Inventor profile of:

Paul Abel

City:

Austin, Texas

Country:

United States

Published Applications:

19

Last publication date:

2025-05-15

Top Assignees for applications by Paul Abel

The entities that hold a legal rights for patent applications filed by inventor Abel Paul:

Recent patent applications by Abel Paul

Paul Abel from Austin, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-05-15
US20250157820A1
Electricity

METHODS FOR FORMING VERTICALLY LAYERED IONIC LIQUID CRYSTAL (ILC) STRUCTURES ON A SEMICONDUCTOR SUBSTRATE

#2 | 2025-05-15
US20250157810A1
Electricity

METHODS FOR PATTERNING A SEMICONDUCTOR SUBSTRATE USING METALATE SALT IONIC LIQUID CRYSTALS

#3 | 2025-03-06
US20250079181A1
Electricity

METHOD TO SELECTIVELY ETCH SILICON NITRIDE TO SILICON OXIDE USING SURFACE ALKYLATION

#4 | 2025-03-06
US20250079180A1
Electricity

METHODS FOR WET ATOMIC LAYER ETCHING OF MOLYBDENUM

#5 | 2024-02-08
US20240043721A1
Chemistry; metallurgy

Ruthenium CMP chemistry based on halogenation

#6 | 2023-12-14
US20230402276A1
Electricity

Methods for selective removal of surface oxides on metal films

#7 | 2023-05-11
US20230140900A1
Chemistry; metallurgy

Methods for wet atomic layer etching of copper

#8 | 2023-04-20
US20230121246A1
Chemistry; metallurgy

Methods for wet etching of noble metals

#9 | 2023-04-20
US20230118554A1
Chemistry; metallurgy

Methods for wet atomic layer etching of ruthenium

#10 | 2023-04-20
US20230118455A1
Chemistry; metallurgy

Ruthenium CMP chemistry based on halogenation

#11 | 2023-04-20
US20230117790A1
Electricity

Methods For Non-Isothermal Wet Atomic Layer Etching

#12 | 2022-08-11
US20220254646A1
Electricity

Dynamically adjusted purge timing in wet atomic layer etching

#13 | 2022-05-12
US20220148885A1
Electricity

Systems for etching a substrate using a hybrid wet atomic layer etching process

#14 | 2022-05-12
US20220148882A1
Electricity

Methods For Etching A Substrate Using A Hybrid Wet Atomic Layer Etching Process

#15 | 2021-08-05
US20210242031A1
Electricity

METHOD FOR USING ULTRA-THIN ETCH STOP LAYERS IN SELECTIVE ATOMIC LAYER ETCHING

#16 | 2020-05-21
US20200161148A1
Electricity

Processing system and platform for wet atomic layer etching using self-limiting and solubility-limited reactions

#17 | 2020-05-21
US20200157693A1
Chemistry; metallurgy

Wet atomic layer etching using self-limiting and solubility-limited reactions

#18 | 2020-03-05
US20200075358A1
Electricity

Photonically tuned etchant reactivity for wet etching

#19 | 2015-04-16
US20150102257A1
Electricity

Sub-stoichiometric, chalcogen-containing-germanium, tin, or lead anodes for lithium or sodium ion batteries

InventorID:

1127501 ⎘