#13 | 2010-05-13Dual tone development processes
#14 | 2010-03-25Variable resist protecting groups
#15 | 2010-03-18Method for creating gray-scale features for dual tone development processes
#16 | 2010-03-04Method of process optimization for dual tone development
#17 | 2010-03-04METHOD OF PATTERNING A SUBSTRATE USING DUAL TONE DEVELOPMENT
1087906 ⎘